1. Developments in Mask-Free Singularly Addressable Nano-LED Lithography
- Author
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Martin Mikulics, Andreas Winden, Joachim Mayer, and Hilde Helen Hardtdegen
- Subjects
mask-free nano-LED lithography ,nano-LED fabrication technology ,hybrid nano-LEDs ,Manufacturing industries ,HD9720-9975 ,Plasma engineering. Applied plasma dynamics ,TA2001-2040 - Abstract
LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.
- Published
- 2024
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