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1. Ablation of Organic Molecular Solids by Focused Soft X-Ray Free-Electron Laser Radiation

Author

Chalupský, J., Juha, L., Kuba, J., Cihelka, J., Hájková, V., Bergh, M., Bionta, R. M., Caleman, C., Chapman, H., Hajdu, J., Hau-Riege, S., Jurek, M., Koptyaev, S., Krása, J., Krenz-Tronnier, A., Krzywinski, J., London, R., Meyer-ter-Vehn, J., Nietubyc, R., Pelka, J. B., Sobierajski, R., Sokolowski-Tinten, K., Stojanovic, N., Tiedtke, K., Toleikis, S., Tschentscher, T., Velyhan, A., Wabnitz, H., Zastrau, U., Nickles, P.V., editor, and Janulewicz, K.A., editor

Published
2007
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2. High intensity XUV-FEL interaction with solids: first experimental results

Author

Sokolowski-Tinten, K., Stojanovic, N., von der Linde, D., Zastrau, U., Perner, F., Förster, E., Sobierajski, R., Nietubyc, R., Jurek, M., Krzywinski, J., Pelka, J. B., Juha, L., Hajkova, V., Cihelka, J., Velyhan, A., Kuba, J., Chalupský, J., Tschentscher, Th., Toleikis, S., Düsterer, S., Redlin, H., Hau-Riege, S. P., London, R. A., Bionta, R. M., Chapman, H., Lee, R. W., Bergh, M., Caleman, K., Hajdu, J., Castleman, A. W., Jr., editor, Toennies, J. P., editor, Zinth, W., editor, Yamanouchi, K., editor, Corkum, Paul, editor, Jonas, David M., editor, Miller, R. J. Dwayne., editor, and Weiner, Andrew M., editor

Published
2007
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3. Damage in solids irradiated by a single shot of XUV free-electron laser: Irreversible changes investigated using X-ray microdiffraction, atomic force microscopy and Nomarski optical microscopy

Author

Pelka, J.B., Sobierajski, R., Klinger, D., Paszkowicz, W., Krzywinski, J., Jurek, M., Zymierska, D., Wawro, A., Petroutchik, A., Juha, L., Hajkova, V., Cihelka, J., Chalupsky, J., Burian, T., Vysin, L., Toleikis, S., Sokolowski-Tinten, K., Stojanovic, N., Zastrau, U., London, R., Hau-Riege, S., Riekel, C., Davies, R., Burghammer, M., Dynowska, E., Szuszkiewicz, W., Caliebe, W., and Nietubyc, R.

Published
2009
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7. High intensity XUV-FEL interaction with solids: first experimental results

Author

Sokolowski-Tinten, K., primary, Stojanovic, N., additional, von der Linde, D., additional, Zastrau, U., additional, Perner, F., additional, Förster, E., additional, Sobierajski, R., additional, Nietubyc, R., additional, Jurek, M., additional, Krzywinski, J., additional, Pelka, J. B., additional, Juha, L., additional, Hajkova, V., additional, Cihelka, J., additional, Velyhan, A., additional, Kuba, J., additional, Chalupský, J., additional, Tschentscher, Th., additional, Toleikis, S., additional, Düsterer, S., additional, Redlin, H., additional, Hau-Riege, S. P., additional, London, R. A., additional, Bionta, R. M., additional, Chapman, H., additional, Lee, R. W., additional, Bergh, M., additional, Caleman, K., additional, and Hajdu, J., additional

Published
2007
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9. Damage threshold of inorganic solids under free-electron-laser irradiation at 32.5 nm wavelength

Author

Hau-Riege, S, primary, London, R, additional, Bionta, R, additional, McKernan, M, additional, Baker, S, additional, Krzywinski, J, additional, Sobierajski, R, additional, Nietubyc, R, additional, Pelka, J, additional, Jurek, M, additional, Klinger, D, additional, Juha, L, additional, Chalupsky, J, additional, Cihelka, J, additional, Hajkova, V, additional, Koptyaev, S, additional, Velyhan, A, additional, Krasa, J, additional, Kuba, J, additional, Tiedtke, K, additional, Toleikis, S, additional, Tschentscher, T, additional, Wabnitz, H, additional, Bergh, M, additional, Caleman, C, additional, Sokolowski-Tinten, K, additional, Stojanovic, N, additional, Zastrau, U, additional, Tronnier, A, additional, and Meyer-ter-Vehn, J, additional

Published
2007
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10. Damage studies of multilayer optics for XUV FELs

Author

Louis, Eric, Khorsand, A.R., Sobierajski, R., van Hattum, E.D., Tsarfati, T., Jurek, M., Klinger, D., Pelka, J.B., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Jastrow, U., Toleikis, S., Wabnitz, H., Tiedtke, K., Gaudin, J., Bijkerk, Frederik, and Laser Physics & Nonlinear Optics

