Author: "Hur, Ik Boum" - Searchworks@Jio Institute Digital Library Search Results

Searchworks

Select search scope, currently: Articles

Catalog

books, media & more in Jio Institute collections

Articles

journal articles & other e-resources

Your search keyword '"Hur, Ik Boum"' showing total 15 results

Start Over Author "Hur, Ik Boum"

15 results on '"Hur, Ik Boum"'

1. 55‐2: Essential Mask Quality for High‐End Resolution Displays

Author: Kim, Myung-Yong, primary, Choi, Ji-Hoon, additional, Hur, Ik-Boum, additional, Choi, Sang-Soo, additional, Wahlsten, Mikael, additional, Eklund, Robert, additional, and Park, Young-Jin, additional
Published: 2019
Full Text: View/download PDF

2. Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Author: Green, Michael, additional, Ham, Young, additional, Dillon, Brian, additional, Kasprowicz, Bryan, additional, Hur, Ik Boum, additional, Park, Joong Hee, additional, Choi, Yohan, additional, McMurran, Jeff, additional, Kamberian, Henry, additional, Chalom, Daniel, additional, Klikovits, Jan, additional, Jurkovic, Michal, additional, and Hudek, Peter, additional
Published: 2016
Full Text: View/download PDF

3. Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)

Author: Green, Michael, additional, Ham, Young, additional, Dillon, Brian, additional, Kasprowicz, Bryan, additional, Hur, Ik Boum, additional, Park, Joong Hee, additional, Choi, Yohan, additional, McMurran, Jeff, additional, Kamberian, Henry, additional, Chalom, Daniel, additional, Klikovits, Jan, additional, Jurkovic, Michal, additional, and Hudek, Peter, additional
Published: 2016
Full Text: View/download PDF

4. A simulation of chrome migration and its prevention in photomask

Author: Kim, Jong-Min, primary, Hur, Ik-Boum, additional, Lee, Dong-Heok, additional, and Choi, Sang-Soo, additional
Published: 2012
Full Text: View/download PDF

5. Haze generation model and prevention techniques for sulfate free cleaned mask

Author: Patil, Manish, primary, Kim, Jong-Min, additional, Hur, Ik-Boum, additional, and Choi, Sang-Soo, additional
Published: 2009
Full Text: View/download PDF

6. Effects of photo resist erosion in development on critical dimension performance for 45nm node and below

Author: Hwang, Guen-Ho, primary, Kim, Dong-Hyun, additional, Yu, Chu-bong, additional, Kang, Byeng-Sun, additional, Hur, Ik-Boum, additional, Shin, Cheol, additional, Jung, Sung-Mo, additional, and Choi, Sang-Soo, additional
Published: 2008
Full Text: View/download PDF

7. Patterning capability and limitations by pattern collapse in 45nm and below node photo mask production

Author: Hwang, Guen-Ho, primary, Patil, Manish, additional, Seo, Soon-Kyu, additional, Yu, Chu-Bong, additional, Hur, Ik-Boum, additional, Kim, Dong Hyun, additional, Shin, Cheol, additional, Jung, Sung-Mo, additional, Lee, Yong-Hyun, additional, and Choi, Sang-Soo, additional
Published: 2008
Full Text: View/download PDF

8. Post cleaned surface modification treatment to prevent near pellicle haze generation in sulfate free cleaned ArF EAPSM

Author: Patil, Manish, primary, Kim, Jong-Min, additional, Jung, Sung-Mo, additional, Hur, Ik-Boum, additional, Choi, Sang-Soo, additional, and Lee, Yong Hyun, additional
Published: 2008
Full Text: View/download PDF

9. Haze generation effect by pellicle and packing box on photomask

Author: Kim, Jong-Min, primary, Patil, Manish, additional, Jeong, Woo-Gun, additional, Hur, Ik-Boum, additional, Shin, Cheol, additional, Jung, Sung-Mo, additional, Choi, Moon-Hwan, additional, and Choi, Sang-Soo, additional
Published: 2007
Full Text: View/download PDF

10. Haze generation model and prevention techniques for sulfate free cleaned mask.

Author: Patil, Manish, Kim, Jong-Min, Hur, Ik-Boum, and Choi, Sang-Soo
Published: 2009
Full Text: View/download PDF

11. Post cleaned surface modification treatment to prevent near pellicle haze generation in sulfate free cleaned ArF EAPSM.

Author: Patil, Manish, Kim, Jong-Min, Jung, Sung-Mo, Hur, Ik-Boum, Choi, Sang-Soo, and Lee, Yong Hyun
Published: 2008
Full Text: View/download PDF

12. Effects of photo resist erosion in development on critical dimension performance for 45nm node and below.

Author: Hwang, Guen-Ho, Kim, Dong-Hyun, Yu, Chu-bong, Kang, Byeng-Sun, Hur, Ik-Boum, Shin, Cheol, Jung, Sung-Mo, and Choi, Sang-Soo
Published: 2008
Full Text: View/download PDF

13. Haze generation effect by pellicle and packing box on photomask.

Author: Kim, Jong-Min, Patil, Manish, Jeong, Woo-Gun, Hur, Ik-Boum, Shin, Cheol, Jung, Sung-Mo, Choi, Moon-Hwan, and Choi, Sang-Soo
Published: 2007
Full Text: View/download PDF

14. Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)

Author: Kasprowicz, Bryan S., Buck, Peter D., Green, Michael, Ham, Young, Dillon, Brian, Kasprowicz, Bryan, Hur, Ik Boum, Park, Joong Hee, Choi, Yohan, McMurran, Jeff, Kamberian, Henry, Chalom, Daniel, Klikovits, Jan, Jurkovic, Michal, and Hudek, Peter
Published: 2016
Full Text: View/download PDF

15. Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Author: Behringer, Uwe F.W., Finders, Jo, Green, Michael, Ham, Young, Dillon, Brian, Kasprowicz, Bryan, Hur, Ik Boum, Park, Joong Hee, Choi, Yohan, McMurran, Jeff, Kamberian, Henry, Chalom, Daniel, Klikovits, Jan, Jurkovic, Michal, and Hudek, Peter
Published: 2016
Full Text: View/download PDF

Catalog

Books, media, physical & digital resources

See catalog results