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1. Process Optimization of Contact Module in NOR Flash Using High Resolution e-Beam Inspection

Author

Ling-Wu Yang, Chih-Yuan Lu, Tahone Yang, Hsiang C. Liao, Kuang-Chao Chen, Tuung Luoh, and Che L. Hung

Subjects
Flash (photography), Computer science, Electron beam processing, Electronic engineering, High resolution, Process optimization
Abstract

The inspection sensitivities and capture rate capabilities of high resolution e-beam inspection system with extracting and retarding mode are evaluated. E-beam with retarding mode inspection demonstrates better performance and reflects the wafer sort yield loss in contact failure items directly. After the contact module process optimization, the yield was improved almost two times above.

Published
2011

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