24 results on '"Dalal Fadil"'
Search Results
2. A Broadband Active Microwave Monolithically Integrated Circuit Balun in Graphene Technology
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Dalal Fadil, Vikram Passi, Wei Wei, Soukaina Ben Salk, Di Zhou, Wlodek Strupinski, Max C. Lemme, Thomas Zimmer, Emiliano Pallecchi, Henri Happy, and Sebastien Fregonese
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graphene ,microwave ,mmic ,integrated circuits ,active balun ,2d materials ,Technology ,Engineering (General). Civil engineering (General) ,TA1-2040 ,Biology (General) ,QH301-705.5 ,Physics ,QC1-999 ,Chemistry ,QD1-999 - Abstract
This paper presents the first graphene radiofrequency (RF) monolithic integrated balun circuit. It is composed of four integrated graphene field effect transistors (GFETs). This innovative active balun concept takes advantage of the GFET ambipolar behavior. It is realized using an advanced silicon carbide (SiC) based bilayer graphene FET technology having RF performances of about 20 GHz. Balun circuit measurement demonstrates its high frequency capability. An upper limit of 6 GHz has been achieved when considering a phase difference lower than 10° and a magnitude of amplitude imbalance less than 0.5 dB. Hence, this circuit topology shows excellent performance with large broadband performance and a functionality of up to one-third of the transit frequency of the transistor.
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- 2020
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3. Devices and circuits for HF applications based on 2D materials.
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Simon Skrzypczak, Di Zhou, Wei Wei, Dalal Fadil, Dominique Vignaud, Emiliano Pallecchi, and Henri Happy
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- 2023
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4. High-Frequency Noise Characterization and Modeling of Graphene Field-Effect Transistors
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Gilles Dambrine, Emiliano Pallecchi, Marina Deng, Thomas Zimmer, Wei Wei, Dalal Fadil, Sebastien Fregonese, Magali De Matos, Henri Happy, Laboratoire de l'intégration, du matériau au système (IMS), Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Carbon-IEMN (CARBON-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Advanced NanOmeter DEvices - IEMN (ANODE - IEMN), NANOELECTRONIQUE/MODEL, Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS)-Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Renatech Network, Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Carbon - IEMN (CARBON - IEMN), and Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS)-Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS)
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Radiation ,Materials science ,Noise measurement ,Graphene ,business.industry ,Transistor ,020206 networking & telecommunications ,02 engineering and technology ,Chemical vapor deposition ,Condensed Matter Physics ,Noise figure ,7. Clean energy ,law.invention ,chemistry.chemical_compound ,chemistry ,law ,0202 electrical engineering, electronic engineering, information engineering ,Scattering parameters ,Silicon carbide ,Optoelectronics ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,Electrical and Electronic Engineering ,business ,Noise (radio) - Abstract
International audience; This article presents the small-signal and noise characterization of different technologies based on chemical vapor deposition (CVD) and silicon-carbide (SiC) graphene field-effect transistors (GFETs). The noise model, built on noise figure measurements under 50 Ω using the F 50 method, was verified by additional source-pull measurements, with special care for the GFET stability. The four noise parameters were then extracted by using the validated F 50 model up to 18 GHz, and the correlations between noise and small-signal parameters were shown for two different configurations: top-gated and back-gated GFETs.
