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1. Analyzing line width roughness (LWR) sensitivity to resist and laser-induced speckle for enhanced PSD-based quantification

3. Simultaneous source-mask-laser spectrum optimization

11. Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield

14. High Volume Semiconductor Manufacturing Using Nanoimprint Lithography

15. Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systems

25. Serum amyloid A and C‐reactive protein positive nodule in alcoholic liver cirrhosis, hard to make definite diagnosis

26. Characterization of Small Solid Tumors in the Pancreas: The Value of Contrast-Enhanced Harmonic Endoscopic Ultrasonography

27. Well-differentiated Hepatocellular Carcinoma Detected as Hypovascularity by Only CT during Hepatic Arteriography

33. Correlation between Insulin Resistance and Outcome of Pegylated Interferon and Ribavirin Therapy, Hepatic Steatosis, Hepatic Fibrosis in Chronic Hepatitis C-1b and High Viral Load

34. Double-Filtration Plasmapheresis plus Interferon-β for HCV-1b Patients with Non-Sustained Virological Response to Previous Combination Therapy

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