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Background removal is an important step in the quantitative analysis of electron energy-loss structure. Existing methods usually require an energy-loss region outside the fine structure in order to estimate the background. This paper describes a method for signal-from-background separation that is based on subspace division. The linear space is divided into two subspaces. The signal is recovered from a linear subspace containing no background information, and the other subspace containing the background is discarded. This method does not rely on any signal outside the energy-loss range of interest and should be very helpful for multiple linear least-squares (MLLS) regression analysis on experimental signals with little or no available smooth pre-edge region or with overlapping pre-edge features. Use of the algorithm is demonstrated with several practical applications, including closely overlapping core-loss spectra and zero-loss peak removal. Tests based on experimental data indicate that the algorithm has similar or better performance relative to conventional pre-edge power-law fitting methods in applications such as MLLS regression for electron energy-loss near-edge structure.

We discuss the possibility of significantly enhancing the nonlinear electro-optical response in strained perovskite $\mathrm{BaTi}{\mathrm{O}}_{3}$. First-principles calculations predict the enhancement for both compressive and tensile strain. The physical origin can be traced to strain-induced phonon softening that results in diverging first-order susceptibility. Within the Landau-Ginzburg-Devonshire formalism we demonstrate how, in turn, this divergence results in a diverging second-order susceptibility and Pockels coefficient. Our results suggest a way to optimize $\mathrm{BaTi}{\mathrm{O}}_{3}$ films for use in silicon nanophotonics.

The development of novel nano-oxide spintronic devices would benefit greatly from interfacing with emergent phenomena at oxide interfaces. In this paper, we integrate highly spin-split ferromagnetic semiconductor EuO onto perovskite SrTiO3 (001). A careful deposition of Eu metal by molecular beam epitaxy results in EuO growth via oxygen out-diffusion from SrTiO3. This in turn leaves behind a highly conductive interfacial layer through generation of oxygen vacancies. Below the Curie temperature of 70 K of EuO, this spin-polarized two-dimensional t 2g electron gas at the EuO/SrTiO3 interface displays very large positive linear magnetoresistance (MR). Soft x-ray angle-resolved photoemission spectroscopy (SX-ARPES) reveals the t 2g nature of the carriers. First principles calculations strongly suggest that Zeeman splitting, caused by proximity magnetism and oxygen vacancies in SrTiO3, is responsible for the MR. This system offers an as-yet-unexplored route to pursue proximity-induced effects in the oxide two-dimensional t 2g electron gas.

Display Omitted Highly crystalline BaTiO3 was integrated on Si using molecular beam epitaxy.Electro-optic response was evaluated for a-axis, c-axis, and mixed films.Increased a-axis fraction correlated with increased electro-optic response.Post-deposition oxygen anneal improved crystallinity and reduced leakage current. High-quality epitaxial BaTiO3 (BTO) on Si has emerged as a highly promising material for future electro-optic (EO) devices based on BTO's large effective Pockels coefficient. We report on the EO response of BTO films deposited on Si by molecular beam epitaxy (MBE), and characterize the structure of these films by reflection high-energy electron diffraction and X-ray diffraction. O2 rapid thermal anneal at 600?C for 30min ensures full oxidation of BTO for minimal leakage current with minimal change in crystalline structure.

Integration of functional oxides with semiconductors opens ways of creating novel hybrid architectures. However, epitaxy of these different types of materials brings challenges unlike those encountered in traditional semiconductor epitaxy. In this paper we will discuss our recent work on monolithic integration of perovskite oxides SrTiO3 and BaTiO3 on Si(001) and Ge(001), and the use of these pseudosubstrates to integrate other functional oxides using molecular beam epitaxy (MBE) and atomic layer deposition (ALD).

