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Plasma characteristics and electrical parameters of an internal linear inductively coupled plasma (ICP) source with a U-type antenna with/without a Ni–Zn ferromagnetic material installed near the antenna were investigated. The application of the ferromagnetic material to the antenna increased the plasma density, improved the plasma uniformity, lowered the antenna voltage, and increased the stability of the plasma during the operation. For the U-type ferromagnetic enhanced internal linear ICP source, a high density plasma on the order of 4.5×1011 cm-3 which is about three higher than that obtained for the source without the ferromagnetic material could be obtained at the pressure of 10 mTorr Ar and at the RF power of 600 W at 13.56 MHz.

Top-emitting organic light-emitting diodes (TEOLEDs) with a thin semitransparent conducting cathode (STCC) of Ba/Al/ITO were fabricated and their electrical/optical characteristics were investigated. At the wavelength of 519 nm, optical properties of STCC of the Ba (5 nm)/Al (10 nm)/ITO (100 nm) structure showed the transmittance of 75% and the reflectance of 13%. The light out-coupling properties of the TEOLED, which is consisted of glass/Ag (100 nm)/ITO (125 nm)/4,4′,4″-tris[2-naphthylphenyl-1-phenylamino]triphenylamine (2-TNATA, 30 nm)/4,4′-bis[ N -(1-napthyl)- N -phenyl-amino]-biphenyl (NPB, 18 nm)/tris(8-quinolinolato)aluminum (III) (Alq 3 , 62 nm)/Ba ( x nm, x = 15, 10, and 5 nm)/Al (10 nm)/ITO (100 nm), was increased as the deposition thickness of Ba is reduced. This driving performance of the devices could be interpreted on the base of carrier injection barrier by Fowler–Nordheim tunneling theory as well as the optical properties of the cathode. A constant barrier height of 0.4 eV was obtained for all the devices regardless of the cathode structure composed of Ba ( x nm)/Al (10 nm)/ITO (100 nm), which indicates the electron-only devices where the injection barrier is at the ITO/2-TNATA interface.

The characteristics of a large-size internal-type inductively coupled plasma (ICP) source having a \double-comb-type" antenna have been investigated for the processing of a large-area at-panel display substrate having a size of 2,300 mm 2,000 mm, and its characteristics were compared with those for an ICP source having a \serpentine-type" antenna. The ICP source with the \double-comb-type" antenna showed a lower impedance, a higher plasma uniformity, and a higher plasma density compared to the ICP source with the \serpentine-type" antenna. The measured plasma density and uniformity of the ICP source with the \double-comb-type" antenna were higher than 8.5 1010/cm3 and lower than 14 %, respectively, at a 10 kW rf power and 15 mTorr of Ar. The etch uniformity of the photoresist within the substrate was about 12.5 % at a 8 kW rf power and 15 mTorr Ar/O2 (7 : 3).

The electrical and the plasma properties of an internal linear inductively coupled plasma (ICP) source with/without a C-shaped Ni-Zn ferromagnetic module installed near the inductive antenna were investigated. The installation of the ferromagnetic module decreased the voltage and the current of the antenna at a given power while the phase angle between the voltage and the current was decreased. Therefore, the load resistance and the power transfer e ciency were increased at the same rf power for the ICP source with the ferromagnetic module. At a rf power of 800 W and 5 mTorr, the installation of the ferromagnetic material increased the plasma density from 2.9 1011/cm3 to 3.5 1011/cm3 while decreasing the plasma potential and the electron temperature slightly.

The development of a large-area plasma source with high density plasmas is desired for a variety of plasma processes from microelectronics fabrication to flat panel display device fabrication. In this study, a novel internal-type linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880 mm × 660 mm and the effect of plasma confinement by applying multi-polar magnetic field was investigated. High density plasmas on the order of 3.2 × 1011 cm−3 which is 50% higher than that obtained for the source without the magnetic field could be obtained at the pressure of 15 mTorr Ar and at the inductive power of 5,000 W with good plasma stability. The plasma uniformity

This study examined the electrical and plasma properties of an internal linear inductive antenna for flat panel display processing. An internal linear antenna, which is referred to as a "double comb-type antenna", with a substrate area of 2,300×2,000 mm2 was used as a large-area inductively coupled plasma (ICP) source. This extremely large area ICP source showed a transition from E-mode to H-mode near 3 kW. At 9 kW, a power transfer efficiency of approximately 81% was obtained. The plasma uniformity measured by a Langmuir probe was approximately 14% over the substrate area at 15 mTorr Ar and 5 kW of RF power.

J Korean Assoc Oral Maxillofac Surg 2011;37:77-80) A calcifying epithelial odontogenic tumor (CEOT) was first described as a separate entity in 1955 by Pindborg, and has since be en referred to as Pindborg tumor. CEOT is characterized by the presence of squamous-cell proliferation, calcification and amyloid deposits, and a ccounts for only 1% of all odontogenic tumors. CEOT is a benign, though occasional locally invasive, slow-growing neoplasm. It is located either in traosseously or extraosseously, and is usually associated with an unerupted permanent tooth. A 24 year-old female visited our clinic, presenting with a palatal swelling and intra-oral ulcer. After an incisional biopsy, t he lesion was confirmed to be odontogenic tumor. A tumor resection and reconstruction surgery with tongue flap were performed.

This study examined the effect of the antenna capacitance of an inductively coupled plasma (ICP) source, which was varied using an internal linear antenna, on the electrical and plasma characteristics of the ICP source. The inductive coupling at a given rf current increased with decreasing antenna capacitance. This was caused by a decrease in the inner copper diameter of the antenna made from coaxial copper/quartz tubing, which resulted in a higher plasma density and lower plasma potential. By decreasing the diameter of the copper tube from 25to10mm, the plasma density of a plasma source size of 2750×2350mm2 was increased from approximately 8×1010∕cm3to1.5×1011∕cm3 at 15mTorr Ar and 9kW of rf power.

A number of recent, independent investigations have shown that the binding of Mg++ ( Brierley et al. , 1962 ), Ca++ ( Vasington and Murphy, 1962 ) and Mn++ ( Chappell et al. , 1962 ) to mitochondria share in common a characteristic concomitant binding of phosphate. It has been suggested by Brierley et al. (1962) that the known affinities of these metal ions for phosphate may be involved in the binding and indeed that actual intramitochondrial precipitation of insoluble phosphates is an integral part of the process. We wish to call attention to the similarity of these binding phenomena to that obtainable with guanidine and alkylguanidines ( Pressman, 1963 ). The present communication will extend the similarity by showing that the binding of guanidine shows a common pattern with that of Mg++ in response to various inhibitors, and furthermore, that guanidine and Mg++ are mutually competetive for mitochondrial binding sites.