118 results on '"Grotjohn, T."'
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2. Dopant Uniformity and Concentration in Boron Doped Single Crystal Diamond Films
3. Synthesis of boron-doped homoepitaxial single crystal diamond by microwave plasma chemical vapor deposition
4. Boron doped diamond deposited by microwave plasma-assisted CVD at low and high pressures
5. Scaling behavior of microwave reactors and discharge size for diamond deposition
6. Investigation of the Optical Properties of Diamond-Like Carbon Films
7. Determination of Boron Concentration in Doped Diamond Films
8. Single Crystal Boron-Doped Diamond Synthesis
9. A Monolithic Wilkinson Power Divider on Diamond via a Combination of Additive Manufacturing and Thin-Film Process
10. Two-dimensional self-consistent microwave argon plasma simulations with experimental verification.
11. Ultrawide‐Bandgap Semiconductors: Research Opportunities and Challenges
12. RF characterization of coplanar waveguide (CPW) transmission lines on single-crystalline diamond platform for integrated high power RF electronic systems
13. Ultrawide‐Bandgap Semiconductors: Research Opportunities and Challenges.
14. Atmospheric pressure microwave-powered microplasma source based on strip-line structure
15. Computational modeling of moderate pressure microwave plasma-assisted chemical vapor deposition reactors
16. Self-consistent modeling of higher pressure Microwave PACVD reactors
17. Microwave plasma assisted reactor design for high deposition rate diamond synthesis
18. Microwave plasma assisted synthesis of single crystal diamond at high pressures and high power densities
19. Atmospheric pressure microwave-powered microplasma source
20. Modeling of convective plasma flow in high pressure microwave PACVD diamond reactors
21. Modeling and characterization of a microplasma source
22. Microwave plasma reactor design for diamond synthesis at high pressures and high power densities
23. A compact microwave reentrant cavity applicator for plasma-assisted combustion
24. Microwave plasma-assisted diamond synthesis reactor design for large deposition areas at high rates
25. A miniature microwave plasma source used for localized surface treatment and processing
26. Microstripline applicators for creating microplasma discharges with microwave energy
27. Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis
28. Surface wave microplasma for localized etching
29. High pressure microwave plasma assisted CVD synthesis of diamond
30. Characterization and Modeling of Miniature Microwave Discharges Used for Materials Processing
31. Plasma-Assisted Combustion in a Coaxial Re-Entrant Microwave Cavity
32. Microwave plasma-assisted premixed flame combustion
33. Overview of the different aspects in modelling moderate pressure H2and H2/CH4microwave discharges
34. Deposition and post-processing of polycrystalline diamond for freestanding films and substrates
35. Plasma-Assisted Combustion in a Miniature Microwave Plasma Torch Applicator
36. Local Area Materials Processing using a Microstripline-Based Miniature Microwave Discharge
37. Fabrication and properties of ultranano, nano, and microcrystalline diamond membranes and sheets
38. Development of plasma integrated AFM nano manufacturing workcell.
39. Computer Integrated Plasma Nano Manufacturing Workcell.
40. Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor
41. Modeling electromagnetic fields for the excitation of microwave discharges used for materials processing
42. Determination of the components of stress in a polycrystalline diamond film using polarized Raman spectroscopy
43. Modeling of a plasma processing machine for semiconductor wafer etching using energy-functions-based neural networks
44. Investigation of multipolar electron cyclotron resonance plasma source sensors and models for plasma control
45. Modeling the electron heating in a compact electron cyclotron resonance ion source
46. Modeling the electromagnetic excitation of a microwave cavity plasma reactor
47. Modeling the electromagnetic excitation of a compact ECR ion/free radical sourcea)
48. Electron cyclotron resonance sputter removal of SiO2 on silicon wafers
49. Ion and neutral energies in a multipolar electron cyclotron resonance plasma source
50. Investigation of the influence of electromagnetic excitation on electron cyclotron resonance discharge properties
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