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Quantum spin Hall insulators (QSHIs) based on HgTe and three-layer InAs/GaSb quantum wells (QWs) have comparable bulk band gaps of about 10–18 meV. The former, however, features a band gap vanishing with temperature, while the gap in InAs/GaSb QSHIs is rather temperature independent. Here, we report on the realization of a large inverted band gap in strained three-layer InAs/GaInSb QWs. By temperature-dependent magnetotransport measurements of gated Hall bar devices, we extract a gap as high as 45 meV. By combining local and nonlocal measurements, we detect edge conductivity at temperatures up to 40 K, possibly of topological origin, with equilibrium lengths of a few micrometers. Our results pave the way for the manipulation of topological edge states at high temperatures in QW heterostructures.

Single-mode, widely tunable laser diodes in the mid-infrared range are highly interesting for demanding spectroscopic applications involving multi-species discrimination. We report on an alternative approach using single frequency laser arrays. Single-mode laser arrays were fabricated using all-photonic-crystal electrically pumped distributed feedback cavities on GaSb. The fabricated lasers exhibit thresholds in the 3.2 kA/cm2 range in a continuous wave regime at room temperature. The maximum output power reaches 1 mW and single mode operation with a side-mode suppression ratio of 30 dB is demonstrated. These lasers were used to perform tunable diode laser absorption spectroscopy of several gases in standard gas cells. Continuous spectral coverage of a 40 nm band using 10 lasers seems an achievable goal using laser arrays with PhC lattice constant variations of 1 nm from laser to laser.

Silicon (Si) photonics has recently emerged as a key enabling technology in many application fields thanks to the mature Si process technology, the large silicon wafer size, and promising Si optical properties. The monolithic integration by direct epitaxy of III-V lasers and Si photonic devices on the same Si substrate has been considered for decades as the main obstacle to the realization of dense photonics chips. Despite considerable progress in the last decade, only discrete III-V lasers grown on bare Si wafers have been reported, whatever the wavelength and laser technology. Here we demonstrate the first semiconductor laser grown on a patterned Si photonics platform with light coupled into a waveguide. A mid-IR GaSb-based diode laser was directly grown on a pre-patterned Si photonics wafer equipped with SiN waveguides clad by SiO 2 . Growth and device fabrication challenges, arising from the template architecture, were overcome to demonstrate more than 10 mW outpower of emitted light in continuous wave operation at room temperature. In addition, around 10% of the light was coupled into the SiN waveguides, in good agreement with theoretical calculations for this butt-coupling configuration. This work lift an important building block and it paves the way for future low-cost, large-scale, fully integrated photonic chips., (© 2023. The Author(s).)

We report GaSb-based laser diodes (LDs) grown on on-axis (001) Si substrates and emitting at 2.3 µm. Two series of LDs were studied and compared. For the first series, a GaAs-based buffer layer was first grown by metal organic chemical vapor deposition (MOCVD) before growing the laser heterostructure by molecular-beam epitaxy (MBE). For the second series, a MOCVD GaSb buffer layer was added between the MOCVD GaAs buffer layer and the MBE laser heterostructure. Both series of LDs exhibited threshold currents in the 50-100 mA range and several mW output power at room temperature. They demonstrated continuous wave operation (CW) up to 70°C (set-up limited) without thermal rollover. Broad area LDs exhibited record threshold-current densities in the 250-350 A.cm -2 range for the second series of LDs, in spite of cracks that appeared during device processing. These results show that the design and fabrication steps of the buffer-layer stacks are critical issues in the epitaxial integration of GaSb-based optoelectronic devices on Si substrates and offer room for much performance improvement.

We report on 2.3-µm etched-cavity GaSb-based laser diodes (LDs) epitaxially integrated on on-axis (001)Si and benchmarked against their cleaved facet counterparts. The LDs were grown in two steps. First, a GaSb-on-Si template was grown by metal-organic vapor phase epitaxy (MOVPE) before the growth of the LD heterostructure by molecular-beam epitaxy. Different etched-facet geometries operate in continuous wave well above room temperature, and their performance are similar to those of cleaved-cavity LDs. These results show that etching mirrors is a viable route to form laser cavities in the GaSb technology and that MOVPE GaSb-on-Si templates are a suitable platform for optoelectronic devices overgrowth.

Technological platforms offering efficient integration of III-V semiconductor lasers with silicon electronics are eagerly awaited by industry. The availability of optoelectronic circuits combining III-V light sources with Si-based photonic and electronic components in a single chip will enable, in particular, the development of ultra-compact spectroscopic systems for mass scale applications. The first circuits of such type were fabricated using heterogeneous integration of semiconductor lasers by bonding the III-V chips onto silicon substrates. Direct epitaxial growth of interband III-V laser diodes on silicon substrates has also been reported, whereas intersubband emitters grown on Si have not yet been demonstrated. We report the first quantum cascade lasers (QCLs) directly grown on a silicon substrate. These InAs/AlSb QCLs grown on Si exhibit high performances, comparable with those of the devices fabricated on their native InAs substrate. The lasers emit near 11 µm, the longest emission wavelength of any laser integrated on Si. Given the wavelength range reachable with InAs/AlSb QCLs, these results open the way to the development of a wide variety of integrated sensors.

We report on the growth, fabrication, experimental study and application in an absorption gas setup of distributed feed-back antimonide diode lasers with buried grating. First, half laser structures were grown by molecular beam epitaxy on GaSb substrates and stopped at the top of the waveguide. A second order Bragg grating was then defined by interferometric lithography on the top of the structure and dry etched by Reactive Ion Etching. The grating was, afterwards, buried thanks to an epitaxial regrowth of the top cladding layer. Finally, the wafer was processed using standard photolithography and wet etched into 10 µm-wide laser ridges. A single frequency laser emission around 2.3 µm was recorded, a maximum output power of 25 mW and a total continuous tuning range reaching 4.2 nm at fixed temperature. A device has been used to detect methane gas and shows strong potential for gas spectroscopy. This process was also replicated for a target of 3 µm laser emission. These devices showed an output power of 2.5 mW and a SMSR of at least 23 dB, with a 2.5 nm continuous tuning range at fixed temperature.