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Polysilicon buffered LOCOS (PBL) has been widely utilized for advanced isolation applications as moderately low lateral oxide encroachment may be achieved without defect formation. Unfortunately, PBL does not exhibit sufficient field oxide recess to support aggressive device scaling without introduction of processes which are difficult to control. Recently, polysilicon encapsulated local oxidation (PELOX) has been proposed as an easily scaled isolation technique that exhibits LOCOS equivalent recess. The integration of PELOX into an existing PBL 1 Mb DRAM baseline process is described. PELOX integrated PBL (PIPBL) is demonstrated to enhance final field oxide recess without increasing encroachment. The improved final field oxide recess is shown to provide increased process margin as evidenced by superior probe yield.

In experiments, body size and prior residency at nests are shown to be factors that influence the outcome of male-male aggressive interactions of Marpissa marina, a New Zealand jumping spider. Away from nests, larger males tend to win, but at nests the occupant tends to win. Possible reasons for M. marina male-male conflict being settled by these rules are discussed. The larger question of why salticid males are aggressive is also discussed. [ABSTRACT FROM PUBLISHER]