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Although vanadium dioxide (VO2) exhibits the most abrupt metal to insulator transition (MIT) properties near room-temperature, the present regulation of their MIT functionalities is insufficient owing to the high complexity and susception associated with V4+. Herein, we demonstrate a spark plasma assisted reactive sintering (SPARS) approach to simultaneously achieve in situ doping and sintering of VO2 within largely short period (~10 minutes). This enables high convenience and flexibility in regulating the electronic structure of VO2 via dopant elements covering Ti, W, Nb, Mo, Cr and Fe, leading to a wide adjustment in their metal to insulator transition temperature (TMIT) and basic resistivity. Furthermore, the mechanical strengths of the doped-VO2 were meanwhile largely improved via the compositing effect of high melting-point dopant oxide. The high adjustability in MIT properties and improved mechanical properties further paves the way towards practical applications of VO2 in power electronics, thermochromism and infrared camouflage.

Although discovery in hydrogen induced electronic transition within perovskite family of rare-earth nickelate (ReNiO3) opens up a new paradigm in exploring both the new materials functionality and device applications, the existing research stays at ReNiO3 with light rare-earth compositions. To further extend the cognition towards heavier rare-earth, herein we demonstrate the hydrogen induced electronic transitions for quasi-single crystalline ReNiO3/LaAlO3 (001) heterostructures, covering a large variety of the rare-earth composition from Nd to Er. The hydrogen induced elevations in the resistivity of ReNiO3 (RH/R0) show an unexpected non-monotonic tendency with the atomic number of the rare-earth composition, e.g., firstly increase from Nd to Dy and afterwards decreases from Dy to Er. Although ReNiO3 with heavy rare-earth composition (e.g. DyNiO3) exhibits large RH/R0 up to 107, their hydrogen induced electronic transition is not reversible. Further probing the electronic structures via near edge X-ray absorption fine structure analysis clearly demonstrates the respective transition in electronic structures of ReNiO3 from Ni3+ based electron itinerant orbital configurations towards the Ni2+ based electron localized state. Balancing the hydrogen induced transition reversibility with the abruption in the variations of material resistivity, we emphasize that the ReNiO3 with middle rare-earth compositions (e.g. Sm) to be most suitable that caters for the potential applications in correlated electronic devices.

Although rare earth nickelates (ReNiO3) exhibit abundant electronic phases and widely adjustable metal to insulator electronic transition properties, their practical electronic applications are largely impeded by their intrinsic meta stability. Apart from elevating oxygen reaction pressures, heterogeneous nucleation is expected as an alternative strategy that enables the crystallization of ReNiO3 at low meta stability. In this work, the respective roles of high oxygen pressure and heterogeneous interface in triggering ReNiO3 thin films growth at metastable state are revealed. The ReNiO3 (Re:Nd, Sm, Eu, Gd, and Dy) heterogeneous thin films growth on LaAlO3 single crystal substrate have an effective crystallization at atmosphere without the necessity to apply high oxygen pressures, suggesting the interfacial bonding between the ReNiO3 and substrates can sufficiently reduce the positive Gibbs formation energy of ReNiO3, which is further verified by the first principles calculations. Nevertheless, the abrupt electronic transitions only appear in ReNiO3 thin films grown at high oxygen pressures, in which cases the oxygen vacancies are effectively eliminated via high oxygen pressure reactions as indicated by near edge X ray absorption fine structure (NEXAFS). This work unveils the synergistic effects of heterogeneous nucleation and high oxygen pressure on the growth of high quality ReNiO3 thin films., Comment: 33 Pages

Whilst electron correlations were previously recognized to trigger beyond conventional direct current (DC) electronic transportations (e.g. metal-to-insulator transitions, bad metal, thermistors), their respective influences to the alternation current (AC) transport are largely overlooked. Herein, we demonstrate active regulations in the electronic functionalities of d-band correlated rare-earth nickelate (ReNiO3) thin films, by simply utilizing their electronic responses to AC-frequencies (fAC). Assisted by temperature dependent near edge X-ray absorption fine structure analysis, we discovered positive temperature dependences in Coulomb viscosity of ReNiO3 that moderates their AC impedance. Distinguished crosslinking among R(Real)-fAC measured in nearby temperatures is observed that differs to conventional oxides. It enables active adjustability in correlated transports of ReNiO3, among NTCR-, TDelta- and PTCR- thermistors, via fAC from the electronic perspective without varying materials or device structures. The TDelta-fAC relationship can be further widely adjusted via Re composition and interfacial strains. The AC-frequency sensitivity discovered in ReNiO3 brings in a new freedom to regulating and switching the device working states beyond the present semiconductor technologies. It opens a new paradigm for enriching novel electronic applications catering automatic transmission or artificial intelligence in sensing temperatures and frequencies.

