1. Real Time Process Control VIA in Situ X-ray Analysis
- Author
-
Larry Fehrenbacher, Chris D. Deaton, David Palaith, and David L. Wertz
- Subjects
Crystal ,Diffraction ,Materials science ,Residual stress ,business.industry ,Sputtering ,Cavity magnetron ,Analytical chemistry ,Optoelectronics ,Process control ,Sputter deposition ,Thin film ,business - Abstract
Intelligent control of magnetron sputtered of thin films requires in situ sensors that can interrogate the film in near real time. The incorporation of x-ray diffraction and x-ray fluorescence spectroscopy systems into an existing magnetron sputtering system at AFRL is discussed. It is shown that crystal phase, residual stress, thickness, and stoichiometry of sputtered films can be measured, and used to optimize and control the sputtering process. The potential of converting XRD and XRF data to image maps to monotor spatial uniformity of growing films is also discussed.
- Published
- 2000
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