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1. Micro CT Test Pattern for Everyday Productive Use

Author

Adam Kubec, Damien Eschimese, and Jens Peter Steffen

Subjects
Technology
Abstract

The rapid evolution of Industrial Computed Tomography (CT) continues to raise the bar for high-resolution, accurate, and precise imaging tools. Developing effective micro CT test patterns is key to meeting these expectations. This study presents XRnanotech's advanced MicroCT test target, engineered using micro- and nano-fabrication technologies, including electron beam lithography. There are several variants; one set features various lines and spaces with dimensions as small as 200 nm and a gold contrast height of 1.5 µm for high contrast. Another set features a contrast height of approximately 4 µm, with the smallest feature sizes of 300 nm and 400 nm, respectively. The paper highlights its performance metrics, ultimately demonstrating how this innovation advances the potential of MicroCT testing.

Published
2024
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2. Large-scale vivid metasurface color printing using advanced 12-in. immersion photolithography

Author

Egor Khaidarov, Damien Eschimese, Keng Heng Lai, Aihong Huang, Yuan Hsing Fu, Qunying Lin, Ramon Paniagua-Dominguez, and Arseniy I. Kuznetsov

Subjects
Medicine, Science
Abstract

Abstract Nanostructures exhibiting optical resonances (so-called nanoantennas) have strong potential for applications in color printing and filtering with sub-wavelength resolution. While small scale demonstrations of these systems are interesting as a proof-of-concept, their large scale and volume fabrication requires deeper analysis and further development for industrial adoption. Here, we evaluate the color quality produced by large size nanoantenna arrays fabricated on a 12-in. wafer using deep UV immersion photolithography and dry etching processes. The color reproduction and quality are analyzed in context of the CIE color diagram, showing that a vivid and vibrant color palette, almost fully covering the sRGB color space, can be obtained with this mass-manufacturing-ready fabrication process. The obtained results, thus, provide a solid foundation for the potential industrial adoption of this emerging technology and expose the limits and challenges of the process.

Published
2022
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4. All-Optical Modulation in Chains of Silicon Nanoantennas

Author

Shiqiang Li, Dmitry Morits, Shiyang Zhu, Reuben M. Bakker, Ye Feng Yu, Lu Ding, Arseniy I. Kuznetsov, Ramón Paniagua-Domínguez, and Damien Eschimese

Subjects
Materials science, Silicon, Nanophotonics, chemistry.chemical_element, 02 engineering and technology, Dielectric, 01 natural sciences, Light scattering, dielectric nanoantenna, 010309 optics, Resonator, 0103 physical sciences, Electrical and Electronic Engineering, Silicon photonics, optical modulation, silicon photonics, business.industry, 021001 nanoscience & nanotechnology, Chip, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, chemistry, Modulation, Optoelectronics, resonator, 0210 nano-technology, business, Biotechnology
Abstract

Dielectric nanoantennas represent a new branch of nanophotonics that allows efficient control of light scattering at nanoscale. Coupled nanoantennas can guide light on a chip over large distances without radiation losses, enabling a new nanoantenna-based silicon photonics platform with enchanced functionalities for light-on-chip integration. Here, an all-optical on-chip modulator based on a one-dimensional chain of silicon nanoantennas is proposed and experimentally demonstrated in the 1.55 μm telecommunication wavelength range. A resonator, with a quality factor up to 104, is designed on the basis of a chain of coupled silicon nanoantennas, each supporting the electric dipole Mie resonance. Wafer-level fabrication of the nanoantennas is realized using CMOS compatible photolithography. High-speed modulation of the cavity mode is experimentally demonstrated via optical injection of free electrons and holes using a pulsed laser. The modulator is shown to have a response time of 50 ps and modulation depth beyond 25 dB, with 10 dB switching power being as low as âˆ50 fJ. Low power and high-speed switching of the proposed device combined with the large-scale fabrication capabilities pave the way to applications of this dielectric nanoantenna-based approach to industrial on-chip photonics.

