1. In-situ TEM study of the crystallization of thin films composed of Sb3.6Te with Ge
- Author
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Kooi, BJ, Groot, WMG, De Hosson, JTM, Ahner, JW, Levy, J, Hesselink, L, Mijiritskii, A, and Applied Physics
- Abstract
This paper addresses the crystallization of amorphous Sb3.6Te films (40 nm thick) and 5 at.% Ge containing Sb3.6Te films (10, 20 and 40 nm thick) as studied using in-situ annealing in a Transmission Electron Microscope (TEM). These materials show growth-dominated crystallization, in contrast to Ge2Sb2Tc5 that shows nucleation-dominated crystallization. Particularly the crystal-growth velocity in these systems is measured as a function of temperature from which the activation energy for growth can be derived. The strong effect of the 5 at.% Ge addition on the total crystallization behavior is revealed: Ge increases the crystallization temperature (from 95 to 150 degreesC), increases the activation energy for growth (from 1.58 to 2.37 eV), increases the nucleation rate and decreases the growth anisotropy.
- Published
- 2004