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The parameters related to the localized states in green-emitting indium gallium nitride (InGaN) have been evaluated by considering the energy diagrams derived by five different methods: (1) the exponential tail of the low-energy side of photoluminescence (PL) spectra, (2) the photon energy dependence of PL decay time, (3) excitation energy dependence of the PL peak energy, (4) the PL excitation spectrum, and (5) the temperature dependence of PL peak energy. The results indicate that the energy diagram of InGaN is divided into four regions: deep localized states, migration region, transition region, and extended states. It is suggested that wider localized states and a narrower transition region are preferable in order to achieve higher PL efficiency. In addition, the dependence of carrier density on PL properties supports the fact of photo-generated carriers forming localized excitons in green-emitting InGaN, although the carriers do not form localized excitons in orange-emitting InGaN and instead exist as localized electrons and holes. [ABSTRACT FROM AUTHOR]

The carrier density dependence of photoluminescence (PL) spectra, PL efficiency, and time-resolved PL (TRPL) in InGaN/GaN nanocolumns with orange emission has been measured over a wide range of carrier densities to investigate the carrier recombination dynamics at low and room temperatures. The TRPL decay curves were analyzed by stretched exponential functions to obtain a distribution of the decay times. The results indicate that the emission origin in InGaN with orange emission under low excitation intensity is the recombination of localized electrons and holes, not from localized excitons. Our analysis shows that the total density of localized states is an important factor to increase PL efficiency, which implies that red-emitting InGaN with a high density of localized states due to large indium fluctuation has the potential to achieve high PL efficiency. In addition, we have shown that the stretched exponential function is an effective approach to analyze several carrier relaxation processes with different decay times. [ABSTRACT FROM AUTHOR]

A study was done on resonant cavity enhanced (RCE) photodetectors for wavelengths ranging from visible to 1.5 micrometers. An expression relating the quantum efficiency to cavity parameterswas derived after a detailed analysis of the RCE detector response. Two new detector structures consisting of Ge detectors with GaAs/AlAs mirrors and Si detectors with GaP/AlP mirrors were presented basing on the derived numerical equations.

We have measured and analyzed the carrier-density dependence of photoluminescence (PL) spectra and the PL efficiency of InGaN/GaN multiple quantum wells in nanocolumns and in a thin film over a wide excitation range. The localized states parameters, such as the tailing parameter, density and size of the localized states, and the mobility edge density are estimated. The spectral change and reduction of PL efficiency are explained by filling of the localized states and population into the extended states around the mobility edge density. We have also found that the nanocolumns have a narrower distribution of the localized states and a higher PL efficiency than those of the film sample although the In composition of the nanocolumns is higher than that of the film. [ABSTRACT FROM AUTHOR]

Very thick InN (∼40 μm) was grown by molecular beam epitaxy using the epitaxial lateral overgrowth (ELO) technique. In some regions, the ELO of InN was observed as expected, indicating an important step toward fabricating quasi-bulk InN substrates. Interestingly, most parts of the sample consist of large flat-topped microcrystals and well-faceted microstructures. This is likely due to local growth condition variations during ELO, which is supported by an experiment where ELO of InN was performed on a substrate with various stripe mask patterns. TEM characterization of a flat top InN microcrystal revealed few stacking faults and only related threading dislocations. Defect-free small faceted microcrystals were also observed. The thick InN crystals show a narrow photoluminescence spectrum with a peak at 0.679 eV and linewidth of 16.8 meV at 4K. [ABSTRACT FROM AUTHOR]

The relaxation of lattice-mismatched strain by deep postetching was systematically investigated for InGaN/GaN multiple quantum wells (MQWs). A planar heterojunction wafer, which included an In0.21Ga0.79N (3.2 nm)/GaN (14.8 nm) MQW, was etched by inductively coupled plasma dry etching, to fabricate high-density nanopillar, nanostripe, and nanohole arrays. The etching depth was 570 nm for all nanostructures. The diameter of the nanopillars was varied from 50 to 300 nm, then the mesa stripe width of the nanostripes and the diameter of the nanoholes were varied from 100 nm to 440 nm and 50 nm to 310 nm, respectively. The effect of strain relaxation on various optical properties was investigated. For example, in an array of nanopillars with diameter 130 nm and interval 250 nm, a large blueshift in the photoluminescence (PL) emission peak from 510 nm (as-grown) to 459 nm occurred at room temperature (RT). PL internal quantum efficiency (defined by the ratio of PL integral intensity at 300 K to that at 4.2 K) was enhanced from 34% (as-grown) to 60%, and the PL decay time at 4.2 K was reduced from 22 ns (as-grown) to 4.2 ns. These results clearly indicate the reduction of lattice-mismatched strain by postetching, which enhanced strain reduction with decreasing nanopillar diameter down to a diameter of 130 nm, where the strain reduction became saturated. The dependence of RT-PL decay time on nanopillar diameter was measured, and the surface nonradiative recombination velocity was estimated to be 5.8×102 cm/s. This relatively slow rate indicates a little etching damage. [ABSTRACT FROM AUTHOR]

The optical properties of InGaN/GaN quantum wells, which were nanopatterned into cylindrical shapes with diameters of 2 μm, 1 μm, or 500 nm by chemically assisted ion beam etching, were investigated. Photoluminescence (PL) and time-resolved PL measurements suggest inhomogeneous relaxation of the lattice-mismatch induced strain in the InGaN layers. By comparing to a strain distribution simulation, we found that partial stain relaxation occurs at the free side wall, but strain remains in the middle of the pillar structures. The strain relaxation leads to an enhanced radiative recombination rate by a factor of 4–8. On the other hand, nonradiative recombination processes are not strongly affected, even by postgrowth etching. Those characteristics are clearly reflected in the doughnut-shape emission patterns observed by optical microscopy. [ABSTRACT FROM AUTHOR]

Presents a study which determined considerable modulation ratios for gallium arsenide multiple-quantum-well reflector modulators grown in silicon by inserting an aluminum arsenide/aluminum gallium arsenide dielectric mirror into the device structure. Features noticeable in the reflectivity spectra; Performance for a gallium arsenide MQW reflector modulator grown in silicon; Details on the tuning of the absorption peak and and the Fabry-Perot mode.