Subjects
METIS-270315
Published
2010

11. Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Author

Khorsand, A.R., Sobierajski, R., Louis, E., Bruijn, S., Van Hattum, E.D., Vande Kruijs, R.W.E., Jurek, M., Klinger, D., Pelka, J.B., Juha, L., Burian, T., Chalupsky, J., Cihelka, J., Hajkova, V., Vysin, L., Jastrow, U., Stojanovic, Nenad, Toleikis, S., Wabnitz, H., Tiedtke, K., Sokolowski-Tinten, Klaus, Shymanovich, Uladzimir, Krzywinski, J., Riege Hau, S., London, R., Gleeson, A., Gullikson, E.M., Bijkerk, F., van de Kruijs, R. W. E., Hau-Riege, S., Faculty of Science and Technology, XUV Optics, and Laser Physics & Nonlinear Optics

Subjects
Silicon, Materials science, Ultraviolet Rays, chemistry.chemical_element, law.invention, Optics, Optical microscope, law, Materials Testing, Thin film, Reflectometry, Molybdenum, business.industry, Optical Devices, Membranes, Artificial, Equipment Design, Nanosecond, Physik (inkl. Astronomie), Laser, Atomic and Molecular Physics, and Optics, Equipment Failure Analysis, chemistry, Extreme ultraviolet, business, Ultrashort pulse
Abstract

We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and "post-mortem" by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources. (C)2010 Optical Society of America

Published
2010

12. Spot size characterization of focused non-Gaussian beams

Author

Chalupský, J., Krzywinski, J., Juha, L., Hájková, V., Cihelka, J., Burian, T., Vyšín, L., Gaudin, J., Gleeson, A.J., Jurek, M., Khorsand, A.R., Klinger, D., Wabnitz, H., Sobierajski, R., Störmer, M., Tiedtke, K., Toleikis, S., and XUV Optics

Abstract

We present a new technique for the analysis of non-Gaussian laser beams which can not be described by an analytical formula. As a generalization of the beam spot area we apply and extend the definition of so called effective area (Aeff) [1] in order to avoid using the full-width at half maximum (FWHM) parameter which might be misleading for non-Gaussian beams. Furthermore, we demonstrate a practical utilization of our technique for a femtosecond soft x-ray free electron laser. The ablative imprints in poly(methyl methacrylate) - PMMA and amorphous carbon (a-C) are used to characterize the spatial beam profile and to determine the effective area. Two procedures of the effective area determination and their further utilization are presented in this paper

Published
2010

13. Damage studies of multilayer optics for XUV free electron lasers

Author

Louis, Eric, Khorsand, A.R., Sobierajski, R., van Hattum, E.D., Jurek, M., Klinger, D., Pelka, J.B., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Jastrow, U., Toleikis, S., Wabnitz, H., Tiedtke, K., Gaudin, J., Gullikson, E.M., Bijkerk, Frederik, Juha, Libor, Bajt, Saša, Sobierajski, Ryszard, and Laser Physics & Nonlinear Optics

Subjects
Free electron model, business.industry, Chemistry, Free-electron laser, Laser, law.invention, Optics, Optical microscope, law, METIS-266557, Extreme ultraviolet, Femtosecond, Radiation damage, High-resolution transmission electron microscopy, business
Abstract

We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given.

Published
2009

14. Optical emission spectroscopy of various materials irradiated by soft x-ray free-electron laser

Author

Cihelka, J, Juha, L, Chalupský, J, Rosmej, FB, Renner, O, Saksl, K, Hájková, V, Vyšín, L, Galtier, E, Schott, R, Khorsand, AR, Riley, D, Dzelzainis, T, Nelson, AJ, Lee, RW, Heimann, PA, Nagler, B, Vinko, S, Wark, J, Whitcher, T, Toleikis, S, Tschentscher, T, Fäustlin, R, Wabnitz, H, Bajt, S, Chapman, H, Krzywinski, J, Sobierajski, R, Klinger, D, Jurek, M, Pelka, J, Hau-Riege, S, London, RA, Kuba, J, Stojanovic, N, Sokolowski-Tinten, K, Gleeson, AJ, Störmer, M, Andreasson, J, Hajdu, J, Iwan, B, and Timneanu, N

Subjects
Materials science, Spectrometer, law, Analytical chemistry, Irradiation, Excitation temperature, Emission spectrum, Laser, Luminescence, Spectral line, Ion, law.invention
Abstract

