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2 results on '"Enrico Prevosti"'

1. A Survey of Low Voltage and Low Power Amplifier Topologies

Author

Anna Richelli, Luigi Colalongo, Zsolt Kovacs-Vajna, Giacomo Calvetti, Davide Ferrari, Marco Finanzini, Simone Pinetti, Enrico Prevosti, Jacopo Savoldelli, and Stefano Scarlassara

Subjects
amplifiers, CMOS integrated circuits, ultra low voltage, bulk-driven amplifers, inverter-based amplifiers, rail-to-rail amplifiers, Applications of electric power, TK4001-4102
Abstract

Reducing voltage supply is one of the most effective way to reduce the power consumption, but, on the other hand it is a challenging choice for the analog designers. In this paper, different topologies, well-suited for low voltage and ultra-low voltage supply, are depicted, investigated, designed in the same standard 180 nm technology and compared, highlighting the benefits and the possible applications.

Published
2018
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2. A Survey of Low Voltage and Low Power Amplifier Topologies

Author

Jacopo Savoldelli, Luigi Colalongo, Enrico Prevosti, Anna Richelli, Stefano Scarlassara, Giacomo Calvetti, Simone Pinetti, Zsolt Miklós Kovács-Vajna, Davide Ferrari, and Marco Finanzini

Subjects
business.industry, Computer science, Amplifier, 020208 electrical & electronic engineering, Electrical engineering, lcsh:Applications of electric power, 020206 networking & telecommunications, inverter-based amplifiers, 02 engineering and technology, ultra low voltage, lcsh:TK4001-4102, Network topology, CMOS integrated circuits, rail-to-rail amplifiers, CMOS, Power consumption, bulk-driven amplifers, 0202 electrical engineering, electronic engineering, information engineering, amplifiers, Electrical and Electronic Engineering, business, Low voltage, Voltage
Abstract

Reducing voltage supply is one of the most effective way to reduce the power consumption, but, on the other hand it is a challenging choice for the analog designers. In this paper, different topologies, well-suited for low voltage and ultra-low voltage supply, are depicted, investigated, designed in the same standard 180 nm technology and compared, highlighting the benefits and the possible applications.

Published
2018

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