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- 2020
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5. A Broadband Active Microwave Monolithically Integrated Circuit Balun in Graphene Technology
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Emiliano Pallecchi, Thomas Zimmer, Max C. Lemme, Vikram Passi, Di Zhou, Soukaina Ben Salk, Henri Happy, Dalal Fadil, Sebastien Fregonese, Wei Wei, Wlodek Strupinski, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), School of Computer and Electronic Information [Guangxi University], Guangxi University [Nanning], Warsaw University of Technology [Warsaw], Rheinisch-Westfälische Technische Hochschule Aachen University (RWTH), Laboratoire de l'intégration, du matériau au système (IMS), Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Carbon - IEMN (CARBON - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), EU Horizon2020 research and innovation programe (Graphene Flagship – Graphene Core2 785219) for financial supports. This work was partially supported by the French RENATECH network, Renatech Network, European Project: 785219,H2020,GrapheneCore2(2018), Rheinisch-Westfälische Technische Hochschule Aachen (RWTH), Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), and Carbon-IEMN (CARBON-IEMN)
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Materials science ,microwave ,mmic ,02 engineering and technology ,Integrated circuit ,01 natural sciences ,lcsh:Technology ,law.invention ,lcsh:Chemistry ,chemistry.chemical_compound ,law ,Balun ,0103 physical sciences ,Silicon carbide ,General Materials Science ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,Instrumentation ,lcsh:QH301-705.5 ,Monolithic microwave integrated circuit ,010302 applied physics ,Fluid Flow and Transfer Processes ,Graphene ,business.industry ,lcsh:T ,Process Chemistry and Technology ,2d materials ,Transistor ,graphene ,General Engineering ,021001 nanoscience & nanotechnology ,active balun ,lcsh:QC1-999 ,Computer Science Applications ,chemistry ,lcsh:Biology (General) ,lcsh:QD1-999 ,lcsh:TA1-2040 ,Optoelectronics ,0210 nano-technology ,Bilayer graphene ,business ,lcsh:Engineering (General). Civil engineering (General) ,ddc:600 ,integrated circuits ,Microwave ,lcsh:Physics - Abstract
Applied Sciences 10(6), 2183 (2020). doi:10.3390/app10062183, Published by MDPI, Basel
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- 2020
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6. Photocurrent Generation Mechanisms in Molybdenum‐Contacted Semiconducting Black Phosphorus and Contributions from the Photobolometric Effect
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Ravindra Ketan Mehta, Dalal Fadil, Anupama B. Kaul, and Gustavo A. Saenz
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Photocurrent ,Materials science ,chemistry.chemical_element ,Photodetector ,Surfaces and Interfaces ,Photochemistry ,Condensed Matter Physics ,Black phosphorus ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,chemistry.chemical_compound ,chemistry ,Molybdenum ,Materials Chemistry ,Electrical and Electronic Engineering ,Molybdenum disulfide - Published
- 2021
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7. Graphene for radio frequency electronics
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Wei, Wei, Dalal, Fadil, Fregonese, Sebastien, Strupinski, Wlodek, Pallecchi, Emiliano, Happy, Henri, Laboratoire d'ingénierie pour les systèmes complexes (UR LISC), Institut National de Recherche pour l’Agriculture, l’Alimentation et l’Environnement (INRAE), Laboratoire de l'intégration, du matériau au système (IMS), Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Warsaw University of Technology [Warsaw], Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Carbon-IEMN (CARBON-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Renatech Network, European Project: 785219, Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Carbon - IEMN (CARBON - IEMN), and European Project: 785219,H2020,GrapheneCore2(2018)
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Hardware_INTEGRATEDCIRCUITS ,Hardware_PERFORMANCEANDRELIABILITY ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics - Abstract
oral; International audience; In the framework of the European project Flagship Graphene, we have developed several process technologies, for fabricating graphene field-effect transistors, for radio frequency (RF) applications. Depending on the technique used to synthesize graphene, different transistors topologies were designed, given rise to different applications. Graphene materials under consideration include graphene growth on silicon carbide, graphene growth by chemical vapor deposition (CVD) on copper foil. After fabrication of transistors on rigid and on flexible substrates, high frequency characterization of devices is made. Based on the performance of transistors, RF circuits where designed and fabricated.
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- 2020
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8. On the chemically-assisted excitonic enhancement in environmentally-friendly solution dispersions of two-dimensional MoS2 and WS2
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Ridwan F. Hossain, Gustavo A. Saenz, Dalal Fadil, and Anupama B. Kaul
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education.field_of_study ,Materials science ,Photoluminescence ,Band gap ,Population ,Tungsten disulfide ,Analytical chemistry ,Nanoparticle ,02 engineering and technology ,General Chemistry ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,0104 chemical sciences ,symbols.namesake ,chemistry.chemical_compound ,Terpineol ,chemistry ,Materials Chemistry ,symbols ,0210 nano-technology ,education ,Raman spectroscopy ,Molybdenum disulfide - Abstract
Current rectifying p–n junction devices are demonstrated from solution exfoliated two-dimensional (2D) molybdenum disulfide (MoS2), and excitonic effects are elucidated for solution dispersions of not only MoS2, but also another refractory 2D sulfide, tungsten disulfide (WS2). The excitonic enhancement effects are correlated to new solution chemistries using environmentally friendly terpineol. The role of sonication time and centrifugation are analyzed in the presence of terpineol with isopropyl alcohol and surfactant ethyl cellulose, where the red-shift in the excitonic peaks is correlated to the size distribution of the nanoparticles using optical interferometry. This was correlated to the data obtained using photoluminescence, Raman spectroscopy, scanning electron microscopy and particle size analysis which also yielded results that were consistent with this finding. The terpineol dispersion exhibits the least red-shift of 5 meV from the top to the bottom of the vial, in contrast to non-terpineol dispersions where the red-shift is calculated to be as high as 90 meV, indicating terpineol's effectiveness in exfoliating a larger population of mono-to few-layer nanomembranes. Analysis of the optical absorption spectra allows for the extraction of the energy band gap for MoS2 and WS2. These results clearly show evidence of quantum confinement effects in solution dispersions of chemically exfoliated 2D MoS2 and WS2 which can be harnessed for a wide variety of optoelectronic devices that are amenable to scalable and high-throughput synthesis routes, using environmentally friendly solution chemistries.