The beam of the Free-Electron Laser in Hamburg (FLASH) was focused by a grazing incidence elliptical mirror (32.5 nm and 13.5 nm) and an off-axis parabolic mirror coated with a Si/Mo multilayer (13.5 nm) to 20-micron and 1-micron spot, respectively. The grazing incidence and normal incidence focusing of ∼25-fs pulses with an energy of 10 μJ resulted in an irradiance of 10 13 W/cm 2 and 10 16 W/cm 2 , respectively, at the surface of various solids (Si, Al, Ti, Ta, Si 3 N 4 , BN, a-C/Si, Ni/Si, Cr/Si, Rh/Si, Ce:YAC, poly(methyl methacrylate) ― PMMA, stainless steel, etc.). The optical emission of the plasmas produced under these conditions was registered by a grating (1200 lines/mm and/or 150 lines/mm) spectrometer MS257 (Oriel) equipped with iCCD head (iStar 720, Andor). Surprisingly, only lines belonging to the neutral atoms were observed at intensities around 10 13 W/cm 2 . No spectral lines of ions have been identified in UV-vis spectra emitted from the plasmas formed by the FLASH beam focused in a 20-micron spot. At intensities around 10 16 W/cm 2 , the OE spectra are again dominated by the atomic lines. However, a weak emission of Al + and Al 2+ was registered as well. The abundance ratio of Al/Al + should be at least 100. The plasma has an excitation temperature equivalent to 0.8 eV found by a computer simulation of the aluminum plasma OE spectrum. A broadband emission was also registered, both from the single-element plasmas (typical is for carbon; there were no spectral lines) and the scintillating slabs (on Ce:YAG crystal, both the luminescence bands and the line plasma emission were recorded by the spectrometer).

Published
2009

15. High intensity VUV-FEL interaction with solids: first experimental results

Author

Sokolowski-Tinten, K., Stojanovic, N., Linde, D., Zastrau, U., Perner, F., Förster, E., Sobierajski, R., Robert Nietubyć, Jurek, M., Krzywinski, J., Juha, L., Cihelka, J., Velyhan, A., Kuba, J., Chalupský, J., Tschentscher, T., Toleikis, S., Düster, S., and Redlin, H.

Subjects
Physik (inkl. Astronomie)
Published
2006

16. Laser diode photoacoustic spectroscopy near 2.3 µm

Author

Cihelka, J., Horka, V., Civis, S., Simecek, T., Hulicius, E., Oswald, J., Pangrac, J., Vicet, A., Rouillard, Y., Salhi, A., Alibert, C., Werner, R., Koeth, J., J. Heyrovský Institute of Physical Chemistry of the ASCR, Czech Academy of Sciences [Prague] (CAS), Institute of Physics [Prague], Université d'Évry-Val-d'Essonne (UEVE), Centre d'Electronique et de Micro-optoélectronique de Montpellier (CEM2), Université Montpellier 2 - Sciences et Techniques (UM2)-Centre National de la Recherche Scientifique (CNRS), Nanoplus Nanosystems and Technologies GmbH, and Nanoplus

Subjects
ComputingMilieux_MISCELLANEOUS, [SPI.TRON]Engineering Sciences [physics]/Electronics
Abstract

International audience

Published
2005

18. Electronic Structure of an XUV Photogenerated Solid-Density Aluminum Plasma

Author

Vinko, S. M., Zastrau, U., Mazevet, S., Andreasson, Jakob, Bajt, S., Burian, T., Chalupsky, J., Chapman, H. N., Cihelka, J., Doria, D., Doeppner, T., Duesterer, S., Dzelzainis, T., Faeustlin, R. R., Fortmann, C., Foerster, E., Galtier, E., Glenzer, S. H., Goede, S., Gregori, G., Hajdu, Janos, Hajkova, V., Heimann, P. A., Irsig, R., Juha, L., Jurek, M., Krzywinski, J., Laarmann, T., Lee, H. J., Lee, R. W., Li, B., Meiwes-Broer, K. -H, Mithen, J. P., Nagler, B., Nelson, A. J., Przystawik, A., Redmer, R., Riley, D., Rosmej, F., Sobierajski, R., Tavella, F., Thiele, R., Tiggesbaeumker, J., Toleikis, S., Tschentscher, T., Vysin, L., Whitcher, T. J., White, S., Wark, J. S., Vinko, S. M., Zastrau, U., Mazevet, S., Andreasson, Jakob, Bajt, S., Burian, T., Chalupsky, J., Chapman, H. N., Cihelka, J., Doria, D., Doeppner, T., Duesterer, S., Dzelzainis, T., Faeustlin, R. R., Fortmann, C., Foerster, E., Galtier, E., Glenzer, S. H., Goede, S., Gregori, G., Hajdu, Janos, Hajkova, V., Heimann, P. A., Irsig, R., Juha, L., Jurek, M., Krzywinski, J., Laarmann, T., Lee, H. J., Lee, R. W., Li, B., Meiwes-Broer, K. -H, Mithen, J. P., Nagler, B., Nelson, A. J., Przystawik, A., Redmer, R., Riley, D., Rosmej, F., Sobierajski, R., Tavella, F., Thiele, R., Tiggesbaeumker, J., Toleikis, S., Tschentscher, T., Vysin, L., Whitcher, T. J., White, S., and Wark, J. S.

Abstract

By use of high intensity XUV radiation from the FLASH free-electron laser at DESY, we have created highly excited exotic states of matter in solid-density aluminum samples. The XUV intensity is sufficiently high to excite an inner-shell electron from a large fraction of the atoms in the focal region. We show that soft-x-ray emission spectroscopy measurements reveal the electronic temperature and density of this highly excited system immediately after the excitation pulse, with detailed calculations of the electronic structure, based on finite-temperature density functional theory, in good agreement with the experimental results.