Published
2020
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5. Tunable nanoantennas with liquid crystals: dynamic wavefront control with sub-wavelength resolution

Author

Arseniy I. Kuznetsov, Rasna Maruthiyodan Veetil, Anton V. Baranikov, Parikshit Moitra, Shampy Mansha, Damien Eschimese, Tobias W. W. Mass, Xinan Liang, Ramón Paniagua-Domínguez, and Xuewu Xu

Subjects
Wavefront, Fabrication, Lidar, Interfacing, Computer science, business.industry, Liquid crystal, Resolution (electron density), Nanophotonics, Holographic display, Optoelectronics, business
Abstract

Nanostructured surfaces with engineered electromagnetic response, so called metasurfaces, are a very active topic of research in the nanophotonics community, stemming from their ability to manipulate the light wavefront at will with unparalleled resolution. Currently, one of the main limitations of this kind of devices is their static character, i.e., the fact that their functionality (e.g. focusing light, steering light, etc.) becomes fixed upon fabrication. To circumvent this issue, significant efforts are being made to achieve dynamic control of these devices by different means, one of the most promising being interfacing them with liquid crystals. In this talk, we will present our recent results in this direction, towards achieving dynamic control over each individual nanoantenna of the metasurface, as to realize the next generation of Spatial Light Modulators with sub-wavelength resolution, with broad applications in areas such as near-eye and holographic displays or LIDAR.

Published
2021
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6. Imaging properties of large field-of-view quadratic metalenses and their applications to fingerprint detection

Author

Tobias W. W. Mass, Arseniy I. Kuznetsov, Damien Eschimese, Shiqiang Li, Egor Khaidarov, Emmanuel Lassalle, Ramón Paniagua-Domínguez, and Anton V. Baranikov

Subjects
Large field of view, Computer science, Distortion (optics), FOS: Physical sciences, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, 010309 optics, Fingerprint detection, Quadratic equation, Computer Science::Computer Vision and Pattern Recognition, 0103 physical sciences, Electronics, Electrical and Electronic Engineering, 0210 nano-technology, Algorithm, Biotechnology, Physics - Optics, Optics (physics.optics)
Abstract

Dielectric metasurfaces, extremely thin nanostructured dielectric surfaces, hold promise to replace conventional refractive optics, such as lenses, due to their high performance and compactness. However, designing large field-of-view (FOV) metalenses, which are of particular importance when imaging relatively big objects at short distances, remains one of the most critical challenges. Recently, metalenses implementing a quadratic phase profile have been put forward to solve this problem with a single element, but despite their theoretical ability to provide $180^\circ\,$FOV, imaging over very large FOV has not been demonstrated yet. In this work, we provide an in-depth analysis of the imaging properties of quadratic metalenses and, in particular, show that due to their intrinsic barrel distortion or fish-eye effect, there is a fundamental trade-off between the FOV achievable in a given imaging configuration and the optical resolution of the metalens and/or the detector resolution. To illustrate how to harness the full potential of quadratic metalenses, we apply these considerations to the fingerprint detection problem, and demonstrate experimentally the full imaging of a $5\,$mm fingerprint with features of the order of $100\,\mu$m, with a metalens ten times smaller in size and located at a distance of only $2.5\,$mm away from the object. This constitutes the most compact system reported so far for the fingerprint detection., Comment: 6 figures

Published
2021
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7. 80-degree field-of-view transmissive metasurface-based spatial light modulator

Author

Baranikov, Anton V., Harald Giessen, Ramon Paniagua-Dominguez, Arseniy Kuznetsov, Li Shi-Qiang, Damien Eschimese, Xuewu Xu, Simon Thiele, Simon Ristok, Rasna Maruthiyodan Veetil, Mass, Tobias W. W., and Parikshit Moitra

Subjects
FOS: Physical sciences, Physics - Applied Physics, Applied Physics (physics.app-ph), Physics - Optics, Optics (physics.optics)
Abstract

Compact, lightweight and high-performance spatial light modulators (SLMs) are crucial for modern optical technologies. The drive for pixel miniaturization, necessary to improve their performance, has led to a promising alternative, active optical metasurfaces, which enable tunable subwavelength wavefront manipulation. Here, we demonstrate an all-solid-state programmable transmissive SLM device based on Huygens dielectric metasurfaces. The metasurface features electrical tunability, provided by mature liquid crystals (LCs) technology. In contrast to conventional LC SLMs, our device enables high resolution with a pixel size of ~1 um. We demonstrate its performance by realizing programmable beam steering, which exhibits high side mode suppression ratio of ~6 dB. By complementing the device with a 3D printed doublet microlens, fabricated using two-photon polymerization, we enhance the field of view up to ~80 degrees. The developed prototype paves the way to compact, efficient and multifunctional devices for next generation augmented reality displays, light detection and ranging (LiDAR) systems and optical computing., Comment: 25 pages, 8 figures

Published
2021
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8. Size and shape control of a variety of metallic nanostructures using tilted, rotating evaporation and lithographic lift-off techniques