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- 2017
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9. Electronic and Optical Properties Characterization of MoS2 Two-Dimensional Exfoliated nanomaterials
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Dalal Fadil, Ridwan H. Fayaz, and Anupama B. Kaul
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Materials science ,Mechanical Engineering ,Sonication ,Nanotechnology ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Chemical reaction ,Exfoliation joint ,Nanomaterials ,Characterization (materials science) ,Solvent ,chemistry.chemical_compound ,chemistry ,Mechanics of Materials ,0103 physical sciences ,General Materials Science ,Absorption (chemistry) ,010306 general physics ,0210 nano-technology ,Molybdenum disulfide - Abstract
For optoelectronic application, two-dimensional materials such as molybdenum disulfide (MoS2) are very promising candidate with their interesting electronic and optical properties. The layered structure of these materials makes them amenable to mechanical exfoliation to form scalable 2D atomic crystals. For width range of applications, liquid phase exfoliation using sonication and centrifugation in appropriate solvent is needed. This simple and scalable technique gives high quality of exfoliation of 2D materials without chemical reactions. In this paper, we report an example of the optical and electronic characterizations on MoS2 synthesized by liquid exfoliation in specific solvent.
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- 2016
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10. Characterization of Electronic Properties of Two-dimensional Refractory Selenides and Tellurides
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Gustavo A. Saenz, Dalal Fadil, Chandan Biswas, and Anupama B. Kaul
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Materials science ,business.industry ,Graphene ,Band gap ,Mechanical Engineering ,Conductance ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Thermal conduction ,01 natural sciences ,Characterization (materials science) ,law.invention ,Transition metal ,Mechanics of Materials ,law ,0103 physical sciences ,Monolayer ,Optoelectronics ,General Materials Science ,010306 general physics ,0210 nano-technology ,business ,Ohmic contact - Abstract
Transition metal dichalcogenides (TMDs) are emerging among the potential alternatives to graphene. The monolayer of TMDs can easily be exfoliated mechanically and their electronic properties can also be tuned by controlling the number of layers. TMDs possess an advantage over graphene by controlling band gap magnitude appropriate for the electronic and optoelectronic applications. Here we show, mechanically exfoliated TMDs such as NbSe2 and MoTe2 exhibit metallic and fluctuating conductance behavior respectively. Metallic conduction in NbSe2 was investigated under atmospheric conditions and compered with vacuum conditions. Furthermore, NbSe2 resistance was measured at low temperature up to 5.6 K. The above electronic investigations clearly demonstrate ohmic and fluctuating conduction in NbSe2 and MoTe2 respectively which could be applicable for electronic and optoelectronic devices.
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- 2016
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11. Investigation of nonlinear optical properties of exfoliated MoS2 using Photoacoustic Zscan
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Nitesh Dhasmana, Jayan Thomas, Anupama B. Kaul, and Dalal Fadil
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Materials science ,Scattering ,business.industry ,Mechanical Engineering ,Saturable absorption ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Fluence ,Wavelength ,Mechanics of Materials ,0103 physical sciences ,Dispersion (optics) ,Optoelectronics ,General Materials Science ,Z-scan technique ,Free carrier absorption ,010306 general physics ,0210 nano-technology ,business ,Absorption (electromagnetic radiation) - Abstract
We studied nonlinear absorption characteristics of exfoliated Molybdenum disulphide (MoS2) dispersion in 1-Methyl-2-pyrrolidinone and demonstrate a dual absorption characteristic at 532nm nanosecond pulsed laser wavelength. A number of recent reports demonstrate a saturable absorption in MoS2 and other 2D materials at low fluences and a deviation from this saturable absorption at higher fluence using open aperture Z scan (OZ scan) technique. It has been suggested that this deviation at higher fluences is due to nonlinear optical scattering. We have recently developed a new technique which combines OZ scan and photoacoustic Z-scan (PAZ-scan). It can measure photoacoustic and optical transmission signals simultaneously. The data obtained from both signals are employed to find nonlinear absorption parameters in non-linear optical materials. Our results reveal that non-linear scattering is not the cause of deviation of 2D materials from saturable absorption at higher fluences. We propose that the optical limiting behavior at higher fluence in these 2D materials is dominated by free carrier absorption.