Published
2010
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19. Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses

Author

Chalupsky, J, Juha, L, Hajkova, V, Cihelka, J, Vysin, L, Gautier, J, Hajdu, J, Hau-Riege, P, Jurek, M, Krzywinski, J, London, A, Papalazarou, E, Pelka, B, Rey, G, Sebban, S, Sobierajski, R, Stojanovic, N, Tiedtke, K, Toleikis, S, Tschentscher, T, Valentin, C, Wabnitz, H, Zeitoun, P, Chalupsky, J, Juha, L, Hajkova, V, Cihelka, J, Vysin, L, Gautier, J, Hajdu, J, Hau-Riege, P, Jurek, M, Krzywinski, J, London, A, Papalazarou, E, Pelka, B, Rey, G, Sebban, S, Sobierajski, R, Stojanovic, N, Tiedtke, K, Toleikis, S, Tschentscher, T, Valentin, C, Wabnitz, H, and Zeitoun, P

Abstract

We report the first observation of single-shot soft x-ray laser induced desorption occurring below the ablation threshold in a thin layer of poly ( methyl methacrylate) - PMMA. Irradiated by the focused beam from the Free-electron LASer in Hamburg ( FLASH) at 21.7nm, the samples have been investigated by atomic-force microscope (AFM) enabling the visualization of mild surface modifications caused by the desorption. A model describing non-thermal desorption and ablation has been developed and used to analyze single-shot imprints in PMMA. An intermediate regime of materials removal has been found, confirming model predictions. We also report below-threshold multiple-shot desorption of PMMA induced by high-order harmonics (HOH) at 32nm. Short-time exposure imprints provide sufficient information about transverse beam profile in HOH's tight focus whereas long-time exposed PMMA exhibits radiation-initiated surface hardening making the beam profile measurement infeasible. (C) 2008 Optical Society of America

Published
2009

20. Soft x-ray free electron laser microfocus for exploring matter under extreme conditions

Author

Nelson, A. J., Toleikis, S., Chapman, H., Bajt, S., Krzywinski, J., Chalupsky, J., Juha, L., Cihelka, J., Hajkova, V., Vysin, L., Burian, T., Kozlova, M., Fäustlin, R. R., Nagler, B., Vinko, S. M., Whitcher, T., Dzelzainis, T., Renner, O., Saksl, K., Khorsand, A. R., Heimann, P. A., Sobierajski, R., Klinger, D., Jurek, M., Pelka, J., Iwan, Bianca, Andreasson, Jakob, Timneanu, Nicusor, Fajardo, M., Wark, J. S., Riley, D., Tschentscher, T., Hajdu, Janos, Lee, R. W., Nelson, A. J., Toleikis, S., Chapman, H., Bajt, S., Krzywinski, J., Chalupsky, J., Juha, L., Cihelka, J., Hajkova, V., Vysin, L., Burian, T., Kozlova, M., Fäustlin, R. R., Nagler, B., Vinko, S. M., Whitcher, T., Dzelzainis, T., Renner, O., Saksl, K., Khorsand, A. R., Heimann, P. A., Sobierajski, R., Klinger, D., Jurek, M., Pelka, J., Iwan, Bianca, Andreasson, Jakob, Timneanu, Nicusor, Fajardo, M., Wark, J. S., Riley, D., Tschentscher, T., Hajdu, Janos, and Lee, R. W.

Abstract

We have focused a beam (BL3) of FLASH (Free-electron LASer in Hamburg: lambda = 13.5 nm, pulse length 15 fs, pulse energy 10-40 mu J, 5Hz) using a fine polished off-axis parabola having a focal length of 270 mm and coated with a Mo/Si multilayer with an initial reflectivity of 67% at 13.5 nm. The OAP was mounted and aligned with a picomotor controlled six-axis gimbal. Beam imprints on poly(methyl methacrylate) -PMMA were used to measure focus and the focused beam was used to create isochoric heating of various slab targets. Results show the focal spot has a diameter of <= 1 mu m. Observations were correlated with simulations of best focus to provide further relevant information.

Published
2009
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21. Wavelength dependence of the damage threshold of inorganic materials under extreme-ultraviolet free-electron-laser irradiation

Author

Hau-Riege, S. P., London, R. A., Bionta, R. M., Ryutov, D., Soufli, R., Bajt, S., McKernan, M. A., Baker, S. L., Krzywinski, J., Sobierajski, R., Nietubyc, R., Klinger, D., Pelka, J. B., Jurek, M., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Velyhan, A., Krasa, J., Tiedtke, K., Toleikis, S., Wabnitz, H., Bergh, M., Caleman, C., Timneanu, N., Hau-Riege, S. P., London, R. A., Bionta, R. M., Ryutov, D., Soufli, R., Bajt, S., McKernan, M. A., Baker, S. L., Krzywinski, J., Sobierajski, R., Nietubyc, R., Klinger, D., Pelka, J. B., Jurek, M., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Velyhan, A., Krasa, J., Tiedtke, K., Toleikis, S., Wabnitz, H., Bergh, M., Caleman, C., and Timneanu, N.

