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Science holds the key to the progress and development of any country. The full-scale war of the Russian Federation against Ukraine makes some adjustments to the possibilities of scientific activity. To some extent, it depends on the regional context, since the territory of Ukraine is conditionally divided into three zones: 1) territories that had/have active hostilities; 2) regions that do not have the direct escalation of hostilities; 3) temporarily occupied territories. Our research highlights the impact of the Russian-Ukrainian war on the research activity at the university that has been under temporary occupation. Quantitative and qualitative analysis of the results of the scientists’ survey and included observation allows one to determine the main problems and challenges faced by scientists in occupation conditions. It was determined that in the conditions of occupation, scientists not only lack access to the necessary equipment but are also subject to moral and psychological pressure. However, understanding the meaning and value of one’s scientific achievements for the victory and post-war recovery of Ukraine, the support of the world scientific community inspires creation even in the moment of hardships

Purpose: The article proposes a methodology for determining the chemical quality criterion of porous layers synthesized on the surface of semiconductors, based on taking into account the chemical parameters of the surface that can affect the properties of nanostructures. Design/methodology/approach: The chemical quality criterion was evaluated in terms of stoichiometry, stability of structures over time, uniformity of distribution over the surface, and the presence of an oxide phase. As an example, a calculation is demonstrated for the por-InP/InP structure synthesized on a mono-InP surface. The results of calculating the chemical quality criterion were evaluated using the Harrington scale to rank samples by quality level. Findings: A chemical criterion for the quality of porous layers synthesized on the surface of semiconductors has been developed. This criterion contains a set of indicators sufficient for a comprehensive assessment of the surface condition and is universal in nature. The studies carried out make it possible to reasonably approach the determination of the modes of electrochemical processing of semiconductors and open up new perspectives in the construction of a model of self-organization of a porous structure. Research limitations/implications: The chemical quality criterion does not allow evaluating the obtained nanostructures in terms of geometric parameters. Therefore, in the future, there is a need to develop a morphological quality criterion and determine a methodology for assessing a generalized quality criterion for nanostructures synthesized on the surface of semiconductors, which may include economic, environmental, technological indicators, and the like. Practical implications: Study results are expedient from a practical point of view, since they make it possible to reasonably approach the determination of the modes of electrochemical processing of semiconductors, synthesize nanostructures with predetermined properties, and create standard samples of nanomaterial composition.Originality/value: Methodology for assessing the quality of porous semiconductors by a chemical criterion has been applied for the first time in engineering science. The article will be useful to engineers, who are engaged in the synthesis of nanostructures, researchers and scientists, as well as specialists in nanometrology.

Purpose: The aim of this paper is to develop a functional model for the synthesis of nanostructures of the given quality level, which will allow to effectively control the process of nanopatterning on the surface of semiconductors with tunable properties. Design/methodology/approach: The paper uses the IDEF0 methodology, which focuses on the functional design of the system under study and describes all the necessary processes with an accuracy sufficient for an unambiguous modelling of the system's activity. Based on this methodology, we have developed a functional model for the synthesis of nanostructures of the given quality level and tested its effectiveness through practice. Findings: The paper introduces a functional model for the synthesis of nanostructures on the surface of the given quality level semiconductors and identifies the main factors affecting the quality of nanostructures as well as the mechanisms for controlling the formation of porous layers with tunable properties. Using the example of etching single-crystal indium phosphide electrochemically in a hydrochloric acid solution, we demonstrate that the application of the suggested model provides a means of forming nanostructures with tunable properties, assessing the quality level of the nanostructures obtained and bringing the parameters in line with the reference indicators at a qualitatively new level. Research limitations/implications: Functional modelling using the IDEF0 methodology is widely used when process control is required. In this study it has been applied to control the synthesis of nanostructures of the given quality level on the surface of semiconductors. However, these studies require continuation, namely, the establishment of correlations between the technological and resource factors of synthesis and the acquired properties of nanostructures. Practical implications: This study has a significant practical effect. Firstly, it shows that functional modelling can reduce the time required to form large batches of the given quality level nanostructures. This has made it possible to substantiate the choice of the initial semiconductor parameters and nanostructure synthesis modes in industrial production from the theoretical and empirical perspective. Secondly, the presented methodology can be applied to control the synthesis of other nanostructures with desired properties and to reduce the expenses required when resources are depleted and the cost of raw materials is high. Originality/value: This paper is the first to apply the IDEF0 methodology to control the given quality nanostructure synthesis. This paper will be of value to engineers who are engaged in the synthesis of nanostructures, to researchers and scientists as well as to students studying nanotechnology.

