Search

Ridge microstructures were prepared by etching through samples consisting of a series of stacked InAs x P 1 − x quantum wells (QWs) with step graded composition grown on InP by molecular beam epitaxy. Different etching techniques were used: wet etching with HCl/H 2 O and reactive ion etching with CH 4 /H 2. These microstructures were characterized by low-temperature micro-photoluminescence. The photoluminescence (PL) emission associated with each QW was clearly identified. The PL was measured in detail across etched ridge stripes of various widths. Variations of the integrated PL intensities across the etched stripes were observed. The PL intensities for all QWs increase gradually from the edge to the center of the ridge microstructures. The PL intensity measured at the ridge center is systematically reduced for ridges which are 10 or 20 μ m wide as compared to ridges which are 30 μ m wide or larger. On the other hand, the spectral peak position of the PL lines remained constant with high accuracy (0.2–0.4 meV) across the microstructures. These observations are discussed in terms of the different possible mechanisms which determine the PL intensity variations, namely, non-radiative recombination at the etched walls and effects of stray electric fields which result from the etching process. Based on this discussion, we compare quantitatively the different etching processes which we have used. Altogether, this study illustrates the contribution that specially designed test structures, coupled with advanced spectroscopic characterization, can provide to the development of semiconductor photonic devices (e.g., lasers or waveguides) involving etching processes. [ABSTRACT FROM AUTHOR]

A model used to simulate and optimize the performance of nanowire-based betavoltaic generators is developed. The optimum nanowire array geometry is established for devices made of silicon, gallium arsenide, and gallium phosphide for both nickel-63 and tritium sources by computing the energy capture efficiency for each case. The captured power for nanowire devices is shown to be drastically greater compared to planar betavoltaic generators with maximum improvement factors of approximately 7, 3, 5, and 9 for devices utilizing radioisotope sources of nickel-63, nickel citrate, tritium, and tritiated butyl, respectively. In addition, nanowire devices do not suffer from self-shielding effects, a large limitation in conventional, planar betavoltaics. By coupling the spatial distribution of electron–hole pair generation rate calculated from Monte Carlo simulations and a semiconductor charge-transport model, the diode design is optimized for the maximum power output. The top performing devices, utilizing a tritium source, exhibited an output power of approximately 4, 6, and 2 μW cm−2 for silicon, gallium arsenide, and gallium phosphide, respectively. Overall device efficiencies were found to range from 4% to 10%, surpassing several betavoltaic devices reported in the literature. It was also found that, contrary to the traditional betavoltaic design, semiconductors with higher bandgaps do not necessarily result in the best device performance due to additional material parameters, such as surface recombination velocity. Potential improvements for nanowire-based betavoltaic generators are suggested for additional investigation. [ABSTRACT FROM AUTHOR]

The geometry of a gallium phosphide nanowire (NW) array has been optimized for maximum current generation in a betavoltaic (BV) device. The energy capture efficiency for various device geometries with different radioisotope source compounds was calculated in GEANT4. A validation of GEANT4 for BV device simulation was performed by comparing a model output with the available bulk semiconductor BV performance data, followed by predictions of the performance of NW-based devices. The pitch and the diameter of the NWs were found to have the most significant impact on the β-generated current density, with the optimum diameter-to-pitch ratios ranging from 0.55 to 0.8, depending on the source. The energy capture efficiency improved when low energy beta (β) emitters were used. For devices utilizing 63Ni source compounds, the β-generated current densities approached 0.95 μA cm−2, representing an improvement by a factor as high as 5.8 compared to planar devices. In the case of 3H source compounds, the generated current density was 3.05 μA cm−2, a factor of 15.5 larger than comparable planar devices. However, NW devices utilizing sources with a higher decay energy, such as 147Pm, did not demonstrate any improvements over planar geometries. Using the results for optimum NW geometries, NW-based or other nanostructured devices could be made to surpass the present commercial BV batteries. [ABSTRACT FROM AUTHOR]

