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211 results on '"Carta, R."'

2. Hematopoietic Stem/Progenitor Cells and Engineering: LONG-TERM DATA ON IMMUNE MONITORING OF CHILDREN GIVEN TCRαβ/CD19 CELL DEPLETED HLA-HAPLOIDENTICAL STEM TRANSPLANTATION (HAPLO-HSCT)

Author

Bertaina, V., primary, Sborgia, R., additional, Marini, O., additional, De Luca, C., additional, Carta, R., additional, Becilli, M., additional, Pagliara, D., additional, Quagliarella, F., additional, Lucarelli, B., additional, Boccieri, E., additional, Velardi, E., additional, Algeri, M., additional, Merli, P., additional, Galaverna, F., additional, and Locatelli, F., additional

Published
2023
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12. Experimental study on power consumption in lifetime engineered power diodes

Author

Daliento, S., Mele, L., Spirito, P., Carta, R., and Merlin, L.

Subjects
Diodes -- Structure, Diodes -- Energy use, Helium -- Electric properties, Metal oxide semiconductor field effect transistors -- Composition, Metal oxide semiconductor field effect transistors -- Electric properties, Platinum -- Electric properties, Business, Electronics, Electronics and electrical industries
Published
2009

18. Marbled texture of sputtered Al/Si alloy thin film on Si

Author

Gentile, MATTIA GIANFRANCO, Muñoz, Tabares, J. A., Chiodoni, A., Sgorlon, C., Para, I., Carta, R., Richieri, G., Bejtka, K., Merlin, L., and Vittone, Ettore

Subjects
Materials Chemistry2506 Metals and Alloys, Silicon, Materials science, Thin films, chemistry.chemical_element, 02 engineering and technology, Substrate (electronics), engineering.material, 01 natural sciences, Coatings and Films, Surface roughness, Coating, Sputtering, 0103 physical sciences, Electronic, Materials Chemistry, Optical and Magnetic Materials, Texture (crystalline), Thin film, 010302 applied physics, business.industry, Metallurgy, Metals and Alloys, Light scattering, Surfaces and Interfaces, Sputter deposition, 021001 nanoscience & nanotechnology, Microstructure, Heteroepitaxy, X-ray diffraction, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Surfaces, chemistry, Aluminum silicon alloy, engineering, Transmission electron microscopy, 2506, Optoelectronics, 0210 nano-technology, business
Abstract

DC magnetron sputtering is a commonly used technique for the fabrication of silicon based electronic devices, since it provides high deposition rates and uniform large area metallization. However, in addition to the thickness uniformity, coating optical uniformity is a crucial need for semiconductor industrial processes, due to the wide use of optical recognition tools. In the silicon-based technology, aluminum is one of the most used materials for the metal contact. Both the pre-deposition substrate cleaning and the sputtering conditions determine the quality and the crystalline properties of the final Al deposited film. In this paper is shown that not all the mentioned conditions lead to good quality and uniform Al films. In particular, it is shown that under certain standard process conditions, Al/Si alloy (1% Si) metallization on a [100] Si presents a non-uniform reflectivity, with a marbled texture caused by flakes with milky appearance. This optical inhomogeneity is found to be caused by the coexistence of randomly orient Al/Si crystal, with heteroepitaxial Al/Si crystals, both grown on Si substrate. Based on the microstructural analysis, some strategies to mitigate or suppress this marbled texture of the Al thin film are proposed and discussed.

Published
2016

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