Abstract

We exposed bulk SiC and films of SiC and B4C to single 25 fs long free-electron-laser pulses with wavelengths between 13.5 and 32 nm. The materials are candidates for x-ray free-electron laser optics. We found that the threshold for surface-damage of the bulk SiC samples exceeds the fluence required for thermal melting at all wavelengths. The damage threshold of the film sample shows a strong wavelength dependence. For wavelengths of 13.5 and 21.7 nm, the damage threshold is equal to or exceeds the melting threshold, whereas at 32 nm the damage threshold falls below the melting threshold.

Published
2009
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22. Damage threshold of inorganic solids under free-electron-laser irradiation at 32.5 nm wavelength

Author

Hau-Riege, S. P., London, R. A., Bionta, R. M., McKernan, M. A., Baker, S. L., Krzywinski, J., Sobierajski, R., Nietubyc, R., Pelka, J. B., Jurek, M., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Velyhan, A., Krasa, J., Kuba, J., Tiedtke, K., Toleikis, S., Tschentscher, Th., Wabnitz, H., Bergh, Magnus, Caleman, Carl, Sokolowski-Tinten, K., Stojanovic, N., Zastrau, U., Hau-Riege, S. P., London, R. A., Bionta, R. M., McKernan, M. A., Baker, S. L., Krzywinski, J., Sobierajski, R., Nietubyc, R., Pelka, J. B., Jurek, M., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Velyhan, A., Krasa, J., Kuba, J., Tiedtke, K., Toleikis, S., Tschentscher, Th., Wabnitz, H., Bergh, Magnus, Caleman, Carl, Sokolowski-Tinten, K., Stojanovic, N., and Zastrau, U.

Abstract

Samples of B4C, amorphous C, chemical-vapor-deposition-diamond C, Si, and SiC were exposed to single 25 fs long pulses of 32.5 nm free-electron-laser radiation at fluences of up to 2.2 J/cm(2). The samples were chosen as candidate materials for x-ray free-electron-laser optics. It was found that the threshold for surface damage is on the order of the fluence required for thermal melting. For larger fluences, the crater depths correspond to temperatures on the order of the critical temperature, suggesting that the craters are formed by two-phase vaporization.

Published
2007
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23. Characteristics of focused soft X-ray free-electron laser beam determined by ablation of organic molecular solids

Author

Chalupsky, J., Juha, L., Kuba, J., Cihelka, J., Hajkova, V., Koptyaev, S., Krasa, J., Velyhan, A., Bergh, Magnus, Caleman, Carl, Hajdu, Janos, Bionta, R. M., Chapman, H., Hau-Riege, S. P., London, R. A., Jurek, M., Krzywinski, J., Nietubyc, R., Pelka, J. B., Sobierajski, R., Meyer-ter-Vehn, J., Tronnier, A., Sokolowski-Tinten, K., Stojanovic, N., Tiedtke, K., Toleikis, S., Tschentscher, T., Wabnitz, H., Zastrau, U., Chalupsky, J., Juha, L., Kuba, J., Cihelka, J., Hajkova, V., Koptyaev, S., Krasa, J., Velyhan, A., Bergh, Magnus, Caleman, Carl, Hajdu, Janos, Bionta, R. M., Chapman, H., Hau-Riege, S. P., London, R. A., Jurek, M., Krzywinski, J., Nietubyc, R., Pelka, J. B., Sobierajski, R., Meyer-ter-Vehn, J., Tronnier, A., Sokolowski-Tinten, K., Stojanovic, N., Tiedtke, K., Toleikis, S., Tschentscher, T., Wabnitz, H., and Zastrau, U.

Abstract

A linear accelerator based source of coherent radiation, FLASH (Free-electron LASer in Hamburg) provides ultra-intense femtosecond radiation pulses at wavelengths from the extreme ultraviolet (XUV; lambda< 100nm) to the soft X-ray (SXR; lambda<30nm) spectral regions. 25-fs pulses of 32-nm FLASH radiation were used to determine the ablation parameters of PMMA - poly ( methyl methacrylate). Under these irradiation conditions the attenuation length and ablation threshold were found to be (56.9 +/- 7.5) nm and similar to 2 mJ center dot cm(-2), respectively. For a second wavelength of 21.7 nm, the PMMA ablation was utilized to image the transverse intensity distribution within the focused beam at mu m resolution by a method developed here.