Nonradiative processes are studied in InGaAs/InP quantum wells (QWs) as a function of the pump power and the temperature, using time-resolved photoluminescence. Intravalley disorder induced direct and intervalley phonon-assisted indirect Auger processes are found to be responsible for nonradiative recombination in low mobility and high mobility quantum wells, respectively. Both Auger processes are spatially separated: the phonon-assisted and direct Auger recombinations take place in the central part of the QW and near the interfaces, respectively. The recombination rate corresponding to the phonon-assisted Auger process is shown to increase with the temperature, while no influence of the temperature was detected for the rate of the disorder induced direct Auger process. The presented data point to the X and/or L valleys as final states for the Auger electron in the intervalley Auger process. Moreover, Auger recombination associated with different confined levels is studied. We show that the conditions for the intervalley phonon-assisted Auger processes are fulfilled for the ground states of the confined electrons and holes, while the nonradiative recombination due to the excited states is dominated by the direct Auger process. [ABSTRACT FROM AUTHOR]

The electron transport and recombination processes of photoexcited electron-hole pairs were studied in InGaAs/InP single quantum wells. Comprehensive transport data analysis reveals a asymmetric shape of the quantum well potential where the electron mobility was found to be dominated by interface-roughness scattering. The low-temperature time-resolved photoluminescence was employed to investigate recombination kinetics of photogenerated electrons. Remarkable modification of Auger recombination was observed with variation of the electron mobility. In high mobility quantum wells, the increasing pump power resulted in a new and unexpected phenomenon: a considerably enhanced Auger non-radiative recombination time. We propose that the distribution of the photoexcited electrons over different conduction band valleys might account for this effect. In low mobility quantum wells, disorder-induced relaxation of the momentum conservation rule causes inter-valley transitions to be insignificant; as a consequence, the non-radiative recombination time is reduced with the increase in pump power. Thus, interface-roughness scattering was found responsible for both transport properties and dynamic optical response in InGaAs/InP quantum wells. [ABSTRACT FROM AUTHOR]

A method is presented to improve the quantitative determination of dopant concentration in semiconductor nanowire (NW) arrays using secondary ion mass spectrometry (SIMS). SIMS measurements were used to determine Be dopant concentrations in a Be-doped GaAs thin film and NW arrays of various pitches that were dry-etched from the same film. A comparison of these measurements revealed a factor of 3 to 12 difference, depending on the NW array pitch, between the secondary Be ion yields of the film and the NW arrays, despite being identically doped. This was due to matrix effects and ion beam mixing of Be from the NWs into the surrounding benzocyclobutene that was used to fill the space between the NWs. This indicates the need for etched NWs to be used as doping standards instead of 2D films when evaluating NWs of unknown doping by SIMS. Using the etched NWs as doping standards, NW arrays of various pitches grown by the vapour-liquid-solid mechanism were characterized by SIMS to yield valuable insights into doping mechanisms. [ABSTRACT FROM AUTHOR]

We report on the surface passivation of Au-assisted Te-doped GaAs nanowires (NWs) grown by metalorganic vapor phase epitaxy. The electrical properties of individual free standing NWs were assessed using a tungsten nano-probe inside a scanning electron microscope. The diameter independent apparent resistivity of both strained and relaxed passivated NWs suggests the unpinning of the Fermi level and reduction of sidewalls surface states density. Similar currentvoltage properties were observed for partially axially relaxed GaAs/GaP NWs. This indicates a negligible contribution of misfit dislocations in the charge transport properties of the NWs. Low temperature micro-photoluminescence (μ-PL) measurements were also carried out for both uncapped and passivated GaAs NWs. The improvement of the integrated (μ-PL) intensity for GaAs/GaP NWs further confirms the effect of passivation. [ABSTRACT FROM AUTHOR]

The control of the doping in nanowires (NWs) is of fundamental importance for the implementation of NW-based devices. A method is presented to obtain local information about doping by monitoring the Fermi-energy position within the bandgap at the surface along single NWs through spatially resolved x-ray photoemission spectroscopy. The experimental results are complemented by theoretical simulations of the carrier profile, taking into account the presence of electronic surface states and quantifying the impact of carrier depletion at the NW surface. This combined approach allows to determine the effect of the incorporation of Si dopants in GaAs NWs following different growth protocols, such as vapor-liquid-solid axial growth or vapor-solid radial growth, and in the resulting core-shell structures and axial junctions. The method also revelaed the strong dependence of the resulting doping on the morphology of the single NW (orientation, shell thickness). This approach can be easily applied to other nanoscale objects, allowing the direct observation of how doping (or junctions, or adsorbates,...) may locally affect the position of the Fermi level at the surface, which is a crucial factor in several application fields, such as photovoltaic and photocatalysis. [ABSTRACT FROM AUTHOR]

The reflectance, transmittance, and absorptance of GaAs nanowire (NW) arrays are calculated by solving Maxwell's equations using the finite element method. The model is compared with measurement results from well-ordered periodic GaAs NW arrays fabricated by dry etching. The model results are also compared with the reflectance measured from NWs grown by the Au-assisted vapor-liquid-solid method. The optimum NW diameter, periodicity (spacing between NWs), and length are determined to maximize absorptance of the AM1.5G solar spectrum and short circuit current density in a NW array solar cell. The optimum NW diameter, period, and length were 180 nm, 350 nm, and 5 μm, respectively, giving a photocurrent density from the NW of 27.3 mA/cm2 and corresponding to 91.3% absorption of the AM1.5 G solar spectrum. The photocurrent density saturated for NW lengths greater than 5 μm. A gold nanoparticle at the top of the NWs (used in the vapor-liquid-solid NW growth process) substantially reduced the optimum photocurrent density, while a polymer filling the space between NWs and a planar indium tin oxide contact had a relatively minor influence. [ABSTRACT FROM AUTHOR]

The combination of photoluminescence and magneto-transport measurements is used to study the single-particle relaxation time and the transport scattering time in short-period InGaAs/InP superlattices. Both the single-particle relaxation times of the electrons and of the holes were obtained in the same samples and were shown to be determined by the remote-impurity scattering. The transport scattering time for electrons was found to be dominated by the interface-roughness scattering with lateral length Λ=10 nm and height Δ = 0.13 nm. We also discuss the importance of multiple-scattering effects for small well widths and of alloy scattering for large well widths. [ABSTRACT FROM AUTHOR]

The continuity and Poisson equations are solved numerically to obtain J-V characteristics and photoconversion efficiency of a two-junction solar cell. The cell consists of a top junction comprised of nanowires with bandgap of 1.7 eV grown on a bottom junction comprised of a Si substrate. The lattice relaxation possible in nanowires permits lattice-mismatched III-V material growth on Si, thereby achieving the optimum bandgaps in a two-junction cell. The model indicates a limiting efficiency of 42.3% under a concentration of 500 Suns (AM1.5 D spectrum). This limiting efficiency is similar to that calculated for the planar lattice-matched triple-junction Ge/InGaAs/InGaP cell. Methods of fabricating the nanowire/Si cell are discussed including requirements for nanowire sidewall surface passivation. The model indicated that passivation of the nanowire sidewall surfaces that produces a surface recombination velocity of 3000 cm·s-1 and surface trap density of 1012 cm-2 should be sufficient to yield high efficiency solar cells. [ABSTRACT FROM AUTHOR]

Numerical simulation of current-voltage (J-V) characteristics of III-V nanowire core-shell p-n junction diodes under illuminated conditions is presented with an emphasis on optimizing the nanowire design for photoconversion efficiency. Surface recombination and depletion effects are found to play a dominant role in the J-V characteristics. The impact of surface charge density, surface recombination velocity, doping concentration, and nanowire geometry are investigated. Investigation of contacting methodology indicated that solar cell efficiency is degraded with electrical contacts on the sidewalls of the nanowire due to Fermi level pinning at the metal/semiconductor interface. On the other hand, contacts on the top of nanowires with sidewall passivation provide solar cell performance close to the detailed balance efficiency limit of ∼30%. Elimination of the thin film between nanowires produces a smaller dark current and improved cell performance. [ABSTRACT FROM AUTHOR]

The present work describes the development of a hybrid GaAs-aptamers biosensor for the label-free detection of adenosine 5′-triphosphate (ATP). The implemented sensing strategy relies on the sensitivity of the GaAs photoluminescence (PL) emission to the local environment at its surface. Specifically, GaAs substrates were chemically modified with thiol-derivatized oligonucleotide aptamers following conventional condensed-phase deposition techniques and exposed to the target ATP molecules. The resulting modification in the PL intensity is attributed to a specific biorecognition interaction between the aptamer receptors and the ATP target and, more importantly, the accompanying ligand-induced structural change in the aptamer conformation. Since the negatively charged aptamer probes are covalently anchored to the substrate surface, the sensing mechanism can be understood in terms of a change in the surface charge distribution and thereby, the width of the nonemissive GaAs surface depletion layer. Biosensors fabricated with aptamer probes of various lengths indicate a strand length-dependent nature of the luminescence response to the biorecognition events, with longer aptamers yielding a greater PL enhancement. Results provided by several control experiments demonstrate the sensitivity, specificity, and selectivity of the proposed biosensor in accurately identifying ATP. Modeling the performance data by means of Poisson–Boltzmann statistics in combination with the GaAs depletion layer model shows a good correlation between the structural conformation of the aptamers and the PL yield of the underlying substrate. Collectively, the results described within indicate the promise of the prospective luminescence-based GaAs-aptamer biosensor for use in real-time sensing assays requiring a straightforward and efficient means of label-free analytical detection. [ABSTRACT FROM AUTHOR]

The structural and optical properties of GaAsP/GaP core-shell nanowires grown by gas source molecular beam epitaxy were investigated by transmission electron microscopy, Raman spectroscopy, photoluminescence (PL), and magneto-PL. The effects of surface depletion and compositional variations in the ternary alloy manifested as a redshift in GaAsP PL upon surface passivation, and a decrease in redshift in PL in the presence of a magnetic field due to spatial confinement of carriers. [ABSTRACT FROM AUTHOR]

This study provides a deeper insight into the chemistry and physics of the common engineering practice of using a proximity cap, while annealing compound semiconductors such as GaAs. We have studied the cases of a GaAs proximity cap, a Si proximity cap, and no proximity cap. Using x-ray photoelectron spectroscopy, it has been found that annealing increases the gallium to arsenic ratio in the oxide layer in all cases. During the annealing of UV-ozone oxidized GaAs, it has been observed that GaAs proximity caps also serve as a sacrificial layer to accelerate the desorption of oxide species. In all cases surface deterioration due to pit formation has been observed, and the depth of pits is found to depend on the effective role played by the capping material. Energy dispersive x-ray analysis provides additional evidence that pits mainly consist of elemental As and gallium oxide, with most of the elemental As situated at the pit-substrate interface. Deposition of a thin layer of gold and subsequent annealing to 500 °C for 300 s under different capping conditions shows the use of a proximate cap to be practically insignificant in annealing Au deposited films. [ABSTRACT FROM AUTHOR]

A comprehensive study of the oxide formed on GaAs by exposure to ultraviolet light and ozone (UV-ozone), and the evolution of Au nanoparticles on UV-ozone treated GaAs(100) substrates, has been carried out using x-ray photoelectron spectroscopy. The UV-ozone oxide has been found to consist of oxides of gallium and arsenic in addition to having a significant contribution from elemental arsenic concentrated mostly at the substrate-oxide interface. An intermediate suboxide species -AsxGa2O is found to make up a substantial part of the oxide layer, mostly near the surface region, whereas the interface to bulk GaAs is dominated by Ga2O3. As2O3 is found to be the dominant oxide in the initial UV-ozone oxide layer, while the oxide layer becomes rich in Ga2O3 as the sample is annealed at 500 °C for 300 s in a dry nitrogen environment. It is also found that gold does not alloy with Ga during the formation of gold nanoparticles by dewetting from the UV-ozone oxidized GaAs substrate. [ABSTRACT FROM AUTHOR]

The interfacial properties of lattice-matched InGaAs/InP superlattice (SL) structures grown by gas source molecular beam epitaxy were investigated by high resolution x-ray diffraction (HRXRD). SLs with various periods were grown to determine the contributions of the interface layers to the structural properties of the SLs. The HRXRD curves exhibited a number of features indicative of interfacial layers, including weak even-order satellite peaks, and a zero-order diffraction peak that shifted toward lower diffraction angles with decreasing SL period. A detailed structural model is proposed to explain these observations, consisting of strained InAsP and InGaAsP monolayers due to the group-V gas switching and atomic exchange at the SL interfaces. [ABSTRACT FROM AUTHOR]

Presents information on a study which analyzed the incorporation of the group V components in indium (In) gallium arsenic phosphorus (P) grown lattice matched to InP by gas source molecular beam epitaxy. Experimental procedure; Background on the thermodynamic model used in the study; Conclusions.