Author

Thierry Melin, David Troadec, Gaëtan Lévêque, François Vaurette, Damien Eschimese, Steve Arscott, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Centrale de Micro Nano Fabrication - IEMN (CMNF-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Ecole Polytechnique Fédérale de Lausanne (EPFL), Physique-IEMN (PHYSIQUE-IEMN), Nano and Microsystems - IEMN (NAM6 - IEMN), Renatech Network, ANR-16-CE09-0029,TIPTOP_1,Fabrication de leviers de microscopie à force atomique pour des applications de spectroscopie Raman à exaltation de pointe(2016), Physique - IEMN (PHYSIQUE - IEMN), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), and A c k n o w l e d g e m e n t s :We would very much like to thank Annie Fattorini and Marc Dewitte (Engineers at IEMN) for their help with the thermal evaporation. Tis work was supported by the French Agence National de La Recherche (ANR) ‘TIPTOP_1’ project (ANR-16-CE09–0029), the French region Hauts-de-France (IEMN-Horiba project—DOS0025370/00 and 17007720), and the French RENATECH network.

Subjects
0301 basic medicine, Materials science, Nanostructure, Rotational symmetry, lcsh:Medicine, Physics::Optics, Article, Condensed Matter::Materials Science, 03 medical and health sciences, [SPI]Engineering Sciences [physics], 0302 clinical medicine, Optics, lcsh:Science, Lithography, ComputingMilieux_MISCELLANEOUS, Multidisciplinary, Metallic Object, Surface patterning, business.industry, lcsh:R, Metamaterial, Evaporation (deposition), 030104 developmental biology, Nanoparticles, lcsh:Q, Nanometre, Photonics, business, 030217 neurology & neurosurgery
Abstract

Here, we demonstrate a simple top-down method for nanotechnology whereby electron beam (ebeam) lithography can be combined with tilted, rotated thermal evaporation to control the topography and size of an assortment of metallic objects at the nanometre scale. In order to do this, the evaporation tilt angle is varied between 1 and 24°. The technique allows the 3-dimensional tailoring of a range of metallic object shapes from sharp, flat bottomed spikes to hollow cylinders and rings—all of which have rotational symmetry and whose critical dimensions are much smaller than the lithographic feature size. The lithographic feature size is varied from 400 nm down to 40 nm. The nanostructures are characterized using electron microscopy techniques—the specific shape can be predicted using topographic modelling of the deposition. Although individual nanostructures are studied here, the idea can easily be extended to fabricate arrays for e.g. photonics and metamaterials. Being a generic technique—depending on easily controlled lithographic and evaporation parameters—it can be readily incorporated into any standard planar process and could be adapted to suit other thin-film materials deposited using physical means.

Published
2019
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9. A Comparative Investigation of Plasmonic Properties between Tunable Nanoobjects and Metallized Nanoprobes for Optical Spectroscopy

Author

De Bettignies, Gaëtan Lévêque, Joachim Schreiber, Marc Chaigneau, Steve Arscott, Thierry Melin, Patrick Hsia, Damien Eschimese, Dominique Deresmes, François Vaurette, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), HORIBA Scientific [France], Centrale de Micro Nano Fabrication - IEMN (CMNF-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Raman Division, HORIBA France SAS [Villeneuve d'Ascq], HORIBA Scientific [France]-HORIBA Scientific [France], Nano and Microsystems - IEMN (NAM6 - IEMN), Physique-IEMN (PHYSIQUE-IEMN), Renatech Network, ANR-16-CE09-0029,TIPTOP_1,Fabrication de leviers de microscopie à force atomique pour des applications de spectroscopie Raman à exaltation de pointe(2016), ANR-11-EQPX-0015,Excelsior,Centre expérimental pour l'étude des propriétés des nanodispositifs dans un large spectre du DC au moyen Infra-rouge.(2011), Physique - IEMN (PHYSIQUE - IEMN), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), ACKNOWLEDGMENTSWe acknowledge fruitful discussions with P. Tilmant, C. Ha, and O. Kerivel. This work was performed by using the facilities of the ́French RENATECH network and of the ExCELSiOR Nano-science Characterization Center. We acknowledge financial support from the French Region Hauts de France under ́contracts DOS0025370/00 and 17007720 and from the National Research Agency (ANR) under contract ANR-16-CE09-0029. D.E. acknowledges financial support from the ANRT via a CIFRE grant no. 2015/0803., and RENATECH network

