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The effects of the CdCl2passivation treatment on thin-film CdTe photovoltaic films and devices have been extensively studied. Recently, with an addition of CdSeTe layer at the front of the absorber layer, device conversion efficiencies in excess of 19% have been demonstrated. The effects of the CdCl2passivation treatment for devices using CdSeTe has not been studied previously. This is the first reported study of the effect of the treatment on the microstructure of the CdSeTe /CdTe absorber. The device efficiency is < 1% for the as-deposited device but this is dramatically increased by the CdCl2treatment. Using Scanning Transmission Electron Microscopy (STEM), we show that the CdCl2passivation of CdSeTe/CdTe films results in the removal of high densities of stacking faults, increase in grain size and reorientation of grains. The CdCl2treatment leads to grading of the absorber CdSeTe/CdTe films by diffusion of Se between the CdSeTe and CdTe regions. Chlorine decorates the CdSeTe and CdTe grain boundaries leading to their passivation. Direct evidence for these effects is presented using STEM and Energy Dispersive X-ray Analysis (EDX) on device cross-sections prepared using focused ion beam etching. The grading of the Se in the device is quantified using EDX line scans. The comparison of CdSeTe/CdTe device microstructure and composition before and after the CdCl2treatment provides insights into the important effects of the process and points the way to further improvements that can be made.

An 800 nm CdSeTe layer was added to the CdTe absorber used in high-efficiency CdTe cells to increase the current and produce an increase in efficiency. The CdSeTe layer employed had a band-gap near 1.41 eV, compared with 1.5 eV for CdTe. This lower band-gap enabled a current density increase from approximately 26 to over 28 mA/cm2. The open-circuit voltage obtained in the high-efficiency CdTe-only device was maintained and the fill-factor remained close to 80%. Improving the short-circuit current density and maintaining the open-circuit voltage lead to device efficiency over 19%. External quantum efficiency implied that about half the current was generated in the CdSeTe layer and half in the CdTe. Cross-sectional STEM and EDS showed good grain structure throughout. Diffusion of Se into the CdTe layer was observed. This is the highest efficiency polycrystalline CdTe photovoltaic device demonstrated by a university or national laboratory.

Over 19% device efficiency with over 28 mA/cm$^{2}$ short-circuit current density has been achieved with thin-film using CdSeTe/CdTe graded absorber. A deep pocket sublimation source was used to deposit CdSeTe alloy. However, cross-section line scan using energy dispersive X-ray spectroscope showed that actual Se incorporation in the absorber films was much lower than the feed stock composition. Further lowering the band-gap of deposited CdSeTe films will further improve absorption of higher wavelengths leading to higher short-circuit current density. To overcome the limitation preferential sublimation of CdSeTe, advanced co-sublimation of Se and CdTe to achieve higher Se incorporation and lower bandgap is presented.

CdTe and CZT materials are technologies for gamma and x-ray imaging for applications in industry, homeland security, defense, space, medical, and astrophysics. There remain challenges in uniformity over large detector areas (50~75 mm) due to a combination of material purity, handling, growth process, grown in defects, doping/compensation, and metal contacts/surface states. The influence of these various factors has yet to be explored at the large substrate level required for devices with higher resolution both spatially and spectroscopically. In this study, we looked at how the crystal growth processes affect the size and density distributions of microscopic Te inclusion defects. We were able to grow single crystals as large as 75 mm in diameter and spatially characterize three-dimensional defects and map the uniformity using IR microscopy. We report on the pattern of observed defects within wafers and its relation to instabilities at the crystal growth interface.

The growth of high quality TeO2 single crystals for acousto-optic devices usually requires a starting powder of relatively high purity (99.995% or better). In addition to foreign metallic impurities, even minute amounts of excess Te precipitating in TeO2 can play a role in the crystal growth behavior and in the resulting properties of the crystal. In this paper, two different approaches for the synthesis of high quality TeO2 starting material have been tested, both using 99.9995% Te as precursor. In the first case, basically a high temperature oxidation process, fine Te powder was subjected to a multi-stage oxidizing process occurring either in vapor or solid phase. In the second case, a hydro-metallurgical method, Te powder was dissolved in nitric acid and then precipitated in form of TeO2. The purity was measured by glow discharge mass spectroscopy and the tellurium fraction in TeO2 was determined by measuring the absorption at 442 nm of the gas phase in equilibrium with a solid sample. This technique, used for the first time to measure free Te in TeO2, has proven to apply to this system, leading to good sensitivity and good repeatability. While high temperature oxidation (vapor phase oxidation or solid state diffusion) of 99.9995% Te powder allowed for preserving the purity of the material, the incorporation of impurities was observed when the TeO2 was synthesized through a wet chemical process, leading to a 99.999% purity. This last technique, however, offered the lowest deviation from stoichiometry.