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1. Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer

Author

Engelmann, Sebastian U., primary, Bruce, Robert L., additional, Joseph, Eric A., additional, Fuller, Nicholas C. M., additional, Graham, William S., additional, Sikorski, Edmund M., additional, Kohjasteh, Mahmoud, additional, Zhu, Yu, additional, Nakamura, Masahiro, additional, Ito, Azumi, additional, Matsumoto, Hirokazu, additional, Matsuura, Goh, additional, and Suzuki, Takefumi, additional

Published
2017
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