1. High rate sputter deposition of wear resistant tantalum coatings
- Author
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D. W. Matson, M. D. Merz, and E. D. McClanahan
- Subjects
Materials science ,fungi ,Metallurgy ,Tantalum ,Refractory metals ,chemistry.chemical_element ,Surfaces and Interfaces ,Substrate (electronics) ,Sputter deposition ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Corrosion ,chemistry ,Sputtering ,Phase (matter) ,Ductility - Abstract
The refractory nature and high ductility of body centered cubic (bcc) phase tantalum makes it a suitable material for corrosion‐ and wear‐resistant coatings on surfaces that are subjected to high stresses and harsh chemical and erosive environments. Sputter deposition can produce thick tantalum films but is prone to forming the brittle tetragonal beta phase of this material. Efforts aimed at forming thick bcc phase tantalum coatings in both flat plate and cylindrical geometries by high‐rate triode sputtering methods are discussed. In addition to substrate temperature, the bcc‐to‐beta phase ratio in sputtered tantalum coatings is shown to be sensitive to other substrate surface effects.
- Published
- 1992
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