1. Near‐surface region characterization by extremely asymmetric Bragg reflection topography
- Author
-
Stephen W. Wilkins, Geoff N. Pain, Andrew W. Stevenson, and Dachao Gao
- Subjects
Surface (mathematics) ,Total internal reflection ,Optics ,Materials science ,business.industry ,Semiconductor materials ,Total external reflection ,Resolution (electron density) ,General Physics and Astronomy ,Bragg's law ,Angstrom ,business ,Characterization (materials science) - Abstract
Near‐surface regions of Cd1−xMnxTe and Hg1−xCdxTe epilayers (down to tens of angstroms) on (001) GaAs substrates have been characterized by extremely asymmetric Bragg reflection topography (EABRT) with the laboratory x‐ray source condition and a Lang camera, using x‐ray grazing incidence angles less than the critical angle for total external reflection. The experimental topographs obtained in the present work illustrate the potential of the EABRT technique for nondestructive characterization of near‐surface regions of crystals. The resolution of an image in EABRT is discussed in detail.
- Published
- 1993
- Full Text
- View/download PDF