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- 2016
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12. Graphene for Radio Frequency Electronics
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Wei, Wei, primary, Dalal, Fadil, additional, Fregonese, Sebastien, additional, Strupinski, Wlodek, additional, Pallecchi, Emiliano, additional, and Happy, Henri, additional
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- 2020
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13. Fatigue test on flexible graphene field effect transistors with bottom gate electrode
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S. Bensalk, Dalal Fadil, Wei Wei, S. Mhedhbi, Emiliano Pallecchi, Henri Happy, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), and Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
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Materials science ,02 engineering and technology ,Channel width ,Transistors ,01 natural sciences ,law.invention ,[SPI]Engineering Sciences [physics] ,Robustness (computer science) ,law ,0103 physical sciences ,Radio frequency ,Fatigue ,010302 applied physics ,Substrates ,Graphene ,business.industry ,Logic gates ,021001 nanoscience & nanotechnology ,Graphene field effect transistors ,Bottom gate ,Electrode ,Performance evaluation ,Optoelectronics ,Double gate ,0210 nano-technology ,business - Abstract
International audience; Graphene is a promising candidate as channel material for flexible wearable radio frequency devices. In this work we fabricated double gate flexible graphene field effect transistors and characterized their DC and RF performance. Moreover, we performed a fatigue test consisting on a 1000 times dynamical bending at 1 Hz. The banding radius was 40 mm, which correspond to a strain of 0.16%. The DC and RF characterization shows the device performance variation is around 10%. The finding demonstrates the robustness of our GFETs, further work will be needed to determine the physical mechanism that cause the performance change.
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- 2018
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14. 2D-Graphene Epitaxy on SiC for RF Application: Fabrication, Electrical Characterization and Noise Performance
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Henri Happy, Marina Deng, W. Strupinski, Sebastien Fregonese, Emiliano Pallecchi, Wei Wei, Dalal Fadil, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Laboratoire de l'intégration, du matériau au système (IMS), Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Warsaw University of Technology [Warsaw], Carbon-IEMN (CARBON-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), and Carbon - IEMN (CARBON - IEMN)
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010302 applied physics ,Materials science ,Condensed matter physics ,Silicon ,Graphene ,Transconductance ,chemistry.chemical_element ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Epitaxy ,Noise figure ,7. Clean energy ,01 natural sciences ,law.invention ,symbols.namesake ,chemistry ,law ,0103 physical sciences ,symbols ,Field-effect transistor ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,0210 nano-technology ,Raman spectroscopy ,Microwave ,ComputingMilieux_MISCELLANEOUS - Abstract
Two-dimensional graphene grown by chemical vapor deposition (CVD) without the sublimation of the silicon of SiC substrate was used to fabricate field effect transistors. Atomic force microscopy and Raman spectroscopy measurements show the high quality of the graphene. The study of DC, radio frequency and microwave noise characteristics demonstrate reasonable extrinsic value of transconductance $(g_{m})$ , current gain cut-off frequency $(f_{T})$ and minimum noise figure $(NF_{min})$ related to the transistor dimension. For devices with gate length $\pmb{L_{g}=150}$ nm, the transistors show extrinsic current gain cut-off frequency $\pmb{f_{T_{-}extr}=65\mathrm{GHz}}$ associated to the maximum frequency of oscillation $\pmb{f_{max}=28\mathrm{GHz}}$ . The measurement of noise performance shows $\pmb{NF_{min}=4\mathrm{dB}}$ @ 10 GHz.