Purpose: f this paper is to is to establish the patterns of oxide formation on the surface of indium phosphide during electrochemical etching of mono-InP. Design/methodology/approach: A porous surface was formed with the anode electrolytic etching. Morphology of the surface was studied with the help of scanning electron microscope JSM-6490. The analysis of chemical composition of porous surface of samples was also performed. Findings: It was shown that during the electrochemical etching of indium phosphide, oxide films and crystallites form on the surface. It has been established that crystalline oxides are formed mainly on the surface of n-type indium phosphide. Continuous oxide films are predominantly formed on the surface of p-InP. Research limitations/implications: The research was carried out for indium phosphide samples synthesized in the solution of hydrofluoric acid, though, carrying out of similar experiments for crystalline oxides on the surface of porous indium phosphide obtained in other conditions, is necessary. Practical implications: The study of oxide crystals on the surface of porous indium phosphide has great practical importance since it is the reproducibility of experimental results that is the main problem of modern materials science, the more nanoengineering. Oxides can significantly affect the properties of materials. On the one hand, oxides significantly affect the recombination properties of materials, this can impair the operation of semiconductor devices. On the other hand, oxide films can serve as a passivating coating for the surface of a porous semiconductor. Such an oxide property will be useful for the practical application of nanostructured indium phosphide. Therefore, questions of the conditions for the formation of semiconductor intrinsic oxides, their structure, and chemical composition, and also the effect of oxides on the physical and technical characteristics of materials are important. Originality/value: The patterns of oxide formation on the surface of indium phosphide during electrochemical etching are investigated in this work. It is shown for the first time that the structure of an oxide depends on the orientation of the surface of the semiconductor. It was shown that continuous oxide films are formed on the surface of p-InP, and oxide crystalline clusters are formed on the surface of n-InP.

Purpose: The purpose of this study is to establish the quality of tests for determining the chemical composition of the porous surface obtained by the method of electrochemical etching, based on the indicators of convergence and reproducibility of the results. Design/methodology/approach: The method of electrochemical etching was used to obtain layers of porous gallium phosphide, which can be used as buffer layers for nitrides formation on their basis. Por-GaP was formed in a solution of hydrofluoric acid at a current density of j =100 mA/cm2, etching was carried out for 20 minutes. The resulting structures sulfide passivation was carried out, thus avoiding the formation of an oxide film on the samples surfaces. For this purpose, porous gallium phosphide samples were kept in a sulfide solution for 10 minutes and dried in a stream of nitrogen. The chemical composition of the porous GaP surface layers has been investigated. To do this, the method of electronprobe INCA Energy microanalysis was used. The research was carried out on the entire surface of the sample in order to calculate the total spectrum of the elemental composition of the sample under study. Findings: It was established that during anodizing, the stoichiometry of the crystals investigated did not shift significantly towards the excess of gallium atoms. Oxygen is present at an insignificant concentration of 0.3%. This indicates the effectiveness of conducting the sulfide passivation of the sample surface following the electrochemical treatment. The presence of fluorine atoms that appeared on the surface as a result of the reaction with the electrolyte during etching, is observed in extremely low concentration. Experimental studies have shown that the sample chosen can be used as a standard enterprise sample when analyzing the chemical composition of the surface of porous gallium phosphide due to its convergence, reproducibility, homogeneity. In addition, the given method for determining the standard sample can be applied to other porous semiconductors. Conducting such studies is an important technological task that will allow us to create a series of standard samples of porous semiconductors of A3B5 group. Research limitations/implications: The research was carried out for porous gallium phosphide samples synthesized in the solution of hydrofluoric acid, though, carrying out of similar experiments for por-GaP obtained in other conditions, is necessary. Practical implications: The studies of the reproducibility and convergence of the experiment have an important practical significance, since it is the reproducibility of the experiment results that is the main problem to modern material science, all the more to nanoengineering. Therefore, the technique proposed, will allow the synthesis of por-GaP layers with adjustable properties, will facilitate their widespread implementation in the real sectors of industry. The obtained porous layers can be used as standard samples. Originality/value: The main problem in the nanostructures synthesis is the adjustability of properties. The technique presented allows to form stable layers of the porous gallium phosphide with the surface chemical composition known in advance. In addition, carrying out the sulfide passivation allows to stabilize por-GaP properties, which is an important process task. For the first time, a study of the presented technique as to convergence, reproducibility and homogeneity, was conducted.

The method for the formation of porous gallium arsenide in a solution of hydrochloric acid was improved. The goal of present research was to establish correlation between conditions of electrochemical etching of gallium arsenide crystals and morphology of low-dimensional structures. Porous layers were formed by the method of electrochemical etching in a solution of hydrochloric acid. The mode of electrolyte agitation was applied. This makes it possible to avoid the formation of bubbles on the surface of the crystal during etching and leads to the formation of regular porous space. Basic regularities in the formation of porous spaces were studied. It was shown that morphological properties of por-GaAs depend on etching conditions. The effect was explored of current density on the thickness of a porous layer and diameter of pores. It was established that the composition and concentration of electrolyte correlate with surface porosity and affect the rate of crystal dissolution reaction. Etching time determines thickness of a porous layer and surface porosity. Chemical composition of por-GaAs was explored. An oxide layer was not formed on the surface of the examined samples; oxygen was present only in small concentrations. Stoichiometry of the samples was disrupted towards an excess of gallium atoms

The samples of porous InP were grown up by a method of anode electrochemical etching on a substrate (100) InP n-type. The samples were characterized by scanning electronic microscopy (SEM) and photoluminescence (PL) where a blue shift was observed in PL. To remove surface oxides from the surface of porous InP using the thermal cleaning of the samples in a stream of high purity hydrogen. Chemical composition of surface of porous n-InP after in hydrogen probed treatment the method of Energy dispersive X-ray spectroscopy. Size of walls between pores which makes 3–11nm.