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Despite the emergence of many new ionic liquid systems or room-temperature molten salts, chloroaluminate ionic liquids are still one of the most versatile systems for the electrochemical surface finishing of metals. The most commonly studied chloroaluminate IL is the well-known mixture of AlCl3 and the quaternary ammonium chloride salt, 1-ethyl-3-methylimidazolium chloride (EtMeImCl).1 Among the anhydrous, aprotic ILs prepared to date, this mixture still holds the record for the highest conductivity and lowest viscosity. Save for the need to protect it from exposure to moisture, it is undoubtedly one of the most versatile IL systems for electrochemistry. In most cases, the acidic composition of this IL proves to be the most valuable composition for surface finishing, owing to the presence of the coordinately unsaturated Lewis acidic species, Al2Cl7 -, which is readily reduced to Al metal via the reaction: 4Al2Cl7 - + 3e- ⇌ Al + 7AlCl4 - (1) The electroplating of Al from chloroaluminate ILs, such as AlCl3-EtMeImCl, is one of the most thoroughly studied processes in the field of ionic liquid electrochemistry, as attested in a recent review.2 However, much less attention has been devoted to the electrodeposition of aluminum alloys from these ILs, many of which have very useful properties. Stable alloys can be obtained during the electrodeposition of Al if certain low valent transition metal ions, M z +, that are reduced negative of the potential required for the reaction shown in Eq. 1 are added to the acidic IL, e.g., Cr2+, Ti2+, V2+, Mo2+, and Mn2+, to name a few.2 In this case, it is possible to prepare aluminum-transition metal alloys: xM(AlCl4) p (p-z)- + 4(1-x)Al2Cl7 - + [3-(3-z)x]e- ⇌ M x Al1-x + [7(1-x) +px]AlCl4 - (2) where x represents the fraction of the transition metal in the M x Al1-x alloy. For some values of x, these so-called “overpotential alloys” form single-phase metallic glasses. In this case, these amorphous, non-equilibrium alloys exhibit a greatly enhanced resistance to chloride pitting corrosion relative to pure Al. Ternary alloys with metallic glass phases can also be produced by adding a second transition metal to the acidic IL. Articles have appeared in The Journal describing the electrodeposition and properties of such aluminum alloys containing Mn + Mo,3 Mo + Ti,4 and Mn + W.5 In general, coatings prepared with ternary alloys display enhanced resistance to chloride pitting corrosion compared to the corresponding binary alloys. In this poster, we describe recent work on the electrodeposition of Al-Cr-Mn ternary alloys. References: 1J. S. Wilkes, J. A. Levisky, R. A. Wilson, and C. L. Hussey, Inorg. Chem., 35, 1168 (1982). 2T. Tsuda, G. R. Stafford, and C. L. Hussey, J. Electrochem. Soc., 164, H5007 (2017). 3T. Tsuda, C.L. Hussey, and G. R. Stafford, J. Electrochem. Soc., 152, C620 (2005). 4T. Tsuda, S. Arimoto, S. Kuwabata, and C. L. Hussey, J. Electrochem. Soc., 155, D256 (2008). 5T. Tsuda, Y. Ikeda, A. Iminashi, S. Kusumoto, S. Kuwabata, G. R. Stafford, and C. L. Hussey, J. Electrochem. Soc., 162, D405 (2015).

