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Ultrawide bandgap semiconductor $\beta$-Ga2O3 holds extensive potential for applications in high-radiation environments. One of the primary challenges in its practical application is unveiling the mechanisms of surface irradiation damage under extreme conditions. In this study, we investigate the orientation-dependent mechanisms of radiation damage on four experimentally relevant $\beta$-Ga2O3 surface facets, namely, (100), (010), (001), and (-201), at various temperatures. We employ a multiscale atomic simulation approach, combining machine-learning-driven molecular dynamics (ML-MD) simulations and density functional theory (DFT) calculations. The results reveal that Ga vacancies and O interstitials are the predominant defects across all four surfaces, with the formation of many antisite defects Ga_O and few O_Ga observed. Among the two Ga sites and three O sites, the vacancy found in the O2 site is dominant, while the interstitials at the Ga1 and O1 sites are more significant. Interestingly, the (010) surface exhibits the lowest defect density, owing to its more profound channeling effect leading to a broader spread of defects. The influence of temperature on surface irradiation damage of $\beta$-Ga2O3 should be evaluated based on the unique crystal surface characteristics. Moreover, the formation energy and defect concentration calculated by DFT corroborate the results of the MD simulations. Comprehending surface radiation damage at the atomic level is crucial for assessing the radiation tolerance and predicting the performance changes of $\beta$-Ga2O3-based device in high-radiation environments.

Disordering of solids typically leads to amorphization, but polymorph transitions, facilitated by favorable atomic rearrangements, may temporarily help to maintain long-range periodicity in the solid state. In far-from-equilibrium situations, such as atomic collision cascades, these rearrangements may not necessarily follow a thermodynamically gainful path, but may be kinetically limited. In this Letter, we focused on such crystallization instead of amorphization in collision cascades in gallium oxide (\ce{Ga2O3}). We determined the disorder threshold for irreversible $\beta$-to-$\gamma$ polymorph transition and explained why it results in elevating energy to that of the $\gamma$-polymorph, which exhibits the highest polymorph energy in the system below the amorphous state. Specifically, we demonstrate that upon reaching the disorder transition threshold, the \ce{Ga}-sublattice kinetically favors transitioning to the $\gamma$-like configuration, requiring significantly less migration for \ce{Ga} atoms to reach the lattice sites during post-cascade processes. As such, our data provide a consistent explanation of this remarkable phenomenon and can serve as a toolbox for predictive multi-polymorph fabrication., Comment: 6 pages, 4 figures, under review

$\beta$-$\mathrm{Ga}_{2}\mathrm{O}_{3}$ has gained intensive interests of research and application as an ultrawide bandgap semiconductor. Epitaxial growth technique of the $\beta$-$\mathrm{Ga}_{2}\mathrm{O}_{3}$ thin film possesses a fundamental and vital role in the $\mathrm{Ga}_{2}\mathrm{O}_{3}$-based device fabrication. In this work, epitaxial growth mechanisms of $\beta$-$\mathrm{Ga}_{2}\mathrm{O}_{3}$ with four low Miller-index facets, namely (100), (010), (001), and ($\overline{2}$01), are systematically explored using large-scale machine-learning molecular dynamics simulations at the atomic scale. The simulations reveal that the migration of the face-centered cubic stacking O sublattice plays a predominant role in rationalizing the different growth mechanisms between (100)/(010)/(001) and ($\overline{2}$01) orientations. The resultant complex combinations of the stacking faults and twin boundaries are carefully identified, and shows a good agreement with the experimental observation and ab initio calculation. Our results provide useful insights into the gas-phase epitaxial growth of the $\beta$-$\mathrm{Ga}_{2}\mathrm{O}_{3}$ thin films and suggest possible ways to tailor its properties for specific applications., Comment: 6 pages, 5 figures, under peer review

$\mathrm{Ga}_{2}\mathrm{O}_{3}$ is a wide-bandgap semiconductor of emergent importance for applications in electronics and optoelectronics. However, vital information of the properties of complex coexisting $\mathrm{Ga}_{2}\mathrm{O}_{3}$ polymorphs and low-symmetry disordered structures is missing. In this work, we develop two types of kernel-based machine-learning Gaussian approximation potentials (ML-GAPs) for $\mathrm{Ga}_{2}\mathrm{O}_{3}$ with high accuracy for $\beta$/$\kappa$/$\alpha$/$\delta$/$\gamma$ polymorphs and generality for disordered stoichiometric structures. We release two versions of interatomic potentials in parallel, namely soapGAP and tabGAP, for excellent accuracy and exceeding speedup, respectively. We systematically show that both the soapGAP and tabGAP can reproduce the structural properties of all the five polymorphs in an exceptional agreement with ab initio results, meanwhile boost the computational efficiency with $5\times10^{2}$ and $2\times10^{5}$ computing speed increases compared to density functional theory, respectively. The results show that the liquid-solid phase transition proceeds in three different stages, a "slow transition", "fast transition" and "only Ga migration". We show that this complex dynamics can be understood in terms of different behavior of O and Ga sublattices in the interfacial layer., Comment: 13 pages, 7 figures

