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11 results on '"Huanca, D."'

4. Building a network for multicenter, prospective research of central nervous system infections in South America: Process and lessons learned

Author

Nelson, Christina, primary, Mori, Nicanor, additional, Ton, Thanh, additional, Zunt, Joseph, additional, Kochel, T., additional, Romero, A., additional, Gadea, N., additional, Tilley, D., additional, Ticona, E., additional, Soria, J., additional, Celis, V., additional, Huanca, D., additional, Delgado, A., additional, Rivas, M., additional, Stiglich, M., additional, Sihuincha, M., additional, Donayre, G., additional, Celis, J., additional, Romero, R., additional, Tam, N., additional, Tipismana, M., additional, Espinoza, I., additional, Rozas, M., additional, Peralta, A., additional, Sanchez, E., additional, Vasquez, L., additional, Muñoz, P., additional, Ramirez, G., additional, and Reyes, I., additional

Published
2018
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10. Determination of the Model for the Chemical Structure of Porous PECVD Low-k Films

Author

Verdonck, P., Le, Quoc Toan, Devonport, J., Huanca, D. R., dos Santos Filho, S. G., Conard, T., Meersschaut, J., Baklanov, M. R., and Van Elshocht, S.

Abstract

Scaling of Cu interconnect structures requires insulating materials with a low dielectric constant that also have adequate mechanical characteristics and good chemical resistance. These macro characteristics depend on the actual mechanical and chemical nanostructure of the porous low-k films. Unfortunately, there is no direct way to determine this exact nanostructure; e.g. neither Atom Probe nor Transmission Electron Microscopy are able to produce adequate images of an amorphous, porous low-k film. In this paper, we propose a new model for the chemical structure of PECVD low-k films: a strong hydrophobic layer, consisting of methyl groups covers the top surface of the porous film; besides, the pore walls are also covered with hydrophobic methyl groups. With this model, we are able to explain the macro characteristics of the low-k films. The model is supported by the test results obtained by modifying the top surface and immersing the pristine and modified films into diluted HF solutions.

Published
2015
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11. Effect of Number of Layers on the Optical Response of Porous Silicon Bragg's Mirrors

Author

Huanca, D. R. and Salcedo, W. J.

Abstract

The present work reports the influence of the number of layers in the porous silicon (PS) Bragg´s mirrors optical performance. The electrochemical process used to obtain the PS mirror device imposes a limit on the number of layer since for long time process the chemical dissolution compete with electrochemical dissolution effect. However, the high number of layer in the mirror device avoided the optical response degradation after thermal annealing process.

Published
2007
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