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Your search keyword '"De Giorgi, M.L."' showing total 34 results
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34 results on '"De Giorgi, M.L."'

14. Encapsulation of SHT-DNA, siRNA and Polypeptide -17 inside Hybrid Polymeric Nano-Protein Folic Acid (HPNP-FA) Carrier as Targeted TGFb Inhibitor for Hepatocellular Carcinoma

Author

Hanafy, N.A.N., primary, Quarta, A., additional, Di Corato, R., additional, Dini, L., additional, Nobile, C., additional, De Giorgi, M.L., additional, Tasco, V., additional, Carallo, S., additional, Cascione, M., additional, Rinaldi, R., additional, Fabregat, I., additional, and Leporatti, S., additional

Published
2016
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23. Carbon nitride films deposited by reactive laser ablation

Author

De Giorgi, M.L., primary, Leggieri, G., additional, Luches, A., additional, Martino, M., additional, Perrone, A., additional, Zocco, A., additional, Barucca, G., additional, Majni, G., additional, Gyorgy, E., additional, Mihailescu, I.N., additional, and Popescu, M., additional

Published
1998
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29. Stoichiometric analyses of Cd1−xMnxTe film deposition by pulsed laser ablation

Author

Acquaviva, S. and De Giorgi, M.L.

Subjects
*DILUTED magnetic semiconductors, *LASER ablation
Abstract

Several experiments were carried out during pulsed laser deposition (PLD) of semimagnetic semiconductor (SMS) films in order to identify the contributions of the target and/or the substrate and/or the plume effects on the incongruent material transfer in the Cd1−xMnxTe film deposition on heated substrates. During XeCl laser ablation of a Cd1−xMnxTe target (x=0.50) at 6 J/cm2 fluence, films were deposited onto unheated substrates at different collecting angles with respect to the plume expansion direction. In the same time, the angular distribution of the emitting chemical species in the plasma was investigated by a combination of wavelength, temporal and spatial resolved optical emission spectroscopic measurements. Film composition was analysed by energy dispersion X-ray spectroscopy (EDS) and Rutherford backscattering spectrometry (RBS). Results are used as the basis for a study of the processes that control the stoichiometry of the deposited semimagnetic semiconductor films. [Copyright &y& Elsevier]

Published
2003
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30. Laser deposition of thin SiO2and ITO films

Author

Acquaviva, S., De Giorgi, M.L., Elia, L., Fernández, M., Leggieri, G., Luches, A., Martino, M., and Zocco, A.

Abstract

Multicomponent films like ITO (indium tin oxide) and silica (SiO2) can be efficiently deposited by using the reactive pulsed laser deposition (RPLD) technique. We ablated Si, SiO and ITO targets in low-pressure O2(0.1–5Pa) with XeCl and KrF laser pulses at fluences of 5–8J/cm2. The films were deposited on Si〈100〉substrates at temperatures of 20–600°C. The substrate was generally set parallel to the target. To reduce droplet deposition, some films were deposited in off-axis configuration or using the so-called “eclipse method”, characterized by a shadow mask between target and substrate. Dense, continuous ITO films with resistivity as low as 1.6×10−4Ωcm and a high transparency in the visible region were deposited. Ultra-thin (∼6nm) films were successfully used as electrodes in optoelectronic devices. Dense, stoichiometric, thick (>2μm) SiO2films were deposited on substrates at room temperature. Droplet density and surface roughness are kept quite low (∼5nm).

Published
2000
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31. Carbon Nitride Films Deposited on 〈111〉 Si Substrates by Reactive Excimer Laser Ablation

Author

D'Anna, E., De Giorgi, M.L., Leggieri, G., Luches, A., Martino, M., Perrone, A., and Zocco, A.

Abstract

We deposited CNx films on 〈111〉 Si substrates at room temperature by XeCl laser ablation of graphite targets in low pressure N2 atmosphere at laser fluences in the range of 3 to 16 J/cm2. Different diagnostic techniques (SEM, TEM, RBS, XPS, XRD) were used to characterize the deposited films. Films are plane and adhesive to their substrates. The deposition rates depend on laser fluence, ambient pressure and target to substrate distance. The nitrogen concentration increases with increasing ambient pressure and laser fluence. N/C atomic ratios up to 0.7 were inferred from RBS measurements in films deposited at a fluence of 16 J/cm2. XRD and TEM analyses point to an oriented microcrystalline structure of the films deposited at relatively high laser fluences (12 to 16 J/cm2). This could be due to the high kinetic energy of the radicals in the laser produced plasma plume.

Published
1998
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