33 results on '"Hazart, Jérôme"'
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2. Validation of an analytical model of Si-ring resonators for designing a 1 × 8 multiplexer in SCISSOR configuration
3. Metrology for Lithography
4. Tilted beam scanning electron microscopy, 3-D metrology for microelectronics industry
5. Tilted beam SEM, 3D metrology for industry
6. 3D resist reflow compact model for imagers microlens shape optimization
7. Variable shaped beam lithography capabilities enhancement by "small-shots" correction
8. Limits of model-based CD-SEM metrology
9. Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach
10. Advanced surface affinity control for DSA contact hole shrink applications
11. 3D Resist Reflow Compact Model for Imager Microlens Shape Optimization.
12. Tilted beam SEM, 3D metrology for industry.
13. Limits of model-based CD-SEM metrology.
14. Placement error in directed self-assembly of block copolymers for contact hole application
15. Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design
16. Tilted beam SEM, 3D metrology for industry
17. 3D resist reflow compact model for imagers microlens shape optimization
18. High-efficiency device for focusing light to subwavelength dimensions
19. Dispositif de focalisation de lumière à des dimensions sub-longueur d'onde à fort rendement
20. Global optimization in inverse problem of scatterometry
21. Towards the Synthesis of Plasmonic nano_Structures by means of Stochastic Optimization
22. Surface plasmon interference printing in a photosensitive azo-dye polymer film
23. Advanced surface affinity control for DSA contact hole shrink applications
24. Focussing light through a stack of toroidal channels in PMMA
25. An inverse ellipsometric problem for thin film characterization: comparison of different optimization methods
26. Fabry–Pérot-type enhancement in plasmonic visible nanosource
27. Robust sub-50-nm CD control by a fast-goniometric scatterometry technique
28. Polarization-sensitive printing of surface plasmon interferences
29. An inverse ellipsometric problem for thin film characterization: comparison of different optimization methods.
30. Robust sub-50-nm CD control by a fast-goniometric scatterometry technique.
31. A transmission polarizing beam splitter grating
32. Limits of model-based CD-SEM metrology
33. Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design
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