Published
2007
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24. Desorption mechanisms in PMMA irradiated by high order harmonics

Author

De Grazia, M., primary, Merdji, H., additional, Auguste, T., additional, Carré, B., additional, Gaudin, J., additional, Geoffroy, G., additional, Guizard, S., additional, Krejci, F., additional, Kuba, J., additional, Chalupsky, J., additional, Cihelka, J., additional, Hajkova, V., additional, Ledinský, M., additional, and Juha, L., additional

Published
2011
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27. Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

Author

Sobierajski, R., primary, Bruijn, S., additional, Khorsand, A.R., additional, Louis, E., additional, van de Kruijs, R.W. E., additional, Burian, T., additional, Chalupsky, J., additional, Cihelka, J., additional, Gleeson, A., additional, Grzonka, J., additional, Gullikson, E.M., additional, Hajkova, V., additional, Hau-Riege, S., additional, Juha, L., additional, Jurek, M., additional, Klinger, D., additional, Krzywinski, J., additional, London, R., additional, Pelka, J. B., additional, Płociński, T., additional, Rasiński, M., additional, Tiedtke, K., additional, Toleikis, S., additional, Vysin, L., additional, Wabnitz, H., additional, and Bijkerk, F., additional

Published
2010
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28. Spot size characterization of focused non-Gaussian X-ray laser beams

Author

Chalupský, J., primary, Krzywinski, J., additional, Juha, L., additional, Hájková, V., additional, Cihelka, J., additional, Burian, T., additional, Vyšín, L., additional, Gaudin, J., additional, Gleeson, A., additional, Jurek, M., additional, Khorsand, A. R., additional, Klinger, D., additional, Wabnitz, H., additional, Sobierajski, R., additional, Störmer, M., additional, Tiedtke, K., additional, and Toleikis, S., additional

Published
2010
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30. Electronic Structure of an XUV Photogenerated Solid-Density Aluminum Plasma

Author

Vinko, S. M., primary, Zastrau, U., additional, Mazevet, S., additional, Andreasson, J., additional, Bajt, S., additional, Burian, T., additional, Chalupsky, J., additional, Chapman, H. N., additional, Cihelka, J., additional, Doria, D., additional, Döppner, T., additional, Düsterer, S., additional, Dzelzainis, T., additional, Fäustlin, R. R., additional, Fortmann, C., additional, Förster, E., additional, Galtier, E., additional, Glenzer, S. H., additional, Göde, S., additional, Gregori, G., additional, Hajdu, J., additional, Hajkova, V., additional, Heimann, P. A., additional, Irsig, R., additional, Juha, L., additional, Jurek, M., additional, Krzywinski, J., additional, Laarmann, T., additional, Lee, H. J., additional, Lee, R. W., additional, Li, B., additional, Meiwes-Broer, K.-H., additional, Mithen, J. P., additional, Nagler, B., additional, Nelson, A. J., additional, Przystawik, A., additional, Redmer, R., additional, Riley, D., additional, Rosmej, F., additional, Sobierajski, R., additional, Tavella, F., additional, Thiele, R., additional, Tiggesbäumker, J., additional, Toleikis, S., additional, Tschentscher, T., additional, Vysin, L., additional, Whitcher, T. J., additional, White, S., additional, and Wark, J. S., additional

Published
2010
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32. Soft x-ray free electron laser microfocus for exploring matter under extreme conditions

Author

Nelson, A. J., primary, Toleikis, S., additional, Chapman, H., additional, Bajt, S., additional, Krzywinski, J., additional, Chalupsky, J., additional, Juha, L., additional, Cihelka, J., additional, Hajkova, V., additional, Vysin, L., additional, Burian, T., additional, Kozlova, M., additional, Fäustlin, R.R., additional, Nagler, B., additional, Vinko, S.M., additional, Whitcher, T., additional, Dzelzainis, T., additional, Renner, O., additional, Saksl, K., additional, Khorsand, A. R., additional, Heimann, P. A., additional, Sobierajski, R., additional, Klinger, D., additional, Jurek, M., additional, Pelka, J., additional, Iwan, B., additional, Andreasson, J., additional, Timneanu, N., additional, Fajardo, M., additional, Wark, J.S., additional, Riley, D., additional, Tschentscher, T., additional, Hajdu, J., additional, and Lee, R. W., additional

Published
2009
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33. Wavelength dependence of the damage threshold of inorganic materials under extreme-ultraviolet free-electron-laser irradiation

Author

Hau-Riege, S. P., primary, London, R. A., additional, Bionta, R. M., additional, Ryutov, D., additional, Soufli, R., additional, Bajt, S., additional, McKernan, M. A., additional, Baker, S. L., additional, Krzywinski, J., additional, Sobierajski, R., additional, Nietubyc, R., additional, Klinger, D., additional, Pelka, J. B., additional, Jurek, M., additional, Juha, L., additional, Chalupský, J., additional, Cihelka, J., additional, Hájková, V., additional, Velyhan, A., additional, Krása, J., additional, Tiedtke, K., additional, Toleikis, S., additional, Wabnitz, H., additional, Bergh, M., additional, Caleman, C., additional, and Timneanu, N., additional

Published
2009
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34. Perspective for high energy density studies on x-ray FELs

