1. The influence of secondary ion beam irradiation on the formation of Si nanocrystals during dual ion beam sputtering
- Author
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Jung Hyun Kang, Tae Hun Chung, Jae-Yel Yi, Hong Jun Bark, Kyu Man Cha, Jae Kwon Kim, and Yong Kim
- Subjects
Ion beam ,Ion beam mixing ,Chemistry ,Metals and Alloys ,Analytical chemistry ,Surfaces and Interfaces ,Focused ion beam ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Ion beam deposition ,Sputtering ,Transmission electron microscopy ,Materials Chemistry ,Thin film ,Electron beam-induced deposition - Abstract
We investigate the deposition of SiO x films by dual ion beam sputtering system with emphasis on secondary ion beam irradiation effect. We observe the intense photoluminescence (PL) from SiO x samples with apparent oxygen contents, x app , in the narrow range of 1.1≤ x app ≤1.4, after post-deposition annealing at 1100 °C. This indicates the formation of Si nanocrystals as evidenced by cross-sectional transmission electron microscope (TEM) image. Ar ion beam irradiation changes PL peak positions in ion-beam exposed region. This effect is utilized for achieving the area-selective formation of Si nanocrytals by inserting a shadow mask in secondary ion beam during deposition.
- Published
- 2005
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