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This paper reports the magnetic, electrical, and microstructural properties of epitaxial thin films with an ordered double-perovskite structure. [Sr.sub.2] FeMo[O.sub.6] (SFMO) and [Sr.sub.2] CrRe[O.sub.6] (SCRO) films have been grown by sputtering onto the lattice-matched substrates of [Ba.sub.0.4] [Sr.sub.0.6] Ti[O.sub.3] -buffered and bare SrTi[O.sub.3], respectively. These films exhibit high saturation magnetization [M.sub.s] values (3.8 [[micro].sub.B]]/f.u. for SFMO and 0.9 [[micro].sub.B]/f.u. for SCRO), which are close to the expected values for their half-metallicity, and high curie temperature [T.sub.c] values (385 K for SFMO and 620 K for SCRO). Surface analyzes by AFM and XPS indicate that these films have atomically flat and well-defined surfaces, which are free from any surface precipitates. This enables us to employ a standard photolithographic process for fabricating magnetic tunnel junctions based on these films. SFMO junctions with a native barrier formed by surface oxidation of a SFMO base-electrode and a Co counterelectrode have shown a tunnel magnetoresistance ratio of 10% at 4.2 K. Index Terms--Double perovskite, epitaxial film, half-metallic feromagnet, magnetic tunnel junction.

This paper reports development activities for a new production management system aiming to obtain excellent product quality and high productivity by heightening the morale of the workers and by harmonizing the workers human needs with the company's organizational needs. In the course of processing with the development of the new production management system, first, the needs of workers as a whole and as individuals were analysed by the multivariate analysis method, so as to clarify the differences in their motivations in regards of the workers attributes working environments and the management systems. Secondly, several proposals for improvement were presented to workers as a whole and as individuals and such proposed improvements were experimentally implemented one after another in order to harmonize the human needs with the organizational needs. [ABSTRACT FROM AUTHOR]