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This paper proposes a more accurate eccentricity and tilt measurement method based on Young’s interference experiment. The basic principle of the method is introduced first before the method is simulated. Then the results are obtained when a to-be-adjusted focusing lens with eccentricity and tilt is simulated. The optical sensitivity also is obtained from these simulation results, and the expression for the change in optical path length caused by eccentricity and tilt is analyzed. Use of this method to detect eccentricity and tilt and assist in adjustment of the system allows the instrument to achieve higher accuracy and thus obtain improved imaging quality and spectral resolution.

The designs of 300 mm ruling engine producing gratings and echelles under interferometric control (CIOMP-2) are presented. A new ruling-tool carriage system and its driving mechanism—which are easy to manufacture—are proposed. A new blank carriage system, controlled by a dual-frequency laser interferometer and a piezoelectric actuator, is designed. The CIOMP-2 ruling engine can now rule grating blanks with dimensions up to 300  mm×300  mm, and mainly rules gratings with grating constants between 10 and 2400  lines/mm. The wavelength range of CIOMP-2 gratings is from ultraviolet to mid-infrared wavelengths. Experiments show that the new ruling-tool carriage system works well and stability of motion is improved with the help of a flexure-hinge structure, and the threefold standard deviation values of the blank carriage positioning errors are less than ∼5  nm. For 600  line/mm gratings (diffraction order m=−1), the scatter intensities and ghosts reach 10^−5 of the maximum intensity. The scatter intensities and ghost of gratings ruled with CIOMP-2 are low, and no Rowland ghosts are visible. The gratings ruled by CIOMP-2 have high diffraction efficiency and resolving power. CIOMP-2 can also produce varied-line-space, bend-line, and aberration-reducing gratings and echelles.

All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL). In this letter, we present a design for an all-reflective lithographic projection lens. We also discuss its design idea and structural system. After analysis of the four-mirror optical system, the initial structural parameters are determined, the optical system is optimized, and the tolerances of the system are analyzed. We also show the implementation of optimal layout and desired imaging performance.

We investigate the aberration properties of the conformal optical system with decentered and tilted elements by vector aberration theory. By decentering and tilting the window and corrector of the system, two elements are effectively used together in a particular manner by aberration compensation to achieve off-axis imaging. A conceptual design is performed with a half-field of 2?, the F# of 4, and the wavelength ranging of 3700~4800 nm. The imaging quality can reach the optical diffraction limit and satisfy corresponding requirements.