1. Artificial synapse based on low-voltage Ni-doped CuI thin-film transistors for neuromorphic application.
- Author
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Peng, Yuling, Dou, Wei, Chen, Pengfei, Xu, Xiaodong, Jiang, Guanggang, Deng, Pufan, Zhang, Nenghui, Yin, Yanling, Peng, Yuehua, and Tang, Dongsheng
- Subjects
CUPROUS iodide ,THRESHOLD voltage ,LONG-term potentiation ,NEUROPLASTICITY ,LOGIC circuits - Abstract
Inspired by the human brain's capacity as a powerful biological computer capable of simultaneously processing a vast array of cognitive tasks, many emerging artificial synapse devices have been developed in recent years. Electric-double-layer (EDL) transistors based on interfacial ion-modulation have attracted widespread attention for simulating synaptic plasticity and neural functions. Here, low-voltage EDL p-type thin-film transistors (TFTs) are fabricated on glass substrates, with Ni-doped cuprous iodide (Ni
0.06 Cu0.94 I) as the channel and chitosan as the dielectric. The electrical performance of the Ni0.06 Cu0.94 I TFTs is investigated: current on/off ratio of 6.4 × 104 , subthreshold swing of 33 mV/dec, threshold voltage of 1.38 V, operating voltage of 2 V, and saturation field-effect mobility of 15.75 cm2 V−1 s−1 . A dual in-plane gate OR logic operation is demonstrated. Importantly, by applying single voltage pulses, dual voltage pulses, and multiple voltage pulses to the gate, the Ni0.06 Cu0.94 I transistors exhibited typical synaptic characteristics, including short-term potentiation, short-term depression, long-term potentiation, long-term depression, paired-pulse facilitation, and spiking-rate-dependent plasticity. Furthermore, the synaptic transistor can also simulate the learning–forgetting–relearning process of the human brain. These remarkable behaviors of voltage-stimulated synaptic transistors have potential for neuromorphic applications in future artificial systems. [ABSTRACT FROM AUTHOR]- Published
- 2024
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