Search

Nanotube structures have attracted tremendous attention in recent years in many applications. Among such nanotube structures, titania nanotubes (TiO2) have received paramount attention in the medical domain due to their unique properties, represented by high corrosion resistance, good mechanical properties, high specific surface area, as well as great cell proliferation, adhesion and mineralization. Although lot of research has been reported in developing optimized titanium nanotube structures for different medical applications, however there is a lack of unified literature source that could provide information about the key parameters and experimental conditions required to develop such optimized structure. This paper addresses this gap, by focussing on the fabrication of TiO2 nanotubes through anodization process on both pure titanium and titanium alloys substrates to exploit the biocompatibility and electrical conductivity aspects, critical factors for many medical applications from implants to in-vivo and in-vitro living cell studies. It is shown that the morphology of TiO2 directly impacts the biocompatibility aspects of the titanium in terms of cell proliferation, adhesion and mineralization. Similarly, TiO2 nanotube wall thickness of 30-40nm has shown to exhibit improved electrical behaviour, a critical factor in brain mapping and behaviour investigations if such nanotubes are employed as micro-nano-electrodes., (Copyright © 2015 Elsevier B.V. All rights reserved.)

In this paper, the fabrication and growth mechanism of net-shaped micropatterned self-organized thin-film TiO2 nanotube (TFTN) arrays on a silicon substrate are reported. Electrochemical anodization is used to grow the nanotubes from thin-film titanium sputtered on a silicon substrate with an average diameter of ~30 nm and a length of ~1.5 μm using aqueous and organic-based types of electrolytes. The fabrication and growth mechanism of TFTN arrays from micropatterned three-dimensional isolated islands of sputtered titanium on a silicon substrate is demonstrated for the first time using focused-ion-beam (FIB) technique. This work demonstrates the use of the FIB technique as a simple, high-resolution, and maskless method for high-aspect-ratio etching for the creation of isolated islands and shows great promise toward the use of the proposed approach for the development of metal oxide nanostructured devices and their integration with micro- and nanosystems within silicon-based integrated-circuit devices.