15 results on '"Hur, Ikboum"'
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2. Comparison study of mask error effects for various mask-making processes
3. Effect of pattern density for contact windows in an attenuated phase shift mask
4. Study of optical proximity effects using off-axis illumination with attenuated phase shift mask
5. Implementation of i-line lithography to 0.30 um design rules
6. Overlay and lens distortion in a modified illumination stepper
7. Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology
8. Comparison study of mask error effects for various mask-making processes.
9. TiSi-nitride-based attenuated phase-shift mask for ArF lithography.
10. Accurate overlay control for 0.30-um i-line lithography.
11. Study of optical proximity effects using off-axis illumination with attenuated phase shift mask.
12. Effect of pattern density for contact windows in an attenuated phase shift mask.
13. Implementation of i-line lithography to 0.30 um design rules.
14. Overlay and lens distortion in a modified illumination stepper.
15. Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology.
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