1. TCAD analysis of conditions for DIBL parameter misestimation in cryogenic MOSFETs.
- Author
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Kobayashi, Yuika, Asai, Hidehiro, Iizuka, Shota, Hattori, Junichi, Ikegami, Tsutomu, Fukuda, Koichi, Nikuni, Tetsuro, and Mori, Takahiro
- Abstract
The study aimed to theoretically investigate the transfer characteristics of MOSFETs at cryogenic temperatures to elucidate the experimental conditions affecting the accurate estimation of the drain-induced barrier lowering (DIBL) parameter. Our Technology Computer Aided Design (TCAD) simulation revealed that MOSFETs featuring an underlap between the gate and source/drain edges experience a significant shift in threshold voltage (V
t ) in the low drain voltage (Vd ) region, which causes the misestimation of the DIBL parameter. This Vt change is due to a notable increase in carrier concentration within the underlap region. To mitigate misestimation in such underlap devices, confirming the dependence of the DIBL parameter on the linear region of Vd serves as an effective method to ensure accurate estimation. [ABSTRACT FROM AUTHOR]- Published
- 2024
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