110 results on '"De Silva, Anuja"'
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2. Special Section Guest Editorial: Non-chemically Amplified Resists for EUV Lithography
3. Achieving zero EUV patterning defect with dry photoresist system
4. Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes
5. Patterning by Photolithography
6. The road towards aggressive pitch scaling with single exposure EUV
7. Progress and challenges of EUV patterning material design
8. Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
9. High-Z metal-based underlayer patterning for improving EUV stochastics (Conference Presentation)
10. Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
11. EUV chemically amplified resist component distribution and efficiency for stochastic defect control
12. Material and process improvements towards sub 36nm pitch EUV single exposure
13. Approaches to modulating stochastic effects in EUV lithography (Conference Presentation)
14. High-Z metal-based underlayer to improve EUV stochastics (Conference Presentation)
15. Fundamentals of resist stochastics effect for single-expose EUV patterning
16. Investigation of mask absorber induced image shift in EUV lithography
17. Defectivity reduction in area selective atomic layer deposition by monolayer design (Conference Presentation)
18. Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition—Defectivity Reduction by Monolayer Design
19. Study of resist hardmask interaction through surface activation layers
20. Defect detection strategies and process partitioning for single-expose EUV patterning
21. On Thermal Interface Materials With Polydisperse Fillers: Packing Algorithm and Effective Properties
22. Women in Science: Surpassing Subtle and Overt Biases through Intervention Programs
23. Inorganic hardmask development for extreme ultraviolet patterning
24. Polymer brush as adhesion promoter for EUV patterning
25. Defect detection strategies and process partitioning for SE EUV patterning (Conference Presentation)
26. Inorganic Hardmask Development for EUV Patterning
27. Development of amorphous silicon based EUV hardmasks through physical vapor deposition
28. Coater/developer based techniques to improve high-resolution EUV patterning defectivity
29. Development of TiO2 containing hardmasks through plasma-enhanced atomic layer deposition
30. Driving down defect density in composite EUV patterning film stacks
31. Fundamentals of EUV resist-inorganic hardmask interactions
32. Development of TiO2 containing hardmasks through PEALD deposition
33. Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer
34. Single-expose patterning development for EUV lithography
35. EUV single exposure via patterning at aggressive pitch
36. Investigation of mask absorber induced image shift in EUV lithography.
37. Fundamentals of resist stochastics effect for single-expose EUV patterning.
38. Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
39. IBM Research Semiconductor Group.
40. Study of alternate hardmasks for extreme ultraviolet patterning
41. Successes and frontiers in extreme UV patterning
42. EUV patterning successes and frontiers
43. Polymer Brush as Adhesion Promoter for EUV Patterning.
44. Inorganic Hardmask Development for EUV Patterning.
45. Defect detection strategies and process partitioning for SE EUV patterning.
46. Coater/Developer Based Techniques to Improve High-Resolution EUV Patterning Defectivity.
47. Development of Amorphous Silicon based EUV hardmasks through Physical Vapor Deposition.
48. Inorganic hardmask development for extreme ultraviolet patterning.
49. Fundamentals of resist stochastics effect for single-expose EUV patterning
50. Inorganic hardmask development for EUV patterning
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