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- 2018
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15. Electrical devices from top-down structured platinum diselenide films
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Max C. Lemme, Georg S. Duesberg, Chanyoung Yim, Vikram Passi, Niall McEvoy, Emiliano Pallecchi, Dalal Fadil, Cormac Ó Coileáin, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Carbon-IEMN (CARBON-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), and Carbon - IEMN (CARBON - IEMN)
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Materials science ,02 engineering and technology ,010402 general chemistry ,01 natural sciences ,lcsh:Chemistry ,[SPI]Engineering Sciences [physics] ,Electrical resistivity and conductivity ,lcsh:TA401-492 ,General Materials Science ,Electronics ,Sheet resistance ,business.industry ,Mechanical Engineering ,General Chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Semimetal ,Electrical contacts ,0104 chemical sciences ,Semiconductor ,lcsh:QD1-999 ,Mechanics of Materials ,Optoelectronics ,lcsh:Materials of engineering and construction. Mechanics of materials ,0210 nano-technology ,Contact area ,business ,Electron-beam lithography - Abstract
npj 2D materials and applications 2(1), 5 (2018). doi:10.1038/s41699-018-0051-9, Published by Nature Publishing Group, London
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- 2018
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16. Graphene FETs Based on High Resolution Nanoribbons for HF Low Power Applications
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David Mele, Wei Wei, Emiliano Pallecchi, Henri Happy, Abdelkarim Ouerghi, Dalal Fadil, Sarah Mehdhbi, Sylvie Lepilliet, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Centre de Nanosciences et de Nanotechnologies (C2N), Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS), Carbon-IEMN (CARBON-IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), and Carbon - IEMN (CARBON - IEMN)
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Materials science ,Band gap ,Graphene ,business.industry ,Transistor ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,7. Clean energy ,01 natural sciences ,0104 chemical sciences ,Electronic, Optical and Magnetic Materials ,law.invention ,[SPI]Engineering Sciences [physics] ,law ,Optoelectronics ,Field-effect transistor ,Dry etching ,0210 nano-technology ,business ,Saturation (magnetic) ,Lithography ,Graphene nanoribbons - Abstract
International audience; In this paper we present high frequency field effect transistors based on graphene nanoribbons arrays (GNRFETs). The nanoribbons serve as a channel for the transistors and are fabricated with a process based on e-beam lithography and dry etching of high mobility hydrogen intercalated epitaxial graphene. The widths of the nanoribbons vary from 50 to 20 nm, less than half those measured in previous reports for GNRFETs. Hall measurements reveal that the devices are p-doped, with mobility on the order of 2300 cm(2)/Vs. From DC characteristics, we find that the maximum ratio I-MAX/I-MIN is 5 obtained at 50 nm ribbons width. The IV characteristics of the GNRFETs are slightly non-linear at high bias without a full saturation. Therefore, despite the aggressive scaling of the graphene nanoribbon width, a bandgap is still not observed in our measurements. The high frequency performances of our GNRFETs are already significant at low bias. At 300 mV drain source voltage, the highest intrinsic (extrinsic) cut-off frequency f(t) reaches 82 (18) GHz and the extrinsic maximum oscillation frequency f(max) is 20 GHz, which is promising for low power applications.
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- 2018
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17. High frequency and noise performance of GFETs
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Wei Wei, Emiliano Pallecchi, Sebastien Fregonese, Marina Deng, Gilles Dambrine, Thomas Zimmer, Dalal Fadil, Henri Happy, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Laboratoire de l'intégration, du matériau au système (IMS), Université Sciences et Technologies - Bordeaux 1-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Université Sciences et Technologies - Bordeaux 1 (UB)-Institut Polytechnique de Bordeaux-Centre National de la Recherche Scientifique (CNRS), Advanced NanOmeter DEvices - IEMN (ANODE - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Circuits Systèmes Applications des Micro-ondes - IEMN (CSAM - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Institut TELECOM/TELECOM Lille1, Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT), Carbon-IEMN (CARBON-IEMN), Renatech Network, European Project: 785219,H2020,GrapheneCore2(2018), and Carbon - IEMN (CARBON - IEMN)
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010302 applied physics ,Materials science ,business.industry ,Terahertz radiation ,Graphene ,Amplifier ,Contact resistance ,Electrical engineering ,Linearity ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Graphene field effect transistors ,01 natural sciences ,Noise (electronics) ,Low noise ,law.invention ,law ,0103 physical sciences ,Hardware_INTEGRATEDCIRCUITS ,Optoelectronics ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,0210 nano-technology ,business ,ComputingMilieux_MISCELLANEOUS - Abstract
Graphene material exhibits a number of outstanding electronic and mechanical properties that make it very attractive for micro and nanoelectronic applications. Considering graphene field effect transistors (GFETs), considerable efforts were made during the recent years, and the devices at state of the art show impressive high frequency cut-off frequencies. The interest of GFET is particularly strong for some high frequency (HF) applications such as high linearity mixer in W-band, THz detection, …. In this paper we will give an overview on the GFETs and will present the devices developed in our Lab. Based on high frequency measurements of noise characteristics of our GFETs, we will point out the impact of technological aspects (such as contact resistance, device structure) on the HF noise performances. The implications of our findings for the development of graphene-based circuit such as low noise amplifiers will be also discussed.