Subjects
Materials science, Physics::Optics, 02 engineering and technology, 010402 general chemistry, 01 natural sciences, plasmonics, symbols.namesake, nano-antennas, Emission spectrum, Physical and Theoretical Chemistry, tip-enhanced optical spectroscopy, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Spectroscopy, Plasmon, Total internal reflection, atomic force microscopy, Scattering, business.industry, 021001 nanoscience & nanotechnology, 0104 chemical sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, [CHIM.THEO]Chemical Sciences/Theoretical and/or physical chemistry, General Energy, Nanolithography, localized surface plasmons, symbols, Optoelectronics, nanofabrication, total-internal-reflection scattering spectroscopy, 0210 nano-technology, Raman spectroscopy, business, dark-field imaging, Localized surface plasmon
Abstract

International audience; In order to evaluate the optical efficiency of tip-based probes for future tip-enhanced optical spectroscopy applications, we developed an experimental setup based on the coupling of an achromatic inverted microscope equipped with a total internal reflection objective and an atomic force microscopy (AFM) head. This spectroscopic tool has been validated using individual nanofabricated antennas (gold nanodisks/nanocones) on a glass substrate which act as nanoresonators based on localized surface plasmons. Spectrally tunable transverse electric and magnetic plasmonic resonances are identified and are in excellent agreement with numerical calculations performed as a function of the nanoantenna geometry and size. We investigated a series of state-of-the-art gold-coated AFM probes, which are commonly used for tip-enhanced (Raman spectroscopy) optical experiments. Their scattering spectrum consists of resonances depending on the tip sharpness or granularity superimposed on a broad emission spectrum due to a semi-infinite metal layer acting as a nonresonant antenna. From the comparison between the plasmonic response of both types of optical antennas, a new generation of probes for tip-enhanced optical spectroscopy is proposed in which single plasmonic nanoantennas are engineered at the apex of a nonmetallic AFM tip. As from numerical simulation results, such tips would ensure a spectral tunability as a function of the material, size, and geometry, together with expected high enhancement factors. Such features would allow the design of spectrally tunable surface-enhanced Raman spectroscopy substrates and should be a reliable and efficient alternative to tips commonly used in tip-enhanced optical spectroscopy experiments such as tip-enhanced Raman spectroscopy.

Published
2019
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10. Precise tailoring of evaporated gold nanocones using electron beam lithography and lift-off

Author

Thierry Melin, Damien Eschimese, Steve Arscott, François Vaurette, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Centrale de Micro Nano Fabrication - IEMN (CMNF-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Physique-IEMN (PHYSIQUE-IEMN), Nano and Microsystems - IEMN (NAM6 - IEMN), Renatech Network, ANR-16-CE09-0029,TIPTOP_1,Fabrication de leviers de microscopie à force atomique pour des applications de spectroscopie Raman à exaltation de pointe(2016), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Physique - IEMN (PHYSIQUE - IEMN), Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520 (IEMN), and Centre National de la Recherche Scientifique (CNRS)-Université de Lille-Université Polytechnique Hauts-de-France (UPHF)-Ecole Centrale de Lille-Université Polytechnique Hauts-de-France (UPHF)-Institut supérieur de l'électronique et du numérique (ISEN)

Subjects
Shadow mask, Materials science, Fabrication, Scanning electron microscope, Bioengineering, 02 engineering and technology, 010402 general chemistry, 01 natural sciences, [SPI]Engineering Sciences [physics], General Materials Science, Wafer, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Electrical and Electronic Engineering, Lithography, ComputingMilieux_MISCELLANEOUS, business.industry, Mechanical Engineering, General Chemistry, 021001 nanoscience & nanotechnology, 0104 chemical sciences, Nanolithography, Resist, Mechanics of Materials, Optoelectronics, 0210 nano-technology, business, Electron-beam lithography
Abstract

International audience; The ability to fabricate nanocones with precise dimensions is essential for several emerging applications. We demonstrate here a method which can be used to fabricate arrays of gold nanocones with high dimensional precision using lithographic and lift-off means. electron beam (ebeam) writing of a spin-coated PMMA-based bilayer resist deposited onto silicon wafers is used to form a shadow mask. This mask gradually closes as the deposition of gold (using ebeam evaporation) proceeds-the result is arrays of gold nanocones on the silicon wafer surface after lift-off of the resist. Observations using scanning electron microscopy enable a statistical study of the dimensions of 360 gold nanocones-the results demonstrate the high precision of the nanocones dimensions. The fabrication process enables the creation of arrays of nanocones with a base diameter varying from 53.6 ± 2.1 nm to 94.1 ± 2.4 nm, a vertical height ranging from 71.3 ± 4.1 nm to 153.4 ± 3.4 nm, and an apex radius of curvature ranging from 8.4 ± 1.2 nm to 11.6 ± 1.5 nm. The results are compared with the predictions of a deposition model which considers the evolving shadow masking during the gold deposition to compute the nanocone profile.