Author

Lee, R. W., primary, Nagler, B., additional, Zastrau, U., additional, Fäustlin, R., additional, Vinko, S. M., additional, Whitcher, T., additional, Sobierajski, R., additional, Krzywinski, J., additional, Juha, L., additional, Nelson, A. J., additional, Bajt, S., additional, Budil, K., additional, Cauble, R. C., additional, Bornath, T., additional, Burian, T., additional, Chalupsky, J., additional, Chapman, H., additional, Cihelka, J., additional, Döppner, T., additional, Dzelzainis, T., additional, Düsterer, S., additional, Fajardo, M., additional, Förster, E., additional, Fortmann, C., additional, Glenzer, S. H., additional, Göde, S., additional, Gregori, G., additional, Hajkova, V., additional, Heimann, P., additional, Jurek, M., additional, Khattak, F. Y., additional, Khorsand, A. R., additional, Klinger, D., additional, Kozlova, M., additional, Laarmann, T., additional, Lee, H.-J., additional, Meiwes-Broer, K.-H., additional, Mercere, P., additional, Murphy, W. J., additional, Przystawik, A., additional, Redmer, R., additional, Reinholz, H., additional, Riley, D., additional, Röpke, G., additional, Saksl, K., additional, Thiele, R., additional, Tiggesbäumker, J., additional, Toleikis, S., additional, Tschentscher, T., additional, Uschmann, I., additional, Falcone, R. W., additional, Shepherd, R., additional, Hastings, J. B., additional, White, W. E., additional, and Wark, J. S., additional

Published
2009
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35. Perspective for high energy density studies using x-ray free electron lasers

Author

Lee, R. W., primary, Nagler, B., additional, Zastrau, U., additional, Faustlin, R., additional, Vinko, S., additional, Whitcher, T., additional, Sobierajski, R., additional, Krzywinski, J., additional, Juha, L., additional, Nelson, A., additional, Bajt, S., additional, Bornath, T., additional, Burian, T., additional, Chalupsky, J., additional, Chapman, H., additional, Cihelka, J., additional, Doppner, T., additional, Dzelzainis, T., additional, Dusterer, S., additional, Fajardo, M., additional, Forster, E., additional, Fortmann, C., additional, Glenzer, S. H., additional, Gode, S., additional, Gregori, G., additional, Hajkova, V., additional, Heimann, P., additional, Jurek, M., additional, Khattak, F., additional, Khorsand, A. R., additional, Klinger, D., additional, Kozlova, M., additional, Laarmann, T., additional, Lee, H., additional, Meiwes-Broer, K., additional, Mercere, P., additional, Murphy, W. J., additional, Przystawik, A., additional, Redmer, R., additional, Reinholz, H., additional, Riley, D., additional, Ropke, G., additional, Saksl, K., additional, Thiele, R., additional, Tiggesbaumker, J., additional, Toleikis, S., additional, Tschentscher, T., additional, Uschmann, I., additional, and Wark, J. S., additional

Published
2009
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36. Interaction of intense ultrashort XUV pulses with silicon

Author

Sobierajski, R., primary, Klinger, D., additional, Jurek, M., additional, Pelka, J. B., additional, Juha, L., additional, Chalupský, J., additional, Cihelka, J., additional, Hakova, V., additional, Vysin, L., additional, Jastrow, U., additional, Stojanovic, N., additional, Toleikis, S., additional, Wabnitz, H., additional, Krzywinski, J., additional, Hau-Reige, S., additional, and London, R., additional

Published
2009
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37. Damage studies of multilayer optics for XUV free electron lasers

Author

Louis, E., primary, Khorsand, A. R., additional, Sobierajski, R., additional, van Hattum, E. D., additional, Jurek, M., additional, Klinger, D., additional, Pelka, J. B., additional, Juha, L., additional, Chalupský, J., additional, Cihelka, J., additional, Hajkova, V., additional, Jastrow, U., additional, Toleikis, S., additional, Wabnitz, H., additional, Tiedtke, K. I., additional, Gaudin, J., additional, Gullikson, E. M., additional, and Bijkerk, F., additional

Published
2009
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38. Response of molecular solids to ultra-intense femtosecond soft x-ray pulses

Author

Chalupský, J., primary, Juha, L., additional, Hájková, V., additional, Cihelka, J., additional, Vysin, L., additional, Gautier, J., additional, Hajdu, J., additional, Hau-Riege, S. P., additional, Jurek, M., additional, Krzywinski, J., additional, London, Ri. A., additional, Papalazarou, E., additional, Pelka, J. B., additional, Rey, G., additional, Sebban, S., additional, Sobierajski, R., additional, Stojanovic, N., additional, Tiedtke, K., additional, Toleikis, S., additional, Tschentscher, T., additional, Valentin, C., additional, Wabnitz, H., additional, and Zeitoun, P., additional

Published
2009
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39. Non-thermal desorption/ablation of molecular solids induced by ultra-short soft x-ray pulses