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- 2017
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18. Analysis of multilayer black phosphorus for photodetector applications
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Gustavo A. Saenz, Anupama B. Kaul, and Dalal Fadil
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Photocurrent ,Electron mobility ,Materials science ,Semiconductor ,business.industry ,Band gap ,Electric field ,Monolayer ,Optoelectronics ,Photodetector ,Photodetection ,business - Abstract
Two-dimensional black phosphorous (BP) is a novel material with great potential for implementation in a new generation of flexible and optoelectronics devices. 2D BP, an intrinsically p-type semiconductor with high hole mobility, has a hexagonal honeycomb structure with strong anisotropic properties, including mechanical, thermal, electrical, and optical properties, along the zigzag against the armchair direction. In contrast with other semiconductor layered materials, such as Transition Metal Dichalcogenides (TMDs), the band gap in black phosphorous remains direct both in bulk as in monolayer. Also, as the number of layers is reduced the band gap is open up from ~ 0.3 eV in bulk to ~ 2 eV or more in monolayer, opposite effect in TMDs. BP exhibits a fast photoresponse, it can be operated in near infrared spectrum, and the photodetection can be tunable with an external electric field. In this work, we have mechanically exfoliated multilayer black phosphorus. We have conducted a stability and degradation study of the exfoliated membranes when exposed they are exposed to air and high temperatures up to 400 °C. In addition, a two-terminal broadband photodetector has been designed and fabricated based on multilayer black phosphorus. The optoelectrical measurements exhibit relatively high electrical transport levels (~ 100 uA at 1 V) compared to previous reports. The photoresponse of our device is analyzed here where the photocurrent was measured as a function of the source-drain bias voltages.
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- 2017
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- View/download PDF
19. 2D material characterization for printed electronics applications
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Esteban Escaraga, Lara, E Gustavo, Anupama B. Kaul, Monica Michel, Dalal Fadil, and Alberto Delgado
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ComputingMethodologies_PATTERNRECOGNITION ,Materials science ,Semiconductor ,business.industry ,Printed electronics ,ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION ,Nanotechnology ,Thin film ,business ,Inkjet printing ,Characterization (materials science) - Abstract
Thin film production with solution-based materials can complement or replace semiconductors in high performance and low cost thin film devices. The possibility of inkjet printing to eventually create devices, is explored in this work.
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- 2015
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20. Properties of 2D layered crystals: MoS2, NbSe2 and black phosphorus
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Gustavo E Lara, Dalal Fadil, Alberto Delgado, Christopher Gaytan, Monica Michel, and Anupama B. Kaul
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Materials science ,Nanoelectronics ,business.industry ,Nanotechnology ,Photonics ,business ,Deposition (chemistry) ,Black phosphorus ,Characterization (materials science) - Abstract
The two dimensional layered crystals represent promising candidate materials for enabling novel photonics and nanoelectronics devices. In this paper, we present our early work on deposition and characterization of functional 2D materials.
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- 2015
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21. Correction: On the chemically-assisted excitonic enhancement in environmentally-friendly solution dispersions of two-dimensional MoS2 and WS2
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Dalal Fadil, Ridwan F. Hossain, Gustavo A. Saenz, and Anupama B. Kaul
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Materials Chemistry ,General Chemistry - Abstract
Correction for ‘On the chemically-assisted excitonic enhancement in environmentally-friendly solution dispersions of two-dimensional MoS2 and WS2’ by Dalal Fadil et al., J. Mater. Chem. C, 2017, DOI: 10.1039/c7tc01001j.