Significant progress has been made in integrating novel materials into silicon photonic structures in order to extend the functionality of photonic circuits. One of these promising optical materials is BaTiO

We study the nonlinear optical response in a strained thin film ferroelectric oxide BaTiO3 using piezoelectric Pb(Mg1/3Nb2/3)O3-PbTiO3 (001) as a variable strain substrate and La-doped SrTiO3 as a conductive buffer layer. The rotation-anisotropic second harmonic intensity profile shows hysteretic modulation corresponding to the strain variation from the inverse piezoelectric response of the substrate. An enhancement of 15% is observed at 1.2 kV/cm, while a control sample shows negligible change as a function of piezovoltage. Reflection high-energy electron diffraction, x-ray photoelectron spectroscopy, and high-resolution scanning transmission electron microscopy reveal the epitaxial interface. X-ray diffraction and piezoresponse force microscopy confirm tetragonal distortion and ferroelectricity of the BaTiO3 overlayer. Our results suggest a promising route to enhance the performance of nonlinear optical oxides for the development of future nano-opto-mechanical devices.

In this chapter, we provide an overview of the growing field of the two-dimensional electron gas in oxide heterostructures. The discovery of the high mobility electron gas at the oxide-oxide interface has spurred subsequent investigations which draw from the large body of work on polar oxide surfaces and thin films. We discuss the three main mechanisms of electronic reconstruction, oxygen vacancy formation, and cation exchange in order to address the question, “How can the interface between two insulators be conducting?” Throughout the chapter, in addition to the model LaAlO3/SrTiO3 system, we provide the reader with a sampling of what has been learned from other oxide heterostructures through both experiment and theory.

SrTiO3 is a widely used substrate for the growth of other functional oxide thin films. The reactivity of the substrate with respect to the film during deposition, particularly with regard to redox reactions, has typically been glossed over. We demonstrate by depositing a variety of metals (Ti, Al, Nb, Pt, Eu, and Sr) and measuring the in situ core level spectra of both the metal and SrTiO3 that, depending on the oxide formation energy and work function of the metal, three distinct types of behavior occur in thin metal films on SrTiO3 (100). In many cases, there will be an interfacial layer of oxygen-deficient SrTiO3 formed at the interface with the overlying film. We discuss how this may affect the interpretation of the well-known two-dimensional electron gas present at the interface between SrTiO3 and various oxides.

We report strategies of achieving both high assembly yield of carbon nanotubes at selected position of the circuit via dielectrophoresis (DEP) and field effect transistor (FET) yield using semiconducting enriched single walled carbon nanotube (s-SWNT) aqueous solution. When the DEP parameters were optimized for the assembly of individual s-SWNT, 97% of the devices show FET behavior with a maximum mobility of 210 cm2/Vs, on-off current ratio ~ 106 and on conductance up to 3 {\mu}S, however with an assembly yield of only 33%. As the DEP parameters were optimized so that 1-5 s-SWNTs are connected per electrode pair, the assembly yield was almost 90% with ~ 90% of these assembled devices demonstrating FET behavior. Further optimization gives an assembly yield of 100% with up to 10 SWNT/site, however with a reduced FET yield of 59%. Improved FET performance including higher current on-off ratio and high switching speed were obtained by integrating a local Al2O3 gate to the device. Our 90% FET with 90% assembly yield is the highest reported so far for carbon nanotube devices. Our study provides a pathway which could become a general approach for the high yield fabrication of CMOS compatible carbon nanotube FETs., Comment: 20 pages, 6 figures

Epitaxial heterostructures of γ−Al2O3/SrTiO3, grown by atomic layer deposition (ALD) and molecular beam epitaxy, have been characterized by advanced electron microscopy techniques, including aberration-corrected negative-Cs imaging, electron-energy-loss near-edge fine-structure analysis, and off-axis electron holography. Analysis of two-dimensional spectrum maps from samples that previously showed highly conductive interfacial layers revealed partial reduction of the Ti oxidation state in the SrTiO3 layer from Ti4+ to Ti3+, which was confined to within ∼1–2 unit cells of the interface. Electron holography of an ALD-grown sample revealed a phase profile within the SrTiO3 layer that rose sharply over a distance of about 1 nm moving away from the interface. Taken together, these results suggest a strong connection between reduction of oxidation state, which could be caused by oxygen vacancies and the quasi-two-dimensional electron gas present at the γ−Al2O3/SrTiO3 interface.

