1. Deep-submicrometer large-angle-tilt implanted drain (LATID) technology
- Author
-
Y. Odake, T. Yasui, J. Hirase, and Takashi Hori
- Subjects
Materials science ,Equivalent series resistance ,business.industry ,Electrical engineering ,Circuit reliability ,Capacitance ,Electronic, Optical and Magnetic Materials ,Ion implantation ,CMOS ,Hardware_INTEGRATEDCIRCUITS ,Optoelectronics ,Field-effect transistor ,Electrical and Electronic Engineering ,business ,Electronic circuit ,Voltage - Abstract
Deep-submicrometer large-angle-tilt implanted drain (LATID) technology is described. It is found by Monte Carlo process simulation and SIMS measurements that a sufficiently long n/sup -/ region can be formed under the gate by taking advantage of large-angle-tilt implant and successfully without ion channeling by taking care of the implant direction. A design that offsets the n/sup +/ implant by sidewall spacers to suppress the n/sup +/-gate overlap to zero while keeping the n/sup -/ region fully overlapped with the gate is found to be crucial for improved performance and reliability. The device performance, such as current drivability and short-channel effects, is described, and the circuit speed is investigated. Hot-carrier effects such as lateral electric field and device lifetime over a wide range of drain structures are also investigated. The tradeoff between device performance and hot-carrier reliability in deep-submicrometer LATID FETs is discussed. >
- Published
- 1992