1. Characterization of SnTe-doped InP grown by solid-source atomic layer molecular beam epitaxy
- Author
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Pablo Aitor Postigo, María Luisa Dotor, Fernando García, Fernando Briones, and D. Golmayo
- Subjects
Free electron model ,Diffraction ,Electron density ,Photoluminescence ,Vacuum deposition ,Chemistry ,Hall effect ,Doping ,Analytical chemistry ,General Physics and Astronomy ,Molecular beam epitaxy - Abstract
5 pages, 7 figures., SnTe-doped InP layers were grown at low temperature by solid-source atomic layer molecular beam epitaxy. The samples were characterized by Hall measurements versus temperature, low temperature photoluminescence, x-ray diffraction, and secondary ion mass spectroscopy. The temperature of the SnTe effusion cell was varied from 320 to 440 °C, and the free electron concentration measured at room temperature ranged between 2.0×1016 cm−3 and 5.6×1018 cm−3 with the corresponding Hall mobility varying from 2320 to 1042 cm2/V s., The authors would like to thank Dr. A. J. Springthorpe, from Nortel Networks, for SIMS measurements, and the Spanish CICYT for financially supporting this research under Contract No. TIC-99-0645-C05-05.
- Published
- 2001
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