Despite the emergence of many new ionic liquid systems or room-temperature molten salts, chloroaluminate ionic liquids are still one of the most versatile systems for the electrochemical surface finishing of metals, whether it be the electrodeposition of corrosion protective films on steel or the electrochemical polishing of metal surfaces, such as Cu. The most commonly studied chloroaluminate IL is the well-known mixture of AlCl3 and the quaternary ammonium chloride salt, 1-ethyl-3-methylimidazolium chloride (EtMeImCl).1 Among the anhydrous, aprotic ILs prepared to date, this mixture still holds the record for the highest conductivity and lowest viscosity. Save for the need to protect it from exposure to moisture, it is undoubtedly one of the most versatile IL systems for electrochemistry. In most cases, the acidic composition of this IL proves to be the most valuable composition for surface finishing, owing to the presence of the coordinately unsaturated Lewis acidic species, Al2Cl7 -, which is readily reduced to Al metal via the reaction: 4Al2Cl7 -+3e- ⇌Al + 7AlCl4 - (1) The electroplating of Al from chloroaluminate ILs, such as AlCl3-EtMeImCl, is one of the most thoroughly studied processes in the field of ionic liquid electrochemistry, as attested in a recent review.2 However, much less attention has been devoted to the electrodeposition of aluminum alloys from these ILs, many of which have very useful properties. Stable alloys can be obtained during the electrodeposition of Al if certain low valent transition metal ions, Mz+, that are reduced negative of the potential required for the reaction shown in eq 1 are added to the acidic IL, e.g., Ti2+, V2+, Mo2+, and Mn2+, to name a few.2 In this case, it is possible to prepare aluminum-transition metal alloys: xM(AlCl4) p (p-z)- + 4(1-x)Al2Cl7 - + [3-(3-z)x]e- ⇌M x Al1-x + [7(1-x) +px]AlCl4 - (2) where x represents the fraction of the transition metal in the M x Al1-x alloy. For some values of x, these so-called “overpotential alloys” form single-phase metallic glasses. In this case, these amorphous, non-equilibrium alloys exhibit a greatly enhanced resistance to chloride pitting corrosion relative to pure Al. Ternary alloys with metallic glass phases can also be produced by adding a second transition metal to the acidic IL. Articles have appeared in The Journal describing the electrodeposition and properties of such aluminum alloys containing Mo + M, Mo + Ti, and W + Mn. Recently, both the Lewis acidic and basic composition of the AlCl3-EtMeImCl IL system have been explored for the reverse purpose, the electropolishing of Al and Cu by anodic dissolution. The advantages afforded by anodic dissolution in these ILs relative the aqueous acids and salt solutions commonly used for this purpose are quite obvious, i.e., the avoidance of the oxide surface films that invariably complicate the electropolishing process. In this paper, we report recent advances in the electrodeposition of aluminum transition metal alloys for metal surface finishing as well as the thermodynamics and kinetics of the anodic dissolution of metals in the acidic and basic compositions of the AlCl3-EtMeImCl IL system. References: 1J. S. Wilkes, J. A. Levisky, R. A. Wilson, and C. L. Hussey, Inorg. Chem., 35, 1168-1178 (1982). 2T. Tsuda, G. R. Stafford, and C. L. Hussey, J. Electrochem. Soc., 164, H5007-H5017 (2017).

Segers, Hendrik, De Smet, Willem H., Fontaneto, Diego, Hinz, Claus, Hussey, Charles, Michaloudi, Evangelia, Wallace, Robert L., Jersabek, Christian D. (2015): Period of public commentary begins on the revised proposal of species-group level names, and on the proposal of genus-group level names of the Candidate Part of List of Available Names (LAN) in the phylum Rotifera. European Journal of Taxonomy 165: 1-3, DOI: http://dx.doi.org/10.5852/ejt.2015.165

Following ICZN (1999) Article 79 Chapter 17 http://www.nhm.ac.uk/hosted-sites/iczn/code/), we, with the full support of the international community of rotifer researchers as expressed during subsequent international Rotifera symposia, developed a Candidate Part of the List of Available Names for species and genera of Rotifera from the start of zoological nomenclature to the year 2000.

The number of online resources for biodiversity information is growing. Names of organisms underpin access to information but present a number of unique problems when used as search terms. We examine these problems and assert that a taxonomic name-server or thesaurus is necessary to enable optimal retrieval of records from multiple datasets. A simple solution is presented, based upon our experience working with "real-world" data in the National Biodiversity Network (NBN) in the United Kingdom. The NBN provides access to over 18 million observational records and incorporates a nomenclator covering 198,000 names.

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