We report the formation of a quasi-two-dimensional electron gas (2-DEG) at the interface of γ-Al2O3/TiO2-terminated SrTiO3 (STO) grown by atomic layer deposition (ALD). The ALD growth of Al2O3 on STO(001) single crystal substrates was performed at temperatures in the range of 200–345 °C. Trimethylaluminum and water were used as co-reactants. In situ reflection high energy electron diffraction, ex situ x-ray diffraction, and ex situ cross-sectional transmission electron microscopy were used to determine the crystallinity of the Al2O3 films. As-deposited Al2O3 films grown above 300 °C were crystalline with the γ-Al2O3 phase. In situ x-ray photoelectron spectroscopy was used to characterize the Al2O3/STO interface, indicating that a Ti3+ feature in the Ti 2p spectrum of STO was formed after 2–3 ALD cycles of Al2O3 at 345 °C and even after the exposure to trimethylaluminum alone at 300 and 345 °C. The interface quasi-2-DEG is metallic and exhibits mobility values of ∼4 and 3000 cm2 V−1 s−1 at room temperature...

In this paper, we report on the highly conductive layer formed at the crystalline γ-alumina/SrTiO3 interface, which is attributed to oxygen vacancies. We describe the structure of thin γ-alumina layers deposited by molecular beam epitaxy on SrTiO3 (001) at growth temperatures in the range of 400–800 °C, as determined by reflection-high-energy electron diffraction, x-ray diffraction, and high-resolution electron microscopy. In situ x-ray photoelectron spectroscopy was used to confirm the presence of the oxygen-deficient layer. Electrical characterization indicates sheet carrier densities of ∼1013 cm−2 at room temperature for the sample deposited at 700 °C, with a maximum electron Hall mobility of 3100 cm2V−1s−1 at 3.2 K and room temperature mobility of 22 cm2V−1s−1. Annealing in oxygen is found to reduce the carrier density and turn a conductive sample into an insulator.

The (110) plane of Co3O4 spinel exhibits significantly higher rates of carbon monoxide conversion due to the presence of active Co3+ species at the surface. However, experimental studies of Co3O4 (110) surfaces and interfaces have been limited by the difficulties in growing high-quality films. We report thin (10–250 A) Co3O4 films grown by molecular beam epitaxy in the polar (110) direction on MgAl2O4 substrates. Reflection high-energy electron diffraction, atomic force microscopy, x-ray diffraction, and transmission electron microscopy measurements attest to the high quality of the as-grown films. Furthermore, we investigate the electronic structure of this material by core level and valence band x-ray photoelectron spectroscopy, and first-principles density functional theory calculations. Ellipsometry reveals a direct band gap of 0.75 eV and other interband transitions at higher energies. A valence band offset of 3.2 eV is measured for the Co3O4/MgAl2O4 heterostructure. Magnetic measurements show the si...

We report the fabrication and electron transport investigation of individual local-gated single-walled carbon nanotube field effect transistors (SWNT-FET) with high yield using a semiconducting-rich carbon nanotube solution. The individual semiconducting nanotubes were assembled at the selected position of the circuit via dielectrophoresis. Detailed electron transport investigations on 70 devices show that 99% display good FET behavior, with an average threshold voltage of 1 V, subthreshold swing as low as 140 mV/dec, and on/off current ratio as high as 8 × 10(5). The high yield directed assembly of local-gated SWNT-FET will facilitate large scale fabrication of CMOS (complementary metal-oxide-semiconductor) compatible nanoelectronic devices.

Significant progress has been made in integrating novel materials into silicon photonic structures to extend the functionality of photonic circuits. One of these promising optical materials, BaTiO 3 (BTO), exhibits a large Pockels coefficient as required for high-speed light modulators. Here, we employ several deposition methods such as molecular beam epitaxy and chemical vapor deposition to realize BTO thin films with different morphology and crystalline structure. By identifying the key structural predictors of electro-optic response in BTO/Si, we provide a roadmap to fully exploit the linear electro-optic effect in novel hybrid oxide/semiconductor nanophotonic devices.