Author

Chalupský, J., primary, Juha, L., additional, Hájková, V., additional, Cihelka, J., additional, Vyšín, L., additional, Gautier, J., additional, Hajdu, J., additional, Hau-Riege, S. P., additional, Jurek, M., additional, Krzywinski, J., additional, London, R. A., additional, Papalazarou, E., additional, Pelka, J. B., additional, Rey, G., additional, Sebban, S., additional, Sobierajski, R., additional, Stojanovic, N., additional, Tiedtke, K., additional, Toleikis, S., additional, Tschentscher, T., additional, Valentin, C., additional, Wabnitz, H., additional, and Zeitoun, P., additional

Published
2008
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41. Applications of intense ultra-short XUV pulses to solid state physics: time-resolved luminescence spectroscopy and radiation damage studies

Author

De Grazia, M., primary, Merdji, H., additional, Carré, B., additional, Gaudin, J., additional, Geoffroy, G., additional, Guizard, S., additional, Fedorov, N., additional, Belsky, A., additional, Martin, P., additional, Kirm, M., additional, Babin, V., additional, Feldbach, E., additional, Vielhauer, S., additional, Nagirnyi, V., additional, Vassil'ev, A., additional, Krejci, F., additional, Kuba, J., additional, Chalupsky, J., additional, Cihelka, J., additional, Hajkova, V., additional, Ledinský, M., additional, and Juha, L., additional

Published
2007
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42. Utilizing ablation of solids to characterize a focused soft X-ray laser beam

Author

Chalupský, J., primary, Juha, L., additional, Kuba, J., additional, Hájková, V., additional, Cihelka, J., additional, Homer, P., additional, Kozlová, M., additional, Mocek, T., additional, Polan, J., additional, Rus, B., additional, Krzywinsky, J., additional, Sobierajski, R., additional, Wabnitz, H., additional, Feldhaus, J., additional, Tiedtke, K., additional, and the, And, additional

Published
2007
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43. Damage threshold of inorganic solids under free-electron-laser irradiation at 32.5nm wavelength

Author

Hau-Riege, S. P., primary, London, R. A., additional, Bionta, R. M., additional, McKernan, M. A., additional, Baker, S. L., additional, Krzywinski, J., additional, Sobierajski, R., additional, Nietubyc, R., additional, Pelka, J. B., additional, Jurek, M., additional, Juha, L., additional, Chalupský, J., additional, Cihelka, J., additional, Hájková, V., additional, Velyhan, A., additional, Krása, J., additional, Kuba, J., additional, Tiedtke, K., additional, Toleikis, S., additional, Tschentscher, Th., additional, Wabnitz, H., additional, Bergh, M., additional, Caleman, C., additional, Sokolowski-Tinten, K., additional, Stojanovic, N., additional, and Zastrau, U., additional

Published
2007
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45. Characteristics of focused soft X-ray free-electron laser beam determined by ablation of organic molecular solids

Author

Chalupský, J., primary, Juha, L., additional, Kuba, J., additional, Cihelka, J., additional, Hájková, V., additional, Koptyaev, S., additional, Krása, J., additional, Velyhan, A., additional, Bergh, M., additional, Caleman, C., additional, Hajdu, J., additional, Bionta, R. M., additional, Chapman, H., additional, Hau-Riege, S. P., additional, London, R. A., additional, Jurek, M., additional, Krzywinski, J., additional, Nietubyc, R., additional, Pelka, J. B., additional, Sobierajski, R., additional, Meyer-ter-Vehn, J., additional, Tronnier, A., additional, Sokolowski-Tinten, K., additional, Stojanovic, N., additional, Tiedtke, K., additional, Toleikis, S., additional, Tschentscher, T., additional, Wabnitz, H., additional, and Zastrau, U., additional

Published
2007
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46. Ablation of solids using a femtosecond extreme ultraviolet free electron laser

Author

Stojanovic, N., primary, von der Linde, D., additional, Sokolowski-Tinten, K., additional, Zastrau, U., additional, Perner, F., additional, Förster, E., additional, Sobierajski, R., additional, Nietubyc, R., additional, Jurek, M., additional, Klinger, D., additional, Pelka, J., additional, Krzywinski, J., additional, Juha, L, additional, Cihelka, J., additional, Velyhan, A., additional, Koptyaev, S., additional, Hajkova, V., additional, Chalupsky, J., additional, Kuba, J., additional, Tschentscher, T., additional, Toleikis, S., additional, Düsterer, S., additional, and Redlin, H., additional

Published
2006
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48. Perspective for high energy density studies on x-ray FELs.

Author

Lee, R. W., Nagler, B., Zastrau, U., Fäustlin, R., Vinko, S. M., Whitcher, T., Sobierajski, R., Krzywinski, J., Juha, L., Nelson, A. J., Bajt, S., Budil, K., Cauble, R. C., Bornath, T., Burian, T., Chalupsky, J., Chapman, H., Cihelka, J., Döppner, T., and Dzelzainis, T.

Published
2009
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