Search

Next-generation plasma-based accelerators can push electron beams to GeV energies within centimetre distances. The plasma, excited by a driver pulse, is indeed able to sustain huge electric fields that can efficiently accelerate a trailing witness bunch, which was experimentally demonstrated on multiple occasions. Thus, the main focus of the current research is being shifted towards achieving a high quality of the beam after the plasma acceleration. In this letter we present beam-driven plasma wakefield acceleration experiment, where initially preformed high-quality witness beam was accelerated inside the plasma and characterized. In this experiment the witness beam quality after the acceleration was maintained on high level, with $0.2\%$ final energy spread and $3.8~\mu m$ resulting normalized transverse emittance after the acceleration. In this article, for the first time to our knowledge, the emittance of the PWFA beam was directly measured.

Next-generation plasma-based accelerators can push electron bunches to gigaelectronvolt energies within centimetre distances. The plasma, excited by a driver pulse, generates large electric fields that can efficiently accelerate a trailing witness bunch making possible the realization of laboratory-scale applications ranging from high-energy colliders to ultra-bright light sources. So far several experiments have demonstrated a significant acceleration but the resulting beam quality, especially the energy spread, is still far from state of the art conventional accelerators. Here we show the results of a beam-driven plasma acceleration experiment where we used an electron bunch as a driver followed by an ultra-short witness. The experiment demonstrates, for the first time, an innovative method to achieve an ultra-low energy spread of the accelerated witness of about 0.1%. This is an order of magnitude smaller than what has been obtained so far. The result can lead to a major breakthrough toward the optimization of the plasma acceleration process and its implementation in forthcoming compact machines for user-oriented applications.