1. Wafer-scale Thermodynamically Stable GaN Nanorods via Two-Step Self-Limiting Epitaxy for Optoelectronic Applications
- Author
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Young-Il Kim, Daemyung Chun, Han Kyu Seong, Hyun Kum, Youngsoo Park, Geonwook Yoo, and Wantae Lim
- Subjects
010302 applied physics ,Multidisciplinary ,Materials science ,business.industry ,Nanowire ,Gallium nitride ,02 engineering and technology ,Chemical vapor deposition ,021001 nanoscience & nanotechnology ,Epitaxy ,01 natural sciences ,Article ,chemistry.chemical_compound ,chemistry ,0103 physical sciences ,Sapphire ,Optoelectronics ,Wafer ,Nanorod ,Metalorganic vapour phase epitaxy ,0210 nano-technology ,business - Abstract
We present a method of epitaxially growing thermodynamically stable gallium nitride (GaN) nanorods via metal-organic chemical vapor deposition (MOCVD) by invoking a two-step self-limited growth (TSSLG) mechanism. This allows for growth of nanorods with excellent geometrical uniformity with no visible extended defects over a 100 mm sapphire (Al2O3) wafer. An ex-situ study of the growth morphology as a function of growth time for the two self-limiting steps elucidate the growth dynamics, which show that formation of an Ehrlich-Schwoebel barrier and preferential growth in the c-plane direction governs the growth process. This process allows monolithic formation of dimensionally uniform nanowires on templates with varying filling matrix patterns for a variety of novel electronic and optoelectronic applications. A color tunable phosphor-free white light LED with a coaxial architecture is fabricated as a demonstration of the applicability of these nanorods grown by TSSLG.
- Published
- 2017