24 results on '"Dillen, Harm"'
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2. Feature grouping to enable edge placement error-aware process control in multi-feature logic use case
3. Understanding advanced DRAM edge placement error budget and opportunities for control
4. Analyze line roughness sources using power spectral density (PSD)
5. Massive metrology and failure identification for DRAM applications (Conference Presentation)
6. Massive CD metrology for EUV failure characterization and EPE metrology
7. Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements
8. CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)
9. CD-SEM distortion quantification for EPE metrology and contour analysis
10. Analyze Line Roughness Sources Using Power Spectral Density (PSD).
11. Massive CD metrology for EUV failure characterization and EPE metrology.
12. Holistic Approach for Overlay and Edge Placement Error to meet the 5-nm Technology Node Requirements.
13. YieldStar based reticle 3D measurements and its application
14. Material analysis techniques used to drive down in-situ mask contamination sources
15. Analyze line roughness sources using power spectral density (PSD)
16. YieldStar based reticle 3D measurements and its application
17. Massive CD metrology for EUV failure characterization and EPE metrology
18. Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements
19. CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)
20. YieldStar based reticle 3D measurements and its application
21. Material analysis techniques used to drive down in-situ mask contamination sources
22. YieldStar based reticle 3D measurements and its application
23. Understanding advanced DRAM edge placement error budget and opportunities for control
24. CD-SEM distortion quantification for EPE metrology and contour analysis
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