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The present study reports Al induced crystallization (AIC) of amorphous (a)-SiGe in Al-Ge-Si ternary system at low temperature ~ 350 degree C. In addition to crystallization, the isothermal annealing of a-SiGe/AlOx/Al/corning-glass (CG) structure was found to be accompanied by an Al induced layer exchange (ALILE) phenomenon. The evolution of residual stress in the Al layer during isothermal annealing is evaluated using X-ray diffraction based technique to ascertain the role of stress in the ALILE process. A corroboration of the stress with the growth kinetics, analyzed using Avrami theory of phase transformation gives a comprehensive understanding of the ALILE crystallization process in this system. The grown polycrystalline SiGe thin film is a potential candidate for novel technological applications in semiconductor devices., Comment: 24 pages, 11 figures

The present study reports on an innovative method to prepare discrete diamond nanoparticles or nanodiamonds (NDs) with high structural and optical quality through top-down approach by controlled oxidation of pre-synthesized nanocrystalline diamond (NCD) film. These NDs are studied for their structural and optical properties using atomic force microscopy (AFM), Raman and fluorescence (FL) spectroscopy. While AFM analysis confirms uniform distribution of discrete NDs with different sizes varying from a few tens of nanometers to about a micron, spectroscopic investigations reveal the presence of impurity - vacancy related color centers exhibiting FL at 637 and 738 nm as a function of particle size. In addition, an intense emission originating from vacancy centers associated with N and Si (SiV-) is observed for all NDs at the temperature close to liquid nitrogen. A detailed spectral analysis is carried out on the structural defects in these NDs. The full width at half maximum of diamond Raman band ( ~ 1332 cm-1) is found to be as narrow as 1.5 cm-1 which reveals the superior structural quality of these NDs. Further, mapping of diamond Raman and FL spectra of SiV- confirm the uniform distribution of NDs throughout the substrate. The narrow line widths and a minimal shift in peak positions of Raman and FL spectra endorse this aspect., Comment: 30 pages, 5 figures, 3 Tables

We report the synthesis of polycrystalline (poly)-SiGe alloy thin films through solid state reaction of Si/Ge multilayer thin films on Si and glass substrates at low temperature of 500 {\deg}C. The pristine thin film was deposited using electron beam evaporation with optimized in-situ substrate heating. Our results show the co-existence of amorphous Si (a-Si) phase along with the poly-SiGe phase in the pristine thin film. The a-Si phase was found to subsume into the SiGe phase upon post deposition annealing in the temperature range from 600 to 800 {\deg}C. Additionally, dual energy band gaps could be observed in the optical properties of the annealed poly-SiGe thin films. The stoichiometric evolution of the pristine thin film and its subsequent effect on the band gap upon annealing are discussed on the basis of diffusion characteristics of Si in poly-SiGe., Comment: 18 pages, 9 figures, 2 tables

Nanographitic structures (NGSs) with multitude of morphological features are grown on SiO2/Si substrates by electron cyclotron resonance - plasma enhanced chemical vapor deposition (ECR-PECVD). CH4 is used as source gas with Ar and H2 as dilutants. Field emission scanning electron microscopy, high resolution transmission electron microscopy (HRTEM) and Raman spectroscopy are used to study the structural and morphological features of the grown films. Herein, we demonstrate, how the morphology can be tuned from planar to vertical structure using single control parameter namely, dilution of CH4 with Ar and/or H2. Our results show that the competitive growth and etching processes dictate the morphology of the NGSs. While Ar-rich composition favors vertically oriented graphene nanosheets, H2-rich composition aids growth of planar films. Raman analysis reveals dilution of CH4 with either Ar or H2 or in combination helps to improve the structural quality of the films. Line shape analysis of Raman 2D band shows nearly symmetric Lorentzian profile which confirms the turbostratic nature of the grown NGSs. Further, this aspect is elucidated by HRTEM studies by observing elliptical diffraction pattern. Based on these experiments, a comprehensive understanding is obtained on the growth and structural properties of NGSs grown over a wide range of feedstock compositions., Comment: 19 pages, 8 figures, 1 table

Defects in planar and vertically oriented nanographitic structures (NGSs) synthesized by plasma enhanced chemical vapor deposition (PECVD) has been investigated using Raman and X-ray photoelectron spectroscopy. While Raman spectra reveal the dominance of vacancy and boundary type defects respectively in vertical and planar NGSs, XPS provides additional information on vacancy related defect peaks at C 1s spectrum that originate from non-conjugated carbon atoms in hexagonal lattice. Although an excellent correlation prevails between these two techniques, our results show that estimation of surface defects by XPS is more accurate than Raman analysis. Nuances of these techniques are discussed in the context of assessing defects in nanographitic structures., Comment: 21 pages, 5 figures, 2 tables

We report on an XPS study of AlN thin films grown on Si(100) substrates by ion beam sputter deposition (IBSD) in reactive assistance of N+/N2+ ions to unravel the compositional variation of their surface when deposited at different substrate temperatures. The temperature of the substrate was varied as room temperature (RT), 100oC and 500oC. The binding energy of Al-2p, N-1s and O-1s core electrons indicate the formation of 2H polytypoid of AlN. The increase in concentration of AlN with substrate temperature during deposition is elucidated through detailed analysis with calculated elemental atomic concentrations (at. %) of all possible phases at the film surface. Our results show that predominate formation of AlN as high as 74 at. % is achievable using substrate temperature as the only process parameter. This high fraction of AlN in thin film surface composition is remarkable when compared to other growth techniques. Also, the formation of other phases is established based on their elemental concentrations., Comment: 13 pages, 6 figures, 2 tables, submitted to the journal "Thin Solid Films"

AlN thin films have been grown on Si (100) substrates by reactive ion beam sputter deposition (IBSD) at different substrate temperatures varying from room temperature (RT) to 500oC. Substrate temperature induced microstructural transition from amorphous at RT, nanocrystalline at 300oC to microcrystalline at 400oC has been observed by Transmission Electron Microscopy (TEM). Average surface roughness (Ra) and morphology has been explored by using Atomic Force Microscopy (AFM). UV-VIS spectrophotometry has been employed to probe the substrate temperature induced changes in optical band-gap (Eg) of grown thin films in reflectance mode. It was found that Eg was increased from 5.08 to 5.21 eV as substrate temperature was increased from RT to 500oC. Urbach energy tail (Eu) along with weak absorption tail (WAT) energy (Et) have been estimated to account for the optical disorder which was found to decrease with associated increase in Eg., Comment: 22 pages, 6 figures, 2tables

Reactive dual ion beam sputter deposition of AlN thin films was carried out for the analysis of surface growth characteristics by Atomic Force Microscopy. The variation of roughness as a function of deposition time was analysed by Dynamic Scaling Theory (DST). Two distinct exponents, static and dynamic were used to unravel the film growth characteristics. As the deposition time increased, static scaling exponent decreased gradually and substrate surface coverage was increased which is indicated by a decrease in critical length Lc. The rms roughness of the film was increased from 1.99 to 3.42 nm as the deposition time was increased from 3 minutes to 15 minutes. Dynamic scaling exponent was found to be 0.36. During the growth, surface diffusion (n = 4) becomes the major roughening phenomenon while Bulk diffusion (n = 3) turns into the dominating smoothening phenomenon., Comment: 10 pages, 8 figures