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We demonstrate a newly developed high-performance fixed-bed reactor combined with an in situ mass analyzer (ISMA). The ISMA is particularly relevant to sub-second time-resolved studies where mass changes occur due to, e.g., chemical reactions and process conditions such as choice of solid, temperature, gas atmosphere, and pressure. The mass is determined from the optically measured oscillation frequency of a quartz element, yielding a mass resolution below 10 μg—typically 2–3 μg—for samples up to ∼500 mg. By placing the quartz element and optical sensor inside stainless steel pipes and providing heat from the outside, the instrument is applicable up to ∼62 bars and 700 °C. By surrounding this core part of the instrument with a suitable feed system and product analysis instruments, in combination with computer control and logging, time-resolved studies are enabled. The instrument with surrounding feed and product analysis infrastructure is fully automated. Emphasis has been put on making the instrument robust, safe, operationally simple, and user-friendly. We demonstrate the ISMA instrument on selected samples.

The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. Two preliminary interferometer designs are presented: a low coherent interferometer array based on the Mirau configuration and a laser interferometer array based on the Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on a scanning system and integration in a standard test station for micro-fabrication. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed. An interferometric test station for massive parallel inspection of MEMS and MOEMS

The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of MicroElectroMechanicalSystems (MEMS) and MicroOptoElectroMechanicalSystems (MOEMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. A low coherent and a laser interferometer array are developed. Two preliminary interferometer designs are presented; a low coherent interferometer array based on a Mirau configuration and a laser interferometer array based on a Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on the scanning system and the integration in a standard test station for micro-fabrication. Models of single channel low coherence and laser interferometers and preliminary measurement results are presented. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed. Optical, mechanical and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS