1. Fundamental Investigation of the Application Behavior and Stabilization Potential of Milling Tools with Structured Flank Faces on the Minor Cutting Edges
- Author
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Raphael Isaak Elias Schönecker, Jonas Baumann, Rafael Garcia Carballo, and Dirk Biermann
- Subjects
process dynamics ,chatter suppression ,chatter stability limit ,structure elements ,Production capacity. Manufacturing capacity ,T58.7-58.8 - Abstract
In milling processes in which material removal is performed periodically from solid material, dynamic effects are generally considered to be responsible for instabilities and subsequent productivity limits. Usually, in such applications, the process-inherent complex dynamic load spectrum on machines, tools and workpieces is considered together with vibration-based relative displacements that can be attributed to the regenerative effect. There are numerous techniques in the literature addressing the suppression of these dynamic effects, but they require a large amount of analysis and implementation effort as well as specific expert knowledge. The approach presented here, however, provides a universally applicable method for suppressing chatter vibrations and deflections. By applying structure elements to the flanks of the minor cutting edges of HSS end mills, it was possible to increase the chatter-free limiting depth of cut ap,crit in the milling processes of the aluminum alloy EN AW-7075. Structured tools were used in ramp milling tests to investigate various effects, such as the influence of certain geometric design features on the stabilization potential compared to a reference tool. Furthermore, the effects of varied process parameter configurations and wear-related effects on the performance of the tool concept were focused on as well. The three key design features of the cutting edge and the structured profiles were identified from the results of the investigation, which, when combined in the most efficient design, in each case led to the development of an optimized structure and process configuration with cumulative potential for increasing the stability limit up to 200%.
- Published
- 2024
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