Gallium nitride (GaN), as a promising alternative semiconductor to silicon, is of well-established use in photoelectronic and electronic technology. However, the vulnerable GaN surface has been a critical restriction that hinders the development of GaN-based devices, especially regarding device stability and reliability. Here, we overcome this challenge by converting the GaN surface into a gallium oxynitride (GaON) epitaxial nanolayer through an in-situ two-step "oxidation-reconfiguration" process. The oxygen plasma treatment overcomes the chemical inertness of the GaN surface, and the sequential thermal annealing manipulates the kinetic-thermodynamic reaction pathways to create a metastable GaON nanolayer with wurtzite lattice. This GaN-derived GaON nanolayer is a tailored structure for surface reinforcement and possesses several advantages, including wide bandgap, high thermodynamic stability, and large valence band offset with GaN substrate. These enhanced physical properties can be further leveraged to enable GaN-based applications in new scenarios, such as complementary logic integrated circuits, photoelectrochemical water splitting, and ultraviolet photoelectric conversion, making GaON a versatile functionality extender., Comment: 13 pages, 6 figures, submitted under review

Two-dimensional (2D) van der Waals (vdW) materials and their bilayers have stimulated enormous interests in fundamental researches and technological applications. Recently, a group of 2D vdW III2-VI3 materials with out-of-plane ferroelectricity have attracted substantial attentions. In this work, the structural, electronic and optical properties of 2D ferroelectric Ga2O3 bilayer system are systematically studied using ab-initio computational method. Intrinsic dipoles of the two freestanding monolayers lead to three distinct dipole models (one ferroelectric and two antiferroelectric models). The stable stacking configurations of ferroelectric and antiferroelectric dipole models can be transferred with polarization reversal transition of the monolayers without additional operation. Interlayer perturbation effects combined with biaxial-strain engineering lead to high tunablility of the electronic and optical properties of the bilayer systems. Surprisingly, the results reveal a phase transition from vdW to ionic interlayer interaction induced by in-plane biaxial tensile strain. Detailed analyses suggest a transition mechanism based on the ionic bonding nature of the Ga2O3 system, involving interlayer rearrangement of anions to compensate the symmetry breaking of the heavily distorted ionic folding configurations. These insights can open new prospects for future experimental synthesis, characterization and application of 2D Ga2O3 atomic-thin layered systems., Comment: 11 page, 6 figures

Electrically interfacing atomically thin transition metal dichalcogenide semiconductors (TMDSCs) with metal leads is challenging because of undesired interface barriers, which have drastically constrained the electrical performance of TMDSC devices for exploring their unconventional physical properties and realizing potential electronic applications. Here we demonstrate a strategy to achieve nearly barrier-free electrical contacts with few-layer TMDSCs by engineering interfacial bonding distortion. The carrier-injection efficiency of such electrical junction is substantially increased with robust ohmic behaviors from room to cryogenic temperatures. The performance enhancements of TMDSC field-effect transistors are well reflected by the ultralow contact resistance (down to 90 Ohm um in MoS2, towards the quantum limit), the ultrahigh field-effect mobility (up to 358,000 cm2V-1s-1 in WSe2) and the prominent transport characteristics at cryogenic temperatures. This method also offers new possibilities of the local manipulation of structures and electronic properties for TMDSC device design.

Ga2O3 is a wide-band-gap semiconductor of great interest for applications in electronics and optoelectronics. Two-dimensional (2D) Ga2O3 synthesized from top-down or bottom-up processes can reveal brand new heterogeneous structures and promising applications. In this paper, we study phase transitions among three low-energy stable Ga2O3 monolayer configurations using density functional theory and a newly developed machine-learning Gaussian approximation potential, together with solid-state nudged elastic band calculations. Kinetic minimum energy paths involving direct atomic jump as well as concerted layer motion are investigated. The low phase transition barriers indicate feasible tunability of the phase transition and orientation via strain engineering and external electric fields. Large-scale calculations using the newly trained machine-learning potential on the thermally activated single-atom jumps reveal the clear nucleation and growth processes of different domains. The results provide useful insights to future experimental synthesis and characterization of 2D Ga2O3 monolayers., Comment: 10 pages, 7 figures, under review

In this paper, we report the use of lanthanum (La) in S/D contacts of GaN HEMTs, achieving 0.97 Ohm-mm contact resistance without S/D recess. The HEMTs show well-behaved electrical characteristics and satisfactory reliability. Our studies show that La, a CMOS compatible metal, is promising to lower GaN HEMT S/D contact resistance. La's low work function (3.5 eV) is beneficial for reducing the barrier between the metals and GaN. The Ohmic contact formation mechanism involved was shown to be different from conventional Ti/Al films. Spherical-shaped high-La regions formed near the surface during annealing. La diffuses into the AlGaN layer, and the overlap of La and Al peaks is significantly increased compared with that before annealing.