117 results on '"Hanabata, Makoto"'
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2. The Synthesis of the High Resolution i Line Novolak Resist
3. Study of lithographic characteristics due to differences in novolac resin structure
4. High-resolution patterning of silver nanopaste containing volatile solvents achieved with gas-permeable mold
5. Novolak design concept for high performance positive photoresists
6. Improvement of Gas Permeability of Gas Permeable Mold with Lattice Structure for Reduction of Transfer Failure in Photoimprint Lithography
7. The Photopolymer Science and Technology Award
8. Development of Cellulose Derivative Mold for Imprint Lithography
9. Gas permeable mold for defect reduction in nanoimprint lithography
10. Gas-Permeable Microimprint Template Derived from Cellulose Nanofiber Derivatives for Mechanical Properties
11. Utilization of gas permeable metal plate for the purpose of reduction of transfer defect in MEMS electronic device
12. Internal structure of metal material with gas permeability function related to MEMS devices
13. Gas-permeable templates using cellulose derivatives with acrylate and methacrylate groups for reducing in void defect density in ultraviolet nanoimprint lithography
14. Reduction of Defect for Imprinted UV Curable Resin including Volatile Solvents using Gas Permeable Mold Derived from Cellulose
15. Gas Permeability Characterization of a Metal Plate for Photo-imprint Lithography
16. Gas permeable template derived from cellulose in ultraviolet nanoimprint
17. Nanoimprint lithography using gas permeable template II
18. Eco-friendly, water-repellent, light-transparent film derived from psicose using nanoimprint lithography
19. High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography
20. Temperature dependence of viscoelasticity of crystalline cellulose with different molecular weights added to silicone elastomer
21. Organic-inorganic hybrid resist materials in advanced lithography
22. Temperature dependency of mechanical properties for crystalline cellulose added to silicone elastomer
23. Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material
24. Chemically amplified i-line positive resist for next-generation flat panel display
25. Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)
26. Nanoimprint lithography using gas permeable template
27. High-resolution nanopatterning of biodegradable polylactide by thermal nanoimprint lithography using gas permeable mold
28. Composite Material of Gas Permeable Mold for Nanoimprint Microfabrication
29. Modification of Functional Acrylic Film Using Isostearyl Acrylate
30. Fundamental Evaluation of Gas Permeable Mold Derived from Biomass
31. Development of Gas Permeable Mold for Ultraviolet Nanoimprint Lithography
32. Characterization of Gas Permeable Template Material for Nanoimprinting
33. Study of lithographic characteristics due to differences in novolac resin structure
34. Carrier photogeneration from a higher excited singlet state produced via triplet-triplet annihilation in N-vinylcarbazole-1-vinylnaphthalene copolymer.
35. Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue
36. Evaluation of the properties of the permeability film material using cellulose nanofibers
37. Gas‐Permeable Cellulose Template for Reduction of Template Damage and Gas Trapping in Microimprint Lithography of High Volume Manufacturing
38. Green Lithography Using Water-Developable Sugar-Based Negative Resist Materials
39. Nanoimprint lithography using disposable biomass template
40. Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin
41. EB and EUV lithography using inedible cellulose-based biomass resist material
42. Development of Nanoimprint Lithography Template Materials using Biomass
43. Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction
44. Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography
45. Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency
46. Nanomorphology of Polymer Blends for a Light-Scattering Thermosetting Plate Based on Self-Assembly
47. High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography
48. Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography
49. Planarizing material for reverse-tone step and flash imprint lithography
50. Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS
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