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1. Structure of defects in silicon oxynitride films

Author

Hasegawa, S., Sakamori, S., Futatsudera, M., Inokuma, T., and Kuratra, Y.

Subjects
Nitrides -- Research, Thin films -- Research, Physics
Abstract

Plasma-enhanced vapor deposition was used to deposit amorphous silicon oxynitride films.

Published
2001

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