Published
2020
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11. Transport mechanisms in a puckered graphene-on-lattice

Author

François Vaurette, D. Vignaud, Jean-Francois Lampin, Maxime Berthe, O. Lancry, Tao Xu, Bin Wei, Jimmy Xu, S. Eliet, Damien Eschimese, Bruno Grandidier, Wei Wei, Elisabeth Galopin, Henri Happy, Emiliano Pallecchi, A. Díaz Álvarez, D. Desremes, University of Shanghai [Shanghai], Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Physique - IEMN (PHYSIQUE - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Carbon - IEMN (CARBON - IEMN), Laboratoire Avancé de Spectroscopie pour les Intéractions la Réactivité et l'Environnement - UMR 8516 (LASIRE), Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Northwestern Polytechnical University [Xi'an] (NPU), Transduction, Propagation et Imagerie Acoustique - IEMN (TPIA - IEMN), Institut d’Électronique, de Microélectronique et de Nanotechnologie - Département Opto-Acousto-Électronique - UMR 8520 (IEMN-DOAE), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Photonique THz - IEMN (PHOTONIQUE THz - IEMN), EPItaxie et PHYsique des hétérostructures - IEMN (EPIPHY - IEMN), AcknowledgementsWe thank C. Delerue, D. Stiévenard and L. Wirtz for fruitful discussions. This study was financially supported by the European Community's Seventh Framework Program (Grant No. PITN-GA-2012-316751, 'Nanoembrace' Project), the EQUIPEX program Excelsior (Grant No. ANR-11-EQPX-0015), and the RENATECH network. T. Xu acknowledges the supports of the National Natural Science Foundation of China (Grant No. 61775130) and of the Region Nord-Pas-de-Calais (Grant No. 2013_11806). J. Xu acknowledges the financial support of the University of Lille., Renatech Network, ANR-11-EQPX-0015,Excelsior,Centre expérimental pour l'étude des propriétés des nanodispositifs dans un large spectre du DC au moyen Infra-rouge.(2011), European Project: 316751,EC:FP7:PEOPLE,FP7-PEOPLE-2012-ITN,NANOEMBRACE(2013), Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Centrale Lille Institut (CLIL), Centrale de Micro Nano Fabrication - IEMN (CMNF-IEMN), Photonique THz - IEMN (PHOTONIQ THz - IEMN), Carbon-IEMN (CARBON-IEMN), and Physique-IEMN (PHYSIQUE-IEMN)

Subjects
[PHYS]Physics [physics], Materials science, Graphene, business.industry, Compliant substrate, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, Graphene monolayer, [SPI]Engineering Sciences [physics], Electrical transport, Electrical resistivity and conductivity, law, Lattice (order), 0103 physical sciences, Optoelectronics, [CHIM]Chemical Sciences, General Materials Science, [NLIN]Nonlinear Sciences [physics], 010306 general physics, 0210 nano-technology, business, Nanoscopic scale, Nanopillar
Abstract

International audience; Understanding the fundamental properties of graphene when its topography is patterned by the use of a compliant substrate is essential to improve the performances of graphene sensors. Here we suspend a graphene monolayer on SiO2 nanopillar arrays to form a puckered graphene-on-lattice and investigate the strain and electrical transport at the nanoscale. Despite a nonuniform strain in the graphene-on-lattice, the resistivity is governed by thermally activated transport and not the strain. We show that the high thermal activation energy results from a low charge carrier density and a periodic change of the chemical potential induced by the interaction of the graphene monolayer with the nanopillars, making the use of graphene-on-lattice attractive to further increase the electrical response of graphene sensors.

Published
2018
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12. Correction: Transport mechanisms in a puckered graphene-on-lattice

Author

A. Díaz Álvarez, D. Desremes, Damien Eschimese, Jimmy Xu, J-F. Lampin, Bruno Grandidier, François Vaurette, Maxime Berthe, Emiliano Pallecchi, D. Vignaud, Elisabeth Galopin, Wei Wei, Henri Happy, C Brillard, S. Eliet, O. Lancry, Tao Xu, and Bin Wei

Subjects
Materials science, Condensed matter physics, Graphene, law, Lattice (order), Hardware_INTEGRATEDCIRCUITS, General Materials Science, Nanoscopic scale, law.invention
Abstract

Correction for ‘Transport mechanisms in a puckered graphene-on-lattice’ by T. Xu et al., Nanoscale, 2018, 10, 7519–7525.

Published
2019
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