Anisotropies in electronic transportations conventionally originate from the nature of low symmetries in crystal structures, and were not anticipated for perovskite oxides, the crystal asymmetricity of which is far below, e.g. van der Waals or topological crystal. Beyond conventional expectations, herein we demonstrate pronounced anisotropies in the inter-band coulomb repulsion dominated electronic transportation behaviors under low-dimensional confinement for the perovskite family of rare-earth nickelates (ReNiO3). From one aspect, imparting bi-axial interfacial strains upon various lattice planes results in extrinsic anisotropies in the abrupt orbital transitions of ReNiO3, and their metal to insulator transition behaviors that elevates the transition temperature beyond the existing merit. From the other aspect, the in-plane orbital entropy associated to the in-plane symmetry of the NiO6 octahedron within ReNiO3 causes intrinsic anisotropies for the gradually orbital transition with temperature to further improve their thermistor transportation properties. The present work unveils the overlooked role of the electronic orbital directionality within low dimensional correlated perovskites that can trigger anisotropic transportation behaviors, in spite of their relatively symmetric crystal structures. Establishing anisotropic transportations integrating the electron correlation and quantum confinement effects will bring in a new freedom for achieving further improvement in transportation properties of multi-functional perovskite oxides.

The metal to insulator transition (MIT) in Mott-Hubbard systems is one of the most important discoveries in condensed matter physics, and results in abrupt orbital transitions from the insulating to metallic phases by elevating temperature across a critical point (TMIT). Although the MIT was previously expected to be mainly driven by the orbital Coulomb repulsion energy, the entropy contribution to the orbital free energy that also determines the relative stability of the metallic and insulating phases was largely overlooked. Herein, we demonstrate an orbital-entropy dominated reversible electronic phase transition in the metastable perovskite family of correlated rare-earth nicklates (ReNiO3), in addition to their previously known MIT driven by orbital Coulomb energies. In reverse to MIT, the resistivity of ReNiO3 abruptly increases by 2-3 orders by elevating T across another critical point (TR-MIT) below TMIT, and such transition is named as reverse-metal to insulator transition (R-MIT). Combining the afterwards exponentially decreasing resistivity in the insulating phase of ReNiO3 at further temperature elevation, a distinguished delta-temperatural transport character is established, which is potentially applicable for locking the working temperatures range for electric devices. The TR-MIT is shown to be enhanced via reducing the compositional complexity and size of Re or imparting bi-axial compressive strains, and meanwhile the transition sharpness of delta-temperatural transport is reduced. Our discovery indicates that temperature range for a thermodynamically stable insulating phase of ReNiO3 is in between of TR-MIT and TMIT, while a new conductive phase with high orbital entropy is formed by further descending temperature below TR-MIT.

The photoelectric effect established by Einstein is well known, which indicates that electrons on lower energy levels can jump up to higher levels by absorbing photons, or jump down from higher levels to lower levels and give out photons1-3. However, how do photons act on electrons and further on atoms have kept unknown up to now. Here we show the results that photons collide on electrons with energy-transmission in semiconductors and pass their momenta to electrons, which make the electrons jump up from lower energy levels to higher levels. We found that (i) photons have rest mass of 7.287exp(-38) kg and 2.886exp(-35) kg, in vacuum and silicon respectively; (ii) excited by photons with energy of 1.12eV, electrons in silicon may jump up from the top of valance band to the bottom of conduction band with initial speed of 2.543exp(3) m/s and taking time of 4.977exp(-17) s; (iii) acted by photons with energy of 4.6eV, the atoms who lose electrons may be catapulted out of the semiconductors by the extruded neighbor atoms, and taking time of 2.224exp(-15) s. These results make reasonable explanation to rapid thermal annealing, laser ablation and laser cutting.

Thermoelectric (TE) materials achieve localised conversion between thermal and electric energies, and the conversion efficiency is determined by a figure of merit zT. Up to date, two-dimensional electron gas (2DEG) related TE materials hold the records for zT near room-temperature. A sharp increase in zT up to ~2.0 was observed previously for superlattice materials such as PbSeTe, Bi2Te3/Sb2Te3 and SrNb0.2Ti0.8O3/SrTiO3, when the thicknesses of these TE materials were spatially confine within sub-nanometre scale. The two-dimensional confinement of carriers enlarges the density of states near the Fermi energy3-6 and triggers electron phonon coupling. This overcomes the conventional {\sigma}-S trade-off to more independently improve S, and thereby further increases thermoelectric power factors (PF=S2{\sigma}). Nevertheless, practical applications of the present 2DEG materials for high power energy conversions are impeded by the prerequisite of spatial confinement, as the amount of TE material is insufficient. Here, we report similar TE properties to 2DEGs but achieved in SrNb0.2Ti0.8O3 films with thickness within sub-micrometer scale by regulating interfacial and lattice polarizations. High power factor (up to 103 {\mu}Wcm-1K-2) and zT value (up to 1.6) were observed for the film materials near room-temperature and below. Even reckon in the thickness of the substrate, an integrated power factor of both film and substrate approaching to be 102 {\mu}Wcm-1K-2 was achieved in a 2 {\mu}m-thick SrNb0.2Ti0.8O3 film grown on a 100 {\mu}m-thick SrTiO3 substrate. The dependence of high TE performances on size-confinement is reduced by ~103 compared to the conventional 2DEG-related TE materials. As-grown oxide films are less toxic and not dependent on large amounts of heavy elements, potentially paving the way towards applications in localised refrigeration and electric power generations.

The preferentially (220) orientated polycrystalline silicon films have been fabricated by performing photon-involved rapid thermal annealing upon amorphous silicon films. In contrast, conventional thermal annealing of the silicon amorphous films results in the preference of (111) orientated crystallization. This difference reveals the overlooked impaction of photons upon silicon atoms, which results in the preferential orientation of lattice plans with the smallest density of atoms on their projection plane rather than the lowest energies.