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Your search keyword '"Dohi, Shojiro"' showing total 14 results
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14 results on '"Dohi, Shojiro"'

6. Multi-cusp ion source for Gen 5.5 doping system

Author

Inouchi, Yutaka, primary, Matsumoto, Takeshi, additional, Dohi, Shojiro, additional, Tanii, Masahiro, additional, Takahashi, Genki, additional, Imai, Katsuharu, additional, Nishimura, Ippei, additional, Tatemichi, Junichi, additional, Konishi, Masashi, additional, and Naito, Masao, additional

Published
2012
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8. Increase of Boron Ion Beam Current Extracted from a Multi-Cusp Ion Source in an Ion Doping System with Mass Separation

Author

Inouchi, Yutaka, primary, Dohi, Shojiro, additional, Tanii, Masahiro, additional, Tatemichi, Junichi, additional, Konishi, Masashi, additional, Nukayama, Masaaki, additional, Nakao, Kazuhiro, additional, Orihira, Koichi, additional, Naito, Masao, additional, Seebauer, Edmund G., additional, Felch, Susan B., additional, Jain, Amitabh, additional, and Kondratenko, Yevgeniy V., additional

Published
2008
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10. NISSIN iG5 implantation tool for generation 5.5 in the flat panel display industry.

Author

Matsumoto, Takeshi, Imai, Katsuharu, Nishimura, Ippei, Inouchi, Yutaka, Dohi, Shojiro, Takahashi, Genki, Tanii, Masahiro, Tatemichi, Junichi, Konishi, Masashi, and Naito, Masao

Subjects
FLAT panel displays, ION bombardment, MAGNETS, CLEANING, SEPARATION (Technology), ORGANIC light emitting diodes, POLYCRYSTALS
Abstract

We have developed a new implantation tool for the generation 5.5 glass. 150 cm high ion beams, which are bigger than the glass height, are extracted from the ion source. After being bent by the mass separation magnet, the beams reach the glass which is standing upright. The new tool exhibits high throughput in high dose applications because of high beam current capability. To cut down on time and workload of maintenance, dedicated kits were designed. A new cleaning method developed to extend the ion source lifetime showed excellent performance of reduction in the beam glitches. [ABSTRACT FROM AUTHOR]

Published
2012
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11. Mass Filtering Function of Magnetic Boundaries in Multi-Cusp Ion Source.

Author

Inouchi, Yutaka, Dohi, Shojiro, Tanii, Masahiro, Konishi, Masashi, and Naito, Masao

Subjects
*ION sources, *HYDROGEN plasmas, *PLASMA gases, *PROTONS, *FILTERS (Mathematics), *MAGNETIC fields, *NUCLEAR physics instruments
Abstract

In a multi-cusp ion source, magnetic boundaries, together with the difference between plasma potential and plasma chamber potential, functioned as a mass filter which filters out heavier ions in multi-component plasmas. This method was applied to mixed inert gas plasmas and hydrogen plasmas and found to be very effective for general purposes which require to decrease unwanted heavier ions. Using this method to the ion source of iG4, target boron current above 80 mA and proton current above 120 mA were obtained. [ABSTRACT FROM AUTHOR]

Published
2011
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