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- 2017
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22. Direct observation of magnetization reversal and low field magnetoresistance of epitaxial La 0.7Sr 0.3MnO 3/SrTiO 3 (001) thin films at room temperature
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Sheng Wu, Stéphane Flament, Paolo Perna, J. Gasnier, M. Saïb, B. Guillet, S Lebargy, Jean-Marc Routoure, B. Renault, Dalal Fadil, Laurence Méchin, Equipe Electronique - Laboratoire GREYC - UMR6072, Groupe de Recherche en Informatique, Image et Instrumentation de Caen (GREYC), Centre National de la Recherche Scientifique (CNRS)-École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), Normandie Université (NU)-Normandie Université (NU)-Université de Caen Normandie (UNICAEN), Normandie Université (NU)-Centre National de la Recherche Scientifique (CNRS)-École Nationale Supérieure d'Ingénieurs de Caen (ENSICAEN), and Normandie Université (NU)
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Materials science ,Colossal magnetoresistance ,Magnetic domain ,Condensed matter physics ,Nucleation ,General Physics and Astronomy ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Magnetic hysteresis ,01 natural sciences ,Magnetic field ,Magnetization ,Magnetic anisotropy ,[SPI]Engineering Sciences [physics] ,0103 physical sciences ,Single domain ,[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics ,010306 general physics ,0210 nano-technology - Abstract
International audience; We have observed the in-plane magnetic domain arrangement during magnetization reversal in a 40 nm thick La0.7Sr0.3MnO3/SrTiO3 (001) thin film patterned into 500 lm long microbridges of width 50 or 100 lm. Magneto-optical Kerr effect microscopy was used at room temperature and magnetic hysteresis loops were deduced from local averaging of intensity over the microbridge areas. Magnetization reversal proceeds by nucleation and propagation of 180 domain walls. When the magnetic field was applied parallel to the bridge, we observed the nucleation of only one or two domain walls and the reversal occurred by the propagation of them. When the magnetic field was applied perpendicular to the bridge, the reversal occurred mostly by the nucleation of several domain walls. The low field magnetoresistance (MR) and the low frequency noise at zero magnetic field were measured at room temperature. In addition to the linear and reversible colossal MR effect, hysteretic MR versus magnetic field curves could be observed, showing two maxima (minima) when the magnetic field is parallel (perpendicular) to the bridge length. The observed hysteretic MR behaviour is attributed to anisotropic MR inside the 180 Ne'el domain walls.
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- 2012
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23. A low-noise high output impedance DC current source
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Laurence Méchin, Dalal Fadil, Stéphane Flament, and Jean-Marc Routoure
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Physics ,Noise temperature ,High impedance ,business.industry ,Electrical engineering ,Buffer amplifier ,Impedance bridging ,Effective input noise temperature ,Output impedance ,Voltage source ,Current source ,business - Abstract
The paper proposes a structure of a new low noise high output impedance DC current source which acts as a quasi‐ideal source for frequencies lower than 10 kHz. It uses a feed‐back structure with low noise operational amplifiers. The DC current, the small signal output impedance and the noise level are controlled by the value of one single resistance. The performances of our structure are compared with the ones of the simple current source that consists in a voltage source and a resistance in series. It is shown that our structure exhibits the same noise level whereas the output impedance can be one thousand time higher.
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- 2007
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24. Low frequency noise in La0.7Sr0.3MnO3 thin films : effects of substrate materials and contact resistance
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Paolo Perna, Dalal Fadil, Jean-Marc Routoure, Carlo Barone, Laurence Méchin, Stéphane Flament, and S. Mercone
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Materials science ,Silicon ,business.industry ,Orders of magnitude (temperature) ,Infrasound ,Contact resistance ,chemistry.chemical_element ,Substrate (electronics) ,Low-frequency noise ,chemistry ,Manganites ,Optoelectronics ,Thin film ,Noise level ,business ,Noise (radio) - Abstract
We report low frequency noise measurements performed in patterned La0.7Sr0.3MnO3 (LSMO) thin films of various thicknesses (20 nm up to 200 nm) deposited onto SrTiO3(STO) or buffered Silicon substrates. From an application point of view, the latter is very important because it demonstrates the possibility to integrate LSMO sensors or devices with standard industrial microelectronic circuits. The noise level in LSMO on buffered Si substrate is about 2 orders of magnitude higher than on STO substrates. Contact noise is also given.
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- 2007
- Full Text
- View/download PDF
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