Search

Voids in SiO2 films deposited on GaN were probed by using monoenergetic positron beams. The films were fabricated on GaN substrates by using plasma-enhanced chemical vapor deposition. The size and density of the voids in the films increased up to an annealing temperature of 800 °C and then decreased at 1000 °C. The observed annealing behaviors of the voids were attributed to the desorption of impurities incorporated during the deposition process and the shrinkage of the Si–O matrix by high-temperature annealing. Vacancy-type defects were introduced into the GaN substrate after 1000 °C annealing in O2 atmosphere due to the diffusion of Ga from the substrate to the SiO2 film. No out-diffusion of Ga into the SiO2 film was observed for the annealing in N2 atmosphere. Thus, the observed out-diffusion of Ga was attributed to the enhanced oxidation of GaN during the annealing in O2 atmosphere. The diffusion of positrons implanted into the GaN substrate toward the SiO2 film was suppressed by annealing, suggesting a decrease in the negative charges in the SiO2 film or near the SiO2/GaN interface. [ABSTRACT FROM AUTHOR]

Defects in the Al2O3(25 nm)/GaN structure were probed by using monoenergetic positron beams. Al2O3 films were deposited on GaN by atomic layer deposition at 300 °C. Temperature treatment above 800 °C leads to the introduction of vacancy-type defects in GaN due to outdiffusion of atoms from GaN into Al2O3. The width of the damaged region was determined to be 40-50 nm from the Al2O3/GaN interface, and some of the vacancies were identified to act as electron trapping centers. In the Al2O3 film before and after annealing treatment at 300-900 °C, open spaces with three different sizes were found to coexist. The density of medium-sized open spaces started to decrease above 800 °C, which was associated with the interaction between GaN and Al2O3. Effects of the electron trapping/detrapping processes of interface states on the flat band voltage and the defects in GaN were also discussed. [ABSTRACT FROM AUTHOR]

Vacancy‐type defects in Mg‐implanted GaN are probed using monoenergetic positron beams. Mg+ ions are implanted to provide a 500‐nm‐deep box profile with Mg concentrations, [Mg], of 1 × 1017–1 × 1019 cm−3 at room temperature. In the as‐implanted samples, the major defect species is a complex of a Ga vacancy (VGa) and a nitrogen vacancy (VN). After annealing above 1000 °C, the major defect species is changed to vacancy clusters due to vacancy agglomeration. This agglomeration is suppressed, and the agglomeration onset temperature is decreased with a decreasing [Mg]. For samples with [Mg] ≥ 1 × 1018 cm−3, the trapping rate of positrons by vacancy‐type defects decrease after annealing above 1100–1200 °C. This decreases is attributed to the change in the defect charge states from neutral to positive due to a downward shift of the Fermi level. The carrier trapping/detrapping properties of the vacancy‐type defects and their time dependences are also revealed. [ABSTRACT FROM AUTHOR]

Hydrothermally stable particles of the metal-organic framework MIL-101(Cr) were incorporated into a polysulfone (PSF) matrix to produce mixed-matrix or composite membranes with excellent dispersion of MIL-101 particles and good adhesion within the polymer matrix. Pure gas (O2, N2, CO2 and CH4) permeation tests showed a significant increase of gas permeabilities of the mixed-matrix membranes without any loss in selectivity. Positron annihilation lifetime spectroscopy (PALS) indicated that the increased gas permeability is due to the free volume in the PSF polymer and the added large free volume inside the MIL-101 particles. The trend of the gas transport properties of the composite membranes could be reproduced by a Maxwell model. [ABSTRACT FROM AUTHOR]