46 results on '"La Fontaine, B."'
Search Results
2. Precision optical aspheres for extreme ultraviolet lithography
3. Analysis of focus errors in lithography using phase-shift monitors
4. Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks
5. Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography
6. Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks
7. Actinic imaging of native and programmed defects on a full-field mask
8. EUVL reticle defectivity evaluation
9. Initial experience establishing an EUV baseline lithography process for manufacturability assessment
10. Predicting the thermomechanical distortion of extreme ultraviolet lithography reticles for preproduction and production exposure tools
11. EUVL reticle defectivity evaluation.
12. Modeling of the air plasma near the tip of the positive leader
13. High Frequency Ultrasound Generation Using a Femtosecond Laser.
14. Triggering and guiding high-voltage large-scale leader discharges with sub-joule ultrashort laser pulses
15. Single-shot chirped-pulse spectral interferometry used to measure the femtosecond ionization dynamics of air
16. Triggering and guiding leader discharges using a plasma channel created by an ultrashort laser pulse
17. Single-shot chirped-pulse spectral interferometry used to measure ionization dynamics of air on a femtosecond time scale
18. Measurement of the frequency and spectral width of the Langmuir wave spectrum driven by stimulated Raman scattering
19. Filamentation of ultrashort pulse laser beams resulting from their propagation over long distances in air
20. Measuring the Effect of Scatter on the Performance of a Lithography System
21. Performance of a Two-Mirror, Four-Reflection, Ring-Field Optical System Operating at λ=13nm
22. At‐wavelength metrology of 13 nm lithography imaging optics
23. Characterization of laser‐produced plasmas by ultraviolet Thomson scattering
24. Real-time, Sub-Micron Fluorescence Imaging of Extreme Ultraviolet Aerial Images
25. Extreme Ultraviolet Moiré Interferometry
26. At-Wavelength Metrology of EUV Cameras using Lateral-Shearing Interferometry
27. Silylated positive tone resists for EUV lithography at 14 nm
28. Dynamics of Ne-like populations in the germanium x-ray laser
29. Observation of plasma waves by Thomson scattering: Saturation of stimulated Raman scattering
30. Precision optical testing of a soft-x-ray camera at λ = 14 nm
31. Electron-temperature inhomogeneities along an x-ray laser plasma
32. Laser plasma sources for proximity printing or projection x-ray lithography
33. Test of the Landau cutoff of stimulated Raman scattering spectra as an electron-temperature diagnostic in laser-produced plasmas
34. A Search for Gain on 2p-2s Transitions in a Collisionally Excited Ge Plasma
35. Temperature Determination in X-ray Laser Plasmas by Thomson Scattering
36. Wavelength dependence of the resist sidewall angle in extreme ultraviolet lithography.
37. Stimulated Brillouin scattering in picosecond time scales: Experiments and modeling.
38. At-wavelength metrology of 13 nm lithography imaging optics.
39. Triggering of a laser-guided positive leader from a ground rod for the purpose of lightning control
40. Laser produced plasma light sources for EUV lithography.
41. Table-top extreme ultraviolet laser aerial imaging of lithographic masks.
42. Triggering of a laser-guided positive leader from a ground rod for the purpose of lightning control.
43. The inhomogeneity issue for X-ray lasers.
44. Guiding and triggering of large-scale electrical discharges using ultrashort pulse lasers.
45. Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks.
46. Stimulated Brillouin scattering with a 1 ps laser pulse